Sensors
Heidelberg Instruments' Direct Writers Redefine Sensor Design with Unmatched Flexibility and Precision
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Description
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Heidelberg Instruments direct writers enable high precision, making them suitable for sensors with fine details and complex geometries (VPG & DWL series). They can work with a variety of materials, including polymers, metals, and ceramics. This flexibility is advantageous for creating sensors with diverse functional layers and optimizing the material properties for specific sensing applications.
Maskless lithography systems are valuable tools for rapid prototyping of sensor designs. Researchers and engineers can quickly iterate and test different sensor configurations without the need for time-consuming mask changes or complex lithography setups (VPG 300 DI, MLA series).
Thermal Scanning Probe Lithography with resolution capabilities as fine as 20 nm has the potential to elevate the sensitivity of the manufactured sensor. It opens up new possibilities for the development of sophisticated sensors and other nanoscale technologies.
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Requirements
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Resolution
Flexibility
Precise overlay of several layers
Patterning of various materials
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Solutions
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Accurate overlay
using alignment marks or none. The functional structured layer can be used as reference (NanoFrazor, µMLA, MLA 150)Ultra-high resolution (15 nm) without the need for proximity effect corrections
(NanoFrazor)High resolution
Minimum feature size 300 nm (DWL 66+) 500 nm (VPG 300 DI)Multiple wavelengths available
between 355 nm and 405 nm (Direct Writers)
Heidelberg Instruments direct writers enable high precision, making them suitable for sensors with fine details and complex geometries (VPG & DWL series). They can work with a variety of materials, including polymers, metals, and ceramics. This flexibility is advantageous for creating sensors with diverse functional layers and optimizing the material properties for specific sensing applications.
Maskless lithography systems are valuable tools for rapid prototyping of sensor designs. Researchers and engineers can quickly iterate and test different sensor configurations without the need for time-consuming mask changes or complex lithography setups (VPG 300 DI, MLA series).
Thermal Scanning Probe Lithography with resolution capabilities as fine as 20 nm has the potential to elevate the sensitivity of the manufactured sensor. It opens up new possibilities for the development of sophisticated sensors and other nanoscale technologies.
Resolution
Flexibility
Precise overlay of several layers
Patterning of various materials
Accurate overlay
Ultra-high resolution (15 nm) without the need for proximity effect corrections
High resolution
Multiple wavelengths available
Application images



suitable Systems
µMLA
- Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
NanoFrazor
- Thermal Scanning Probe Lithography System
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
VPG+ 200, VPG+ 400, and VPG+ 800
- Volume Pattern Generator
Powerful production tools for standard photomasks and microstructures in i-line resists.
VPG 300 DI
- Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures.
ULTRA
- Laser Mask Writer
A tool specifically designed to produce mature semiconductor photomasks.