Designed to produce mature semiconductor photomasks
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Product Description
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The ULTRA is a qualified laser mask writer specifically for mature semiconductor photomasks. Semiconductor photomasks are used to fabricate electronic devices including microcontrollers, power management, LED, Internet of Things (IoT) and MEMS.
The ULTRA is an economical mask writer solution with all the features and functionality required for high throughput, precision and structure uniformity, and extremely accurate alignment. The standard configuration includes all modules (FX Fast mode, SMIF Pod, etc). The ULTRA can produce structure sizes down to 500 nm at write speeds up 580 mm2 per minute, while featuring excellent critical dimension uniformity, image quality, overlay and registration. The ULTRA is a compact system and fits easily into the existing mask shop infrastructure.
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Product Highlights
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High Exposure Quality
Line edge roughness 20 nm; CD uniformity 30 nm; positioning accuracy 40 nm; real-time optical autofocus; custom high numerical aperture (NA) write-lens optimized for laser exposureHigh Precision
XY stage fully designed and manufactured by Heidelberg Instruments; full air bearing stage; zero thermal expansion ZERODUR™ chuck; differential interferometer for position measurementPrecise Second Layer Alignment
Sophisticated correction matrix based on a 2D measurement of the first layer. Compensation of arbitrary local position distortions; 100 nm accuracyHigh Throughput
High-speed SLM with high data rate for fast exposure. 6″ mask in <45 minutesWriting Stability
Closed-loop environmental chamber complies with stringent requirements for semiconductor photomask production; integrated metrology system with flowbox and software corrections compensates for any variations in environmental parametersLong Lifetime
Economical high-power DPSS 355 nm laser; 20000 hours of guaranteed lifetime -
Available Modules
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The ULTRA is a qualified laser mask writer specifically for mature semiconductor photomasks. Semiconductor photomasks are used to fabricate electronic devices including microcontrollers, power management, LED, Internet of Things (IoT) and MEMS.
The ULTRA is an economical mask writer solution with all the features and functionality required for high throughput, precision and structure uniformity, and extremely accurate alignment. The standard configuration includes all modules (FX Fast mode, SMIF Pod, etc). The ULTRA can produce structure sizes down to 500 nm at write speeds up 580 mm2 per minute, while featuring excellent critical dimension uniformity, image quality, overlay and registration. The ULTRA is a compact system and fits easily into the existing mask shop infrastructure.
High Exposure Quality
High Precision
Precise Second Layer Alignment
High Throughput
Writing Stability
Long Lifetime
Customer applications
Technical Data
QX mode | FX mode | |
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Writing performance | ||
Address grid [nm] | 4 | 10 |
Line edge roughness [3σ, nm] | 20 | 40 |
Position accuracy [3σ, nm] | 40 | 100 |
Overlay [3σ, nm] | 30 | 60 |
Stitching [3σ, nm] | 20 | 60 |
2nd layer alignment [max error / nm] | 100 | 100 |
CD uniformity [3σ, nm] | 30 | 60 |
Minimum feature size [nm] | 500 | 700 |
Write speed [mm² / min] | 325 | 580 |
Write time for 6″ x 6″ [min] | 75 | 45 |
Operation | |
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Protocols, standards | SECS / GEM protocols |
User interface (software) | SEMI-compliant GUI |
Maximum write area | 228 x 228 mm² (others on request) |
Substrate size | 4", 5", 6", 7", and 9" masks (larger and other substrates on request) |
System features | |
Optics | 0.9 NA objective lens Low-distortion UV optics Automatic calibration routines |
Laser | 355 nm high-power solid state laser Highly economical compared to gas laser |
Focus system | Real-time optical autofocus |
Alignment | Camera system Distortion compensation Global and Field-by-field alignment Edge detector |
Data path | Real-time compression Scalable hardware concept Input formats: All standard formats, e.g. GDSII and Jobdeck |
Spatial Light Modulator | Frequency 350 kHz Data rate 2.4 GB/s |
Loader | Automatic mask loader with two independent carrier stations |
System dimensions | System / Electronic rack |
Width [mm] | 2995 / 800 |
Depth [mm] | 1652 / 650 |
Height [mm] | 2102 / 1800 |
Weight [kg] | 3400 / 180 |
Installation requirements | |
Electrical | 400 VAC ± 5%, 50/60 Hz, 16A, 3 phases |
Compressed air | 7 - 10 bar (without oil or other residue) |
Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.