Thermal scanning probe lithography tool with in-situ imaging and grayscale patterning capabilities
The NanoFrazor® Scholar is particularly suitable for academic research groups requiring an affordable system for nanofabrication. NanoFrazor® Scholar is used for nanopatterning of quantum devices on 1D/2D materials such as quantum dots, Dolan bridges and Josephson junctions, and nanoscale arrays. Its unique capabilities enable new devices in new materials. For example, it is used for advanced applications such as grayscale photonics devices, nanofluidics structures or biomimetic substrates for cell growth; local modification of materials by heat, e.g. chemical reactions and physical phase changes.
In-situ imaging enables two unique features: markerless overlay, and comparison of the written and target patterns during writing so the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible.
The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor® hardware and software are constantly advancing to extend the capabilities and performance of the tool and its range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.
Thermal Scanning Probe Lithography
High-resolution
Non-invasive Lithography
Compatibility
Unique Thermal Cantilevers
Precise Overlay and Stitching
In-situ Imaging
Extremely Compact
Low Cost of Ownership
Grayscale Mode
Glovebox
Customer applications
Technical Data
Patterning performance | |
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Minimum structure size [nm] | 20 |
Minimum lines and spaces [half pitch, nm] | 30 |
Grayscale / 3D-resolution (step size in PPA) [nm] | 3 |
Writing field size [X μm x Y μm] | 50 x 50 |
Field stitching accuracy (markerless, using in-situ imaging) [nm] | 50 |
Overlay accuracy (markerless, using in-situ imaging) [nm] | 50 |
Write speed (typical scan speed) [mm/s] | 0.5 |
Write speed (50 nm pixel) [μm²/min] | 500 |
Imaging performance | |
Lateral imaging resolution (feature size) [nm] | 10 |
Vertical resolution (topography sensitivity) [nm] | <0.5 |
Imaging speed (@ 50 nm resolution) [μm²/min] | 500 |
System features | |
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Substrate sizes | 1 x 1 mm² to 50 x 50 mm² (100 x 100 mm² possible with limitations) Thickness: 5 mm with optical access, 10 mm without optical access |
Optical microscope | 0.6 µm digital resolution, 2.4 µm diffraction limit, 1.0 mm x 1.0 mm field of view |
Magnetic cantilever holder | Fast (< 1 min) and accurate tip exchange |
Housing | Compact housing with separate controller rack, active vibration isolation |
Software features | GDS and bitmap import, topography image analysis and drawing for overlay, fully automated calibration routines, Python scripting |
NanoFrazor cantilever features | |
Integrated components | Tip heater, topography sensor, electrostatic actuation |
Tip geometry | Conical tip with < 10 nm radius and 750 nm length |
Tip heater temperature range | e 25 °C – 1100 °C (< 1 K setpoint resolution) |
System dimensions & installation requirements | |
Height × width × depth | Table top: 40 cm x 40 cm x 45 cm, electronic trolley: 66 cm x 56 cm, x 60 cm |
Weight | 100 kg |
Power input | 1 x 110 or 220 V AC, 10 A |
Vibration and noise level | Ambient acoustic noise levels need to be kept below 40 dB for best performance. A strong table is required. Floor requires vibration level VC-B. |
Other considerations | |
Recipe book with detailed descriptions of various processes is included (regularly updated with software). | |
Cantilever tips degrade over time (> 50 h patterning possible). Exchange is fast and low cost for tool owners. | |
A cleanroom or special laboratory is not required. No vacuum needed. | |
Unique capabilities make it easy to receive government funding (for system itself or later research projects) |
Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice