Materials Science
Lithography for New Materials
As pattern and device dimensions move smaller and smaller the material properties change depending on the size and shape. Direct write lithography is a highly flexible technique for modifying and shaping materials at the nano- and micro-scale to study and control an abundance of physical properties.
Direct write laser lithography can be used to create micro-scale patterns, structures, and textures as well as contacts for electronic devices and measurements. Thermal scanning probe lithography can be used in a similar fashion on the nanoscale, with the added ability of being able to directly initiate various material modifications via local heating. Additionally, some states of matter that are not accessible macroscopically can be reached thanks to ultra-fast heating, cooling, and high local pressure that can be applied with the nanoscale heated tip of the NanoFrazor®.
Non-invasive lithography
Localized heating
Precise temperature control
Imaging and metrology
Thermal conversion
Accurate overlay
No clean room required
Non-invasive lithography
Application images
suitable Systems
NanoFrazor® Explore
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.
µMLA
- Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.
MLA 150
- Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.