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We are thrilled to provide you with a comprehensive collection of fact sheets, research papers, whitepapers, and other documents related to Heidelberg Instruments. Our library is designed to serve as a valuable resource for anyone seeking information about our products, applications, core technologies and key features. Not only do we publish our own information here, but we also feature joint documents produced with partners and papers by other authors using our systems. Some links may lead to external sources.

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Title Description Category Tags Publisher Published Linkhf:doc_categorieshf:doc_tagshf:doc_author
“Sauber und laufruhig im Reinraum” – ReinRaumTechnik 3/2023Energieführungssystem für die partikelfreie Halbleiterfertigung in den Anlagen von Heidelberg Instruments. Only available in German at this point.PressVPGWILEY VerlagMay, 2023pressvpgwiley-verlag
3D-printed Optics: Focused femtosecond pulses print optical components with subdiffraction-limited resolutionHigh-precision 3D printing provides a wide range of freedom in design for industrial fabrication of advanced optical components and products. LFW December Issue/2019Scientific PaperTwo-Photon Polymerization (TPP)Laser Focus WorldDecember, 2019scientific-papertwo-photon-polymerizationlaser-focus-world
A cleanroom in a gloveboxOur glovebox-integrated cleanroom achieves fabrication, characterization, and reduced facility costs in an oxygen-free and clean environment, enabling exploration of new materials, quantum phases and devices.Scientific PaperμPG 101Review of Scientific InstrumentsJuly, 2020scientific-paper%ce%bcpg-101review-of-scientific-instruments
Broadband imaging with one planar diffractive lensAchromatic diffractive lenses (ADLs) enable imaging across the visible spectrum, achieving diffraction-limited focusing and high numerical aperture. Cost-effective and scalable for widespread use.Scientific PaperGrayscale, μPG 101Scientific ReportsFebruary, 2018scientific-papergrayscale %ce%bcpg-101scientific-reports
Diffractive flat lens enables extreme depth-of-focus imagingMulti-level diffractive lens (MDL) designs drastically enhance depth of focus by over 4 orders of magnitude, enabling focus maintenance for objects separated by large distances.Scientific PaperGrayscale, μPG 101arXiv Physics/OpticsOctober, 2019scientific-papergrayscale %ce%bcpg-101arxiv-physics-optics
DWL 2000 GS / DWL 4000 GS Industrial Grayscale LithographyThe most advanced industrial grayscale lithography tool on the market.Fact SheetDWLHeidelberg InstrumentsNovember, 2021fact-sheetdwlheidelberg-instruments
DWL 66+ Ultimate Lithography SystemVersatile system for research and prototyping with variable resolution and wide selection of options.Fact SheetDWL 66Heidelberg InstrumentsApril, 2022fact-sheetdwl-66heidelberg-instruments
Grayscale with GenISys 3D-PECWe present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.Application NoteDirect-writing, DWL 66, GrayscaleGenISys GmbH, Heidelberg InstrumentsMarch, 2023application-notedirect-writing dwl-66 grayscalegenisys-gmbh heidelberg-instruments
Imaging over an unlimited bandwidth with a single diffractive surfaceBy allowing the phase in the image plane to be a free parameter, a single diffractive surface can correct chromatic aberrations over a wide bandwidth, …Scientific PaperGrayscale, μPG 101arXiv Physics/OpticsJuly, 2019scientific-papergrayscale %ce%bcpg-101arxiv-physics-optics
Impact of massive parallelization on two-photon absorption micro- and nanofabricationIn this paper, massive parallelization is demonstrated which was realized by using a beam splitting diffractive optical element (DOE).Scientific PaperTwo-Photon Polymerization (TPP)SPIE. Digital LibraryMarch, 2020scientific-papertwo-photon-polymerizationspie-digital-library
