Nanoimprint Templates
Single-Nanometer Precision
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Description
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Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.
Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.
The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).
The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.
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Requirements
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High resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching) for the final master
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Benefits
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Accurate grayscale lithography
down to single-nanometer accuracyUltra-high resolution
for templates and copiesCompatibility of resists
with various industrial NIL processesHigh write speed
to make grayscale masters even up to 1×1 m2
Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.
Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.
The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).
The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.
High resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching) for the final master
Accurate grayscale lithography
Ultra-high resolution
Compatibility of resists
High write speed
Application images
suitable Systems
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.