MLA 150 Maskless Aligner
- Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.
Description
Heidelberg Instruments direct writers enable high precision, making them suitable for sensors with fine details and complex geometries (VPG & DWL series). They can work with a variety of materials, including polymers, metals, and ceramics. This flexibility is advantageous for creating sensors with diverse functional layers and optimizing the material properties for specific sensing applications.
Maskless lithography systems are valuable tools for rapid prototyping of sensor designs. Researchers and engineers can quickly iterate and test different sensor configurations without the need for time-consuming mask changes or complex lithography setups (VPG 300 DI, MLA series).
Thermal Scanning Probe Lithography with resolution capabilities as fine as 20 nm has the potential to elevate the sensitivity of the manufactured sensor. It opens up new possibilities for the development of sophisticated sensors and other nanoscale technologies.
Requirements
Solutions
Heidelberg Instruments direct writers enable high precision, making them suitable for sensors with fine details and complex geometries (VPG & DWL series). They can work with a variety of materials, including polymers, metals, and ceramics. This flexibility is advantageous for creating sensors with diverse functional layers and optimizing the material properties for specific sensing applications.
Maskless lithography systems are valuable tools for rapid prototyping of sensor designs. Researchers and engineers can quickly iterate and test different sensor configurations without the need for time-consuming mask changes or complex lithography setups (VPG 300 DI, MLA series).
Thermal Scanning Probe Lithography with resolution capabilities as fine as 20 nm has the potential to elevate the sensitivity of the manufactured sensor. It opens up new possibilities for the development of sophisticated sensors and other nanoscale technologies.











The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
Powerful production tools for standard photomasks and microstructures in i-line resists.
Maskless direct imager for high-accuracy and high-resolution microstructures.
A tool specifically designed to produce mature semiconductor photomasks.
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