Increasing the density of passive photonic integrated circuits via nanophotonic cloakingWe utilize nanophotonic cloaking to enable closer spacing of photonic-integrated devices, overcoming signal cross-talk limitations. Experimental results demonstrate efficient transmission and compact designs.Scientific PaperGrayscale, μPG 101Nature CommunicationsNovember, 2016scientific-papergrayscale %ce%bcpg-101nature-communications
Large-area, high-numerical-aperture multi-level diffractive lens via inverse designInverse design enables the creation of thin, high-NA flat lenses. Multi-level diffractive lens (MDL) with a NA=0.9 at 850 nm wavelength, replicable via imprint lithography.Scientific PaperDWL 66, GrayscaleHeidelberg Instruments, OpticaMarch, 2020scientific-paperdwl-66 grayscaleheidelberg-instruments optica
Low-loss buried AlGaAs/AlOx waveguides using a quasi-planar processVia-hole oxidation process for forming buried oxide-confined waveguides, resulting in straight, low-loss waveguides with smooth interfaces, simplifying III-V-semiconductor-oxide photonic device fabrication.Scientific PaperDWLHAL open scienceOctober, 2017scientific-paperdwlhal-open-science
Manufacturing strategies for scalable high-precision 3D printing of structures from the micro to the macro rangeTwo-photon absorption (TPA) provides freedom in design for the fabrication of novel products that are not feasible with conventional techniques.Scientific PaperTwo-Photon Polymerization (TPP)Advanced Optical TechnologiesMay, 2019scientific-papertwo-photon-polymerizationadvanced-optical-technologies
MLA 150 Advanced Maskless AlignerThe fastest maskless tool for rapid prototyping, the alternative to the mask aligners.Fact SheetMLA 150Heidelberg InstrumentsNovember, 2021fact-sheetmla-150heidelberg-instruments
MLA 300 Industrial Maskless AlignerOptimised for industrial production with highest throughput and seamless integration into industrial production lines.Fact SheetMLA 300Heidelberg InstrumentsOctober, 2022fact-sheetmla-300heidelberg-instruments
MPO 100 3D Lithography ToolMulti-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.Fact SheetMPO 100, Two-Photon Polymerization (TPP)Heidelberg InstrumentsAugust, 2023fact-sheetmpo-100 two-photon-polymerizationheidelberg-instruments
NanoFrazor® Explore Nanofabrication ToolThermal scanning probe lithography tool with a direct laser sublimation and grayscale modules.Fact SheetNanoFrazor®, Thermal Scanning Probe (t-SPL)Heidelberg InstrumentsMarch, 2022fact-sheetnanofrazor thermal-scanning-probeheidelberg-instruments
NanoFrazor® Scholar Nanofabrication ToolTable-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.Fact SheetNanoFrazor®, Thermal Scanning Probe (t-SPL)Heidelberg InstrumentsMarch, 2022fact-sheetnanofrazor thermal-scanning-probeheidelberg-instruments
Neurite guidance and neuro-caging on steps and grooves in 2.5 dimensionsWe investigate neurite guidance using semiconductor industry-compatible techniques for fabricating modulated surfaces, enabling the cultivation and study of ordered neuronal networks in a 2.5D configuration.Scientific PaperDWL 66, GrayscaleNanoscale AdvancesJuly, 2020scientific-paperdwl-66 grayscalenanoscale-advances
Optimization of Laser Written Photomasks for Photonic Device ManufacturingSuccessful performance improvement of an ULTRA i-line laser writer for photonic device mask fabrication, reducing manufacturing costs. Thorough investigation and analysis identify optimal exposure strategies.Scientific PaperMask-making, ULTRAHeidelberg Instruments, SPIE. Digital LibrarySeptember, 2022scientific-papermask-making ultraheidelberg-instruments spie-digital-library
Outdoor measurements of a photovoltaic system using diffractive spectrum-splitting and concentrationPhotovoltaic system combining spectrum splitting and concentration using a planar diffractive optic, overcoming losses in single-bandgap absorbers & achieving a 25% increase in output power.Scientific PaperDirect-writing, μPG 101AIP AdvancesSeptember, 2016scientific-paperdirect-writing %ce%bcpg-101aip-advances
