Micro-optics and Photonics

Reflectors, Diffusors and Microlenses Crafted in Excellence

  • Description

  • Micro-lens arrays and complex Fresnel lenses are crucial components in compact camera optics due to the increasing demand for advanced and miniaturized optics in smartphones and tablets. These micro-lenses are used in a variety of applications such as wave-front sensors, fiber coupling, or homogenizing light sources. The production of these micro-lenses begins with grayscale lithography to generate a mold, which can then be replicated via LIGA to create a metal shim, used as a master tool for molding, imprinting, or hot embossing. Grayscale lithography is also used to fabricate micro-prisms, waveguides, blazed gratings, CGH (Computer Generated Holograms) and specialty security labels, among others. Direct Write Lithography enables the precise manufacturing of VLS (Variable Line Spacing) and standard gratings. The DWL series includes various high-performance Grayscale lithography systems, such as DWL 66+ for R&D and the DWL 2000 GS/ DWL 4000 GS for high-end requirements.

    The MPO 100 utilizes Two-Photon Polymerization (TPP) to generate 3D printed refractive and diffractive micro-optical elements with arbitrary shapes, providing unlimited design freedom compared to conventional techniques. This allows for the creation of miniaturized devices with multiple functions. With the MPO 100, individual micro-lenses or arrays can be fabricated directly on photonic chips, substrates, or optical fibers for endoscopic devices for in- and outcoupling purposes. Additionally, replication masters can be manufactured, providing mass production capabilities of sophisticated optical designs.

    The NanoFrazor system is a powerful tool that can be used for a variety of micro-and nano-optic applications. Its high resolution associated with its grayscale lithography capabilities make it ideal for fabricating nano-optical structures such as diffraction gratings, optical Fourier surfaces, phase plates and more intricate finely tuned optical components.

  • Requirements

  • Very precise shape control

    Excellent surface roughness

    High throughput

    No stitching artefacts

    High resolution

    Flexible substrate material and sizes for different applications

    Diffraction gratings: Strict requirements for surface quality, groove position, and groove profile

  • Solutions

  • High and ultra-high resolution

    300 nm (DWL66+), 100 nm (MPO 100), 15 nm (NanoFrazor)

    Stitching reduction functions

    Allowing smooth surfaces of large micro-optical elements in thick photoresist

    Substrates from small pieces to G8 panel sizes

    Our systems offer the possibility to choose the right stage size for your application

    Shape optimization

    Used to simplify the compensation of the nonlinear effects

    High precision stage system for accurate pattern placement

    Used to perfectly position micro-optic devices

    Application specific write mode to optimize resolution and throughput

    The choice of write modes enables to make the right compromise for your application (DWL series)

Micro-lens arrays and complex Fresnel lenses are crucial components in compact camera optics due to the increasing demand for advanced and miniaturized optics in smartphones and tablets. These micro-lenses are used in a variety of applications such as wave-front sensors, fiber coupling, or homogenizing light sources. The production of these micro-lenses begins with grayscale lithography to generate a mold, which can then be replicated via LIGA to create a metal shim, used as a master tool for molding, imprinting, or hot embossing. Grayscale lithography is also used to fabricate micro-prisms, waveguides, blazed gratings, CGH (Computer Generated Holograms) and specialty security labels, among others. Direct Write Lithography enables the precise manufacturing of VLS (Variable Line Spacing) and standard gratings. The DWL series includes various high-performance Grayscale lithography systems, such as DWL 66+ for R&D and the DWL 2000 GS/ DWL 4000 GS for high-end requirements.

The MPO 100 utilizes Two-Photon Polymerization (TPP) to generate 3D printed refractive and diffractive micro-optical elements with arbitrary shapes, providing unlimited design freedom compared to conventional techniques. This allows for the creation of miniaturized devices with multiple functions. With the MPO 100, individual micro-lenses or arrays can be fabricated directly on photonic chips, substrates, or optical fibers for endoscopic devices for in- and outcoupling purposes. Additionally, replication masters can be manufactured, providing mass production capabilities of sophisticated optical designs.

The NanoFrazor system is a powerful tool that can be used for a variety of micro-and nano-optic applications. Its high resolution associated with its grayscale lithography capabilities make it ideal for fabricating nano-optical structures such as diffraction gratings, optical Fourier surfaces, phase plates and more intricate finely tuned optical components.

Very precise shape control

Excellent surface roughness

High throughput

No stitching artefacts

High resolution

Flexible substrate material and sizes for different applications

Diffraction gratings: Strict requirements for surface quality, groove position, and groove profile

High and ultra-high resolution

300 nm (DWL66+), 100 nm (MPO 100), 15 nm (NanoFrazor)

Stitching reduction functions

Allowing smooth surfaces of large micro-optical elements in thick photoresist

Substrates from small pieces to G8 panel sizes

Our systems offer the possibility to choose the right stage size for your application

Shape optimization

Used to simplify the compensation of the nonlinear effects

High precision stage system for accurate pattern placement

Used to perfectly position micro-optic devices

Application specific write mode to optimize resolution and throughput

The choice of write modes enables to make the right compromise for your application (DWL series)

Application images

suitable Systems

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