1D & 2D Materials
Low-Damage Lithography with High-Accuracy Overlay on Sensitive 1D & 2D Materials
Devices made from 1D and 2D materials often exhibit interesting physics with numerous benefits. Impurities and defects, however, can limit the performance of devices made of such materials.
Preserve and keep pristine the material’s properties
Highly accurate and fast alignment (e.g., for aligning to flakes or existing electrodes)
High resolution patterning capabilities (e.g., for creation of ribbons)
Glove-box compatibility (e.g., for 2D materials sensitive to contact with air)
Markerless overlay
In-situ AFM for high-accuracy alignment
Non-invasive patterning
Material properties not affected by charged particles or resist residues
Ultra-high resolution
Narrow gaps, ribbons, gate electrodes, constrictions, etc.
Glovebox
Nano-patterning of sensitive materials in a controlled inert atmosphere
Application images
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suitable Systems
NanoFrazor® Explore
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
µMLA
- Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.