Nanoimprint Templates
Down To Single-Nanometer Precision
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Description
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Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.
Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.
The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).
The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.
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Requirements
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High-resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor®)
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Solutions
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Accurate grayscale lithography
down to single-nanometer accuracy (NanoFrazor®)Ultra-high resolution
for templates and copiesCompatibility of resists
with various industrial NIL processesHigh write speed
to make grayscale masters even up to 1×1 m2
Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.
Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.
The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).
The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.
High-resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor®)
Accurate grayscale lithography
Ultra-high resolution
Compatibility of resists
High write speed
Application images
suitable Systems
DWL 2000 GS / DWL 4000 GS
- Direct Write Laser Lithography System
The most advanced industrial grayscale lithography tool on the market.
MPO 100
- Two-Photon Polymerization Multi-User Tool
Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.
NanoFrazor® Explore
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with direct laser sublimation and grayscale modules. Excellent alternative to e-beam lithography tools.
NanoFrazor® Scholar
- Thermal Scanning Probe Lithography System
Table-top thermal scanning probe lithography system with in-situ AFM imaging. Compact and compatible with glovebox.
VPG 300 DI
- Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures.