“Bilayer Lift-Off for NanoFrazor Lithography”
“Ultra-High Resolution Pattern Transfer on NanoFrazor Lithography”

In our recent application notes, we discuss the integration of bilayer lift-off processing with NanoFrazor lithography technology. This combination, thanks to the precision of an ultra-sharp tip and the si    mplicity of sample preparation, enables the creation of structures under 10 nm. The process aligns smoothly with the requirements of NanoFrazor technology, facilitating thermal scanning probe lithography with bilayer lift-off processing for effective pattern transfer.

The notes further explain how combining NanoFrazor lithography with specifically tailored etching and lift-off methods can lead to reliable, ultra-high resolution pattern transfers. This methodical approach aims to guide users through the next steps after NanoFrazor patterning, focusing on achieving detailed and precise nanoscale patterns.

For those in the field looking to refine their nanofabrication techniques, these insights offer practical advice on leveraging NanoFrazor technology for high-resolution pattern transfer.