Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.