Non-invasive Nanolithography

Your Underlying Materials Stay Unharmed

Lithography can modify or deteriorate the sample properties e.g. by exposure to high-energy charged particles like electrons or ions. This can lead to unwanted creation of covalent bonds with the organic resist, trapped charges or lattice defects. The resulting contaminations or defects can strongly deteriorate the device performance when using chip designs with insulating layers or devices comprising sensitive materials like 2D materials or nanowires.
The heated tip of the standard NanoFrazor lithography process only heats the top resist layer. Sensitive materials below the resist stack are not heated perceptibly and remain completely unharmed during patterning of the top resist layer.
The NanoFrazor can be also incorporated inside a glovebox. This facilitates nanolithography on samples that deteriorate in air.

Related images

suitable Systems

NanoFrazor Explore – Thermal Scanning Probe lithography with direct laser sublimation and grayscale patterning capability

NanoFrazor® Explore

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

NanoFrazor Scholar – the academic nanofabrication tool for nanopatterning of quantum devices, grayscale photonics and more

NanoFrazor® Scholar

  • Thermal Scanning Probe Lithography System

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

Get in Touch

We are always at your disposal.
Please send us your request.

Sign up

Subscribe to our newsletter
to receive the newest information.

Stay connected

Follow us on social media to benefit
from a range of useful resources.

Scroll to Top