Nanoimprint Templates
Single-Nanometer Precision
Nanoimprint lithography (NIL) is used to replicate 2D or 2.5D nanostructures with high throughput, which is required for photonics, optics, and nano-fluidics applications. This method relies on high-precision master templates which are prepared by direct write nano- and micro-lithography.
High resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching) for the final master
Accurate grayscale lithography
down to single-nanometer accuracy
Ultra-high resolution
for templates and copies
Compatibility of resists
with various industrial NIL processes
High write speed
to make grayscale masters even up to 1×1 m2
Application images
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suitable Systems
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.