In what is already a tradition ahead of the MNE International Conference on Micro and Nano Engineering, Heidelberg Instruments and co-organizers GenISys and micro resist technology invited the interested community to join the Free Technical Workshop on Advanced Micro- and Nanofabrication. The workshop on September 25th, 2023, highlighted the latest developments and advances offered by maskless laser lithography and direct-write technology, providing deep insights into this high-tech area, and offering a room for discussion and networking.
The expert talks from Fraunhofer Institute for Reliability and Microintegration IZM, IBM Research Europe, GenISys, micro resist technology, Heidelberg Instruments attracted almost 45 participants.
Many thanks to all speakers, co-organizers and participants – in-person and online. With your support and participation you contributed to the success of the workshop, and an afternoon full of discussions and exchange of experience, thus, fostering the advances in maskless laser lithography and direct-write technolog. Thank you again!
Have a look at our gallery with impressions from the workshop:
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