1D & 2D Materials

CONTACT

Low-Damage Lithography with High-Accuracy Overlay on Sensitive 1D & 2D Materials

Devices made from 1D and 2D materials often exhibit interesting physics with numerous benefits. Impurities and defects, however, can limit the performance of devices made of such materials.

Preserve and keep pristine the material’s properties

Highly accurate and fast alignment (e.g., for aligning to flakes or existing electrodes)

High resolution patterning capabilities (e.g., for creation of ribbons)

Glove-box compatibility (e.g., for 2D materials sensitive to contact with air)

Markerless overlay

In-situ AFM for high-accuracy alignment

Non-invasive patterning

Material properties not affected by charged particles or resist residues

Ultra-high resolution

Narrow gaps, ribbons, gate electrodes, constrictions, etc.

Glovebox

Nano-patterning of sensitive materials in a controlled inert atmosphere

Application images

1D & 2D materials: Top gates patterned over a Germanium nanoribbon
Top gates patterned over a Germanium nanoribbon without using damaging charged particles (AFM image). (Courtesy of Prof. Georgios Katsaros from IST, Austria)
1D & 2D materials: Multiple aligned contact pads fabricated on a graphene flake.
Multiple aligned contact pads fabricated by maskless lithography on a graphene flake.
1D & 2D materials: flakes detected through the resist layers and patterned at a high resolution.
Single-layer MoS2 flakes detected through the resist layers and patterned at a high resolution. Inset shows final devices after reactive ion etching. (Courtesy of Dr. Armin Knoll, IBM Research Zurich, and Prof. Andras Kis, EPFL)
1D & 2D materials provide excellent electrical contacts to MoS2
Vanishingly small Schottky barriers of an MoS2 transistor fabricated using NanoFrazor® enabled the highest on/off ratios ever reported with metal contacts. (Courtesy of Prof. Elisa Riedo, NYU, see Nat.El.2019)
Previous
Next

suitable Systems

NanoFrazor Scholar – the academic nanofabrication tool for nanopatterning of quantum devices, grayscale photonics and more

NanoFrazor® Scholar

  • Thermal Scanning Probe Lithography System

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

NanoFrazor Explore – Thermal Scanning Probe lithography with direct laser sublimation and grayscale patterning capability

NanoFrazor® Explore

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

DWL 66+ – a laser lithography tool for R&D in microelectronics, MEMS, microfluidics and more with Grayscale exposure mode

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

µMLA – the perfect entry-level research and development (R&D) tool for virtually any application requiring microstructures

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

Get in Touch

We are always at your disposal.
Please send us your request.

SEND REQUEST

Sign up

Subscribe to our newsletter
to receive the newest information.

SUBSCRIBE

Stay connected

Follow us on social media to benefit
from a range of useful resources.

Youtube Linkedin Twitter Instagram

APPLICATIONS

CORE TECHNOLOGIES

KEY FEATURES

PRODUCTS

SERVICE

COMPANY

Legal Notice
Data Protection
Data Protection (for Job Applications)
Terms and Conditions
Scroll to Top