Nanoimprint Templates

Down To Single-Nanometer Precision

  • Description

  • Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

    Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

    The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

    The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.

  • Requirements

  • High-resolution patterning over large areas

    Accuracy of grayscale nanolithography

    Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor®)

  • Solutions

  • Accurate grayscale lithography

    down to single-nanometer accuracy (NanoFrazor®)

    Ultra-high resolution

    for templates and copies

    Compatibility of resists

    with various industrial NIL processes

    High write speed

    to make grayscale masters even up to 1×1 m2

Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, grayscale lithography enables the production of intricate topographies. Maskless grayscale laser lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

The NanoFrazor® systems, which employ Thermal Scanning Probe grayscale lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.

High-resolution patterning over large areas

Accuracy of grayscale nanolithography

Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor®)

Accurate grayscale lithography

down to single-nanometer accuracy (NanoFrazor®)

Ultra-high resolution

for templates and copies

Compatibility of resists

with various industrial NIL processes

High write speed

to make grayscale masters even up to 1×1 m2

Application images

suitable Systems

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