Overview on Maskless Grayscale LithographyFrom design to micro structured topography: Grayscale lithography can be used to quickly fabricate various 2.5D and 3D structures at the micro scale.VideoGrayscaleHeidelberg InstrumentsMay, 2023videograyscaleheidelberg-instruments
Phase-Controllable Synthesis of Ultrathin Molybdenum Nitride Crystals Via Atomic Substitution of MoS2Novel atomic substitution method creates highly conductive nonlayered molybdenum nitrides from MoS2, enabling potential nanoelectronics’ applications with maintained conductivity and stable contacts over weeks.Scientific PaperµMLAChemistry of MaterialsDecember, 2021scientific-paper%c2%b5mlachemistry-of-materials
Poly-Alanine-ε-Caprolacton-Methacrylate as Scaffold Material with Tuneable Biomechanical Properties for Osteochondral ImplantsStudy of fabrication of artificial structures for musculo-skeletal tissue engineering, which was done by Two-Photon-Polymerization (TPP).Scientific PaperTwo-Photon Polymerization (TPP)International Journal of Molecular SciencesMarch, 2022scientific-papertwo-photon-polymerizationinternational-journal-of-molecular-sciences
Rapid, Multianalyte Detection of Opioid Metabolites in WastewaterAptamer-based graphene field effect transistor (AptG-FET) platform detects three opioid metabolites in wastewater rapidly and inexpensively, providing a reliable alternative to costly laboratory-based techniques.Scientific PaperDirect-writing, µMLAACS NanoFebruary, 2022scientific-paperdirect-writing %c2%b5mlaacs-nano
Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithographyGrayscale lithography and hard-mask techniques allow for the creation of micrometer-scale features and nearly hemispherical solid immersion lenses in silicon carbide, enhancing optical collection efficiency …Scientific PaperDirect-writing, DWL 66, GrayscaleApplied Physics LettersApril, 2023scientific-paperdirect-writing dwl-66 grayscaleapplied-physics-letters
Selective Direct Laser Writing of Pyrolytic Carbon Microelectrodes in Absorber-Modified SU-8Low-power laser irradiation of SU-8 photoresist with an added absorber enables selective pyrolysis for simple and inexpensive patterning of pyrolytic carbon microelectrodes.Scientific PaperDirect-writing, µPGMicromachinesApril, 2021scientific-paperdirect-writing %c2%b5pgmicromachines
Sequential Drug Release Achieved with Dual-Compartment Microcontainers: Toward Combination TherapyMonodisperse dual-compartment microdevices with pH-sensitive polymer coatings enable tunable, sequential drug release in the gastrointestinal tract, providing a promising strategy for combination therapy.Scientific PaperDirect-writing, MLA 100Advanced TherapeuticsAugust, 2022scientific-paperdirect-writing mla-100advanced-therapeutics
Symmetry breaking of the surface mediated quantum Hall Effect in Bi2Se3 nanoplates using Fe3O4 substratesBottom surface-induced ferromagnetism in Bi2Se3 nanoplate devices on SiO2 and ferromagnetic insulator substrates decouples quantum Hall effects, revealing shifted half-integer QHEs in a three-channel model.Scientific PaperDirect-writing, μPG 101IOP ScienceJanuary, 2017scientific-paperdirect-writing %ce%bcpg-101iop-science
The Lithographer – Grayscale Lithography IssueThe Rise of Grayscale Lithography: Direct-write 3D patterning scaled from µm to nm. Grayscale Lithography Issue of The Lithographer, issued January 2020.The LithographerGrayscaleHeidelberg InstrumentsJanuary, 2020the-lithographergrayscaleheidelberg-instruments
The Lithographer – Quantum IssueThe Quantum Issue of The Lithographer, issued Fall 2020 Topics include: Maskless Aligners, Grayscale, 2D Materials, Quantum TechnologyThe LithographerDirect-writing, Grayscale, NanoFrazor®, Thermal Scanning Probe (t-SPL)Heidelberg InstrumentsOctober, 2020the-lithographerdirect-writing grayscale nanofrazor thermal-scanning-probeheidelberg-instruments
