MPO 100 successfully installed at Kyoto University

Exciting news!

At Kyoto University Nanotechnology Hub one MPO 100 3D microprinting system and one MLA 150 maskless lithography system have been successfully installed.

This Nanotechnology Hub is an open facility that provides a nano-micro prototyping line equipped with state-of-the-art microfabrication equipment and specialized technical staff. This facility welcomes researchers from various fields and promotes a dynamic environment. Through a simple usage review procedure, it can be used by any researcher inside or outside the country, including private companies. MPO 100 and MLA 150 will be available for use soon. Please contact to the Nanotechnology Hub for details.

The MPO 100 system is based on Two-Photon Polymerization (TPP) technology and the MLA 150 system is based on 2-dimensional Spatial Light Modulator high-speed laser raster scan writing strategy. In addition to an existing DWL 2000 high resolution pattern generator for 2D pattern and Gray Scale exposure, researchers will be able to select the best fabrication approach for the device in MEMS, BioMEMS, Micro Optics, DOEs, Micro Fluidics, Sensors, Electronic components, and many more.

As a trusted partner, we strive to provide state-of-the-art solutions for the advanced micro- and nanofabrication. Thank you to Kyoto University for the long-standing and trusting cooperation, and for allowing us to accompany you on your research journey. We are already looking forward to the first results.

Kyoto University Nanotechnology Hub:

The modular 3D printing platform MPO 100 offers high precision on demand for 3D lithography with highest resolutions in the 100 nm range and 3D microprinting with structure heights of over 1 cm, all in one device. The system enables the fabrication of complex functional microstructures with high throughput in a single process step. Furthermore, the MPO 100 provides distinctive fabrication capabilities coupled with scan speeds over 1000 mm/s and stitching-free fabrication.

In addition to flexibility and economy, the MLA 150 Maskless Aligner provides non-contact exposure, outstanding ease of use, and high speed, making it the ideal tool in rapid prototyping environments, for low- to mid-volume production, and R&D. In multiuser facilities, the system is highly appreciated for fast prototyping on substrates of various dimensions and shapes. Intuitive GUI ensures swift navigation for newcomers. Rapid setup slashes cycle time.

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