Nanoimprint Templates

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Down To Single-Nanometer Precision

  • Description

  • Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

    Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, Grayscale Lithography enables the production of intricate topographies. Maskless Grayscale Laser Lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

    The NanoFrazor, which employs Thermal Scanning Probe Grayscale Lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

    The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.

  • Requirements

  • High-resolution patterning over large areas

    Accuracy of grayscale nanolithography

    Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor)

  • Solutions

  • Accurate grayscale lithography

    down to single-nanometer accuracy (NanoFrazor)

    Ultra-high resolution

    for templates and copies

    Compatibility of resists

    with various industrial NIL processes

    High write speed

    to make grayscale masters even up to 1×1 m2

Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, Grayscale Lithography enables the production of intricate topographies. Maskless Grayscale Laser Lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

The NanoFrazor, which employs Thermal Scanning Probe Grayscale Lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

The MPO 100, which can create 3D structures using Two-Photon Polymerization, has the ability to manufacture extremely accurate 2.5D templates.

High-resolution patterning over large areas

Accuracy of grayscale nanolithography

Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor)

Accurate grayscale lithography

down to single-nanometer accuracy (NanoFrazor)

Ultra-high resolution

for templates and copies

Compatibility of resists

with various industrial NIL processes

High write speed

to make grayscale masters even up to 1×1 m2

Application images

Nanoimprint templates: NIL is used for replication of grayscale 3D features
NIL is often used for replication of grayscale 3D features. Industrial applications can require masters that are seamlessly covered with 3D features over areas as big as 1 x 1 m2.
Nanoimprint templates: High-fidelity 3d replicas from NanoFrazor Patterns
NanoFrazor: High-fidelity 3D replicas from NanoFrazor patterns. (Courtesy of micro resist technology GmbH)
Nanoimprint templates: Replication of high-resolution features
NanoFrazor: Replication of high-resolution features. (Courtesy of SCIL Nanoimprint Solutions)
Nanoimprint templates: Amplication of 3D patterns by etching
NanoFrazor: Amplication of 3D patterns by etching.
Retro-reflector for the fabrication of high-quality masters, can be used in nanoimprint templates
MPO 100: Retro-reflector: Fabrication of high-quality masters used in diverse replication technologies.
Microlens array consisting of 400 rectangular microlenses, used as nanoimprint templates
MPO 100: 20 mm x 20 mm microlens array (MLA) with a filling factor of 100%, consisting of 400 rectangular microlenses with dimensions of 1 mm x 1 mm x 0.1 mm.
Reladed image for nanoimprint templates: microprism array with varying angles
Microprism Array with varying angles in XY created with the MPO 100.
(Courtesy of Fraunhofer ISC)

suitable Systems

DWL 66

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

DWL 2000 GS and DWL 4000 GS industrial-level grayscale lithography for masks and wafers for IC, MEMS, micro-optic, and more

DWL 2000 GS / DWL 4000 GS

  • Direct Write Laser Lithography System

The most advanced industrial grayscale lithography tool on the market.

MPO 100 – a TPP tool for 3D Lithography and 3D Microprinting for optics, photonics, mechanics, and biomedical engineering

MPO 100

  • Two-Photon Polymerization Multi-User Tool

Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.

VPG+ 200 and VPG+ 400 – Volume Pattern Generators designed for i-line resist applications like MEMS and advanced packaging

VPG 300 DI

  • Maskless Stepper

Maskless direct imager for high-accuracy and high-resolution microstructures.

NanoFrazor tabletop

NanoFrazor

  • Thermal Scanning Probe Lithography System

Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D. 

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