1D & 2D Materials

Low-Damage Lithography with High-Accuracy Overlay on Sensitive 1D & 2D Materials

Devices made from 1D and 2D materials often exhibit interesting physics with numerous benefits. Impurities and defects, however, can limit the performance of devices made of such materials.

Preserve and keep pristine the material’s properties

Highly accurate and fast alignment (e.g., for aligning to flakes or existing electrodes)

High resolution patterning capabilities (e.g., for creation of ribbons)

Glove-box compatibility (e.g., for 2D materials sensitive to contact with air)

Markerless overlay

In-situ AFM for high-accuracy alignment

Non-invasive patterning

Material properties not affected by charged particles or resist residues

Ultra-high resolution

Narrow gaps, ribbons, gate electrodes, constrictions, etc.

Glovebox

Nano-patterning of sensitive materials in a controlled inert atmosphere

Application images

suitable Systems

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