Thermal Scanning Probe Lithography – a reviewFundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here.Scientific PaperThermal Scanning Probe (t-SPL)Microsystems & NanoengineeringApril, 2020scientific-paperthermal-scanning-probemicrosystems-nanoengineering
Thermoelectric Properties of Band Structure Engineered Topological Insulator (Bi1− xSbx)2Te3 NanowiresNanowires are promising for thermoelectric applications, but the predicted performance enhancement has not been observed yet. Surface states play a crucial role in transport characteristics.Scientific PaperDirect-writing, μPG 101Advanced Energy MaterialsMay, 2015scientific-paperdirect-writing %ce%bcpg-101advanced-energy-materials
Threshold voltage reliability in flexible amorphous In–Ga–ZnO TFTs under simultaneous electrical and mechanical stressFlexible thin film transistors on 50 µm thick polyimide demonstrated stable behavior under simultaneous mechanical and electrical stress up to a 4 mm bending radius.Scientific PaperDirect-writing, DWL 66Flexible and Printed ElectronicsJune, 2022scientific-paperdirect-writing dwl-66flexible-and-printed-electronics
ULTRA Semiconductor Mask WriterA tool specifically designed to produce mature semiconductor photomasks.Fact SheetULTRAHeidelberg InstrumentsApril, 2022fact-sheetultraheidelberg-instruments
Ultra-thick positive photoresist layers for maskless grayscale lithographyGrayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.Scientific PaperDirect-writing, DWL 66, GrayscaleHeidelberg Instruments, SPIE. Digital LibraryApril, 2023scientific-paperdirect-writing dwl-66 grayscaleheidelberg-instruments spie-digital-library
Ultrasensitive UV-C detection based on MOCVD-grown highly crystalline ultrawide bandgap orthorhombic κ-Ga2O3Orthorhombic κ-Ga2O3 is a superior ultrawide bandgap material for extreme environments. We demonstrate ultrasensitive UV-C detection using Si-doped κ-Ga2O3 photodetectors.Scientific PaperµPGApplied Surface ScienceJanuary, 2023scientific-paper%c2%b5pgapplied-surface-science
Vertical sidewalls in thick epoxy resist – a challenge for laser-based direct write lithographyAchieve straight, vertical sidewalls in thick negative-tone resist using focused laser beam-based direct write lithography, overcoming non-homogeneous illumination and non-sharp edges. (Possible application: MEMS)Scientific PaperDirect-writing, DWL 66Micro and Nano EngineeringJune, 2023scientific-paperdirect-writing dwl-66micro-and-nano-engineering
Vertically Coupled Microdisk Resonators Using AlGaAs/AlOx TechnologyFirst experimental demonstration of vertically-coupled micro-disk resonators to buried access waveguides on III-V semiconductor using simplified three-dimensional integration scheme, achieving high-quality devices.Scientific PaperDirect-writing, DWLHAL open scienceOctober, 2017scientific-paperdirect-writing dwlhal-open-science
VPG 300 DI Maskless StepperMaskless direct imager for high-accuracy and high-resolution microstructures.Fact SheetVPGHeidelberg InstrumentsJuly, 2023fact-sheetvpgheidelberg-instruments
VPG+ 200 / VPG+ 400 Volume Pattern GeneratorA production tool for standard photomasks and microstructures in i-line resists.Fact SheetVPGHeidelberg InstrumentsJune, 2023fact-sheetvpgheidelberg-instruments
VPG+ 800 / VPG+ 1400 Volume Pattern GeneratorPhotomask production on large substrates, perfect for display applications.Fact SheetVPGHeidelberg InstrumentsJune, 2022fact-sheetvpgheidelberg-instruments
µMLA Tabletop Maskless AlignerConfigurable and compact tabletop maskless aligner with raster scan and vector exposure modules.Fact SheetµMLAHeidelberg InstrumentsOctober, 2022fact-sheet%c2%b5mlaheidelberg-instruments
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