NANOFRAZOR SCHOLAR

Thermal scanning probe lithography tool with in-situ imaging and grayscale patterning capabilities

  • Product Description

  • The NanoFrazor Scholar is an excellent solution for academic research groups requiring an affordable system for nanofabrication. The NanoFrazor Scholar is used for nano-patterning in various application areas, such as quantum devices, 1D/2D materials like quantum dots, Dolan bridges, and Josephson junctions, and nanoscale arrays. The unique capabilities of the NanoFrazor Scholar enable novel research in both new devices and new materials. For example, Thermal Scanning Probe Lithography (t-SPL) can be used in advanced applications such as grayscale photonics devices, nanofluidic structures, or biomimetic substrates for cell growth, or any application requiring local modification of materials via heat, e.g., chemical reactions and physical phase changes.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing in such a way that the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-3 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor hardware and software are constantly advancing to extend the capabilities and performance of the tool and the wide range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

    The NanoFrazor Scholar is an excellent solution for academic research groups requiring an affordable system for nanofabrication. The NanoFrazor Scholar is used for nano-patterning in various application areas, such as quantum devices, 1D/2D materials like quantum dots, Dolan bridges, and Josephson junctions, and nanoscale arrays. The unique capabilities of the NanoFrazor Scholar enable novel research in both new devices and new materials. For example, Thermal Scanning Probe Lithography (t-SPL) can be used in advanced applications such as grayscale photonics devices, nanofluidic structures, or biomimetic substrates for cell growth, or any application requiring local modification of materials via heat, e.g., chemical reactions and physical phase changes.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing in such a way that the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-3 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor hardware and software are constantly advancing to extend the capabilities and performance of the tool and the wide range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

  • Product Highlights

  • Thermal Scanning Probe Lithography

    New approach to nanopatterning enabling applications not otherwise feasible

    High-resolution

    Easy patterning of nanostructures even with complex geometries; minimum lateral features 20 nm, vertical resolution 3 nm

    Damage-free Lithography

    No damage from charged particles, no proximity effects, clean lift-off

    Compatibility

    With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

    Unique Thermal Cantilevers

    Integrated microheater and distance sensor for easy exchange and cost-effectiveness

    Precise Overlay and Stitching

    Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

    In-situ Imaging

    Real-time visualization of patterned structure properties

    Extremely Compact

    400 mm x 400 mm x 450 mm

    Low Cost of Ownership

    No need for a cleanroom, vacuum pump or expensive consumables
  • Available Modules

  • Grayscale Mode

    2.5D lithography for patterning photonic, nanofluidic and biomimetic structures with 3 nm accuracy

    Glovebox

    Customized glovebox solution ensures minimized contamination

The NanoFrazor Scholar is an excellent solution for academic research groups requiring an affordable system for nanofabrication. The NanoFrazor Scholar is used for nano-patterning in various application areas, such as quantum devices, 1D/2D materials like quantum dots, Dolan bridges, and Josephson junctions, and nanoscale arrays. The unique capabilities of the NanoFrazor Scholar enable novel research in both new devices and new materials. For example, Thermal Scanning Probe Lithography (t-SPL) can be used in advanced applications such as grayscale photonics devices, nanofluidic structures, or biomimetic substrates for cell growth, or any application requiring local modification of materials via heat, e.g., chemical reactions and physical phase changes.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing in such a way that the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-3 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor hardware and software are constantly advancing to extend the capabilities and performance of the tool and the wide range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

The NanoFrazor Scholar is an excellent solution for academic research groups requiring an affordable system for nanofabrication. The NanoFrazor Scholar is used for nano-patterning in various application areas, such as quantum devices, 1D/2D materials like quantum dots, Dolan bridges, and Josephson junctions, and nanoscale arrays. The unique capabilities of the NanoFrazor Scholar enable novel research in both new devices and new materials. For example, Thermal Scanning Probe Lithography (t-SPL) can be used in advanced applications such as grayscale photonics devices, nanofluidic structures, or biomimetic substrates for cell growth, or any application requiring local modification of materials via heat, e.g., chemical reactions and physical phase changes.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing in such a way that the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-3 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor hardware and software are constantly advancing to extend the capabilities and performance of the tool and the wide range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

High-resolution

Easy patterning of nanostructures even with complex geometries; minimum lateral features 20 nm, vertical resolution 3 nm

Damage-free Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

Unique Thermal Cantilevers

Integrated microheater and distance sensor for easy exchange and cost-effectiveness

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

In-situ Imaging

Real-time visualization of patterned structure properties

Extremely Compact

400 mm x 400 mm x 450 mm

Low Cost of Ownership

No need for a cleanroom, vacuum pump or expensive consumables

Grayscale Mode

2.5D lithography for patterning photonic, nanofluidic and biomimetic structures with 3 nm accuracy

Glovebox

Customized glovebox solution ensures minimized contamination

Customer applications

Why customers choose our systems

The NanoFrazor offers a unique combination of features in a single compact instrument for nanolithography. I highlight, in particular, markerless overlay and stitching with low damage on 2D materials, 3D grayscale nanolithography, and direct thermal conversion and modification of materials.

Francesco Buatier de Mongeot, Professor of Experimental Condensed Matter Physic
Dipartimento di Fisica, Università di Genova
Genoa, Italy

Technical Data

Patterning performance
Minimum structure size [nm]20
Minimum lines and spaces [half pitch, nm]30
Grayscale / 3D-resolution (step size in PPA) [nm]3
Writing field size [X μm x Y μm]60 x 60
Field stitching accuracy (markerless, using in-situ imaging) [nm]50
Overlay accuracy (markerless, using in-situ imaging) [nm]50
Write speed (typical scan speed) [mm/s] 0.5
Write speed (50 nm pixel) [μm²/min] 500
Imaging performance
Lateral imaging resolution (feature size) [nm]10
Vertical resolution (topography sensitivity) [nm]<0.5
Imaging speed (@ 50 nm resolution) [μm²/min]500
System features
Substrate sizes1 x 1 mm² to 100 x 100 mm²
Thickness: 5 mm with optical access, 10 mm without optical access
Optical microscope0.6 µm digital resolution, 2.4 µm diffraction limit, 1.0 mm x 1.0 mm field of view
Magnetic cantilever holderFast (<1 min) and accurate tip exchange
HousingCompact housing with separate controller rack, active vibration isolation
Software featuresGDS and bitmap import, topography image analysis and drawing for overlay, fully automated calibration routines, Python scripting
NanoFrazor cantilever features
Integrated componentsTip heater, topography sensor, electrostatic actuation
Tip geometryConical tip with <10 nm radius and 750 nm length
Tip heater temperature range25 °C – 1100 °C (<1 °C setpoint resolution)
System dimensions & installation requirements
Height × width × depthTabletop: 400 mm x 400 mm x 450 mm, electronic trolley: 660 mm x 560 mm, x 600 mm
Weight100 kg
Power input1 x 110 or 220 V AC, 10 A
Vibration and noise levelAmbient acoustic noise levels need to be kept below 40 dB for best performance. A strong table is required. Floor requires vibration level VC-B.
Other considerations
Recipe book with detailed descriptions of various processes is included (regularly updated with software).
Cantilever tips degrade over time (>50 h patterning possible). Exchange is fast and low cost for tool owners.
A cleanroom or special laboratory is not required. No vacuum needed.
Unique capabilities make it easy to receive government funding (for system itself or later research projects)

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

Scroll to Top