Quantum Devices

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A Mega-Trend with High Demands on Lithography

Research and development activities for quantum devices are growing strongly and at a rapid pace worldwide. Future quantum devices promise to revolutionize computing, sensing, and data communication. Prototypes and ideas for quantum devices are very diverse and based on a wide variety of particles and quasi particles depending on their specific properties and interactions.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Non-invasive lithography which does not disturb the quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The 3D environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Non-invasive nanolithography

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the AFM or optical image

Accurate grayscale lithography

Used for control of 3D topographies down to the single nanometer

Application images

Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
Example of a tapered line showing the possibility to resolve 500 nm line width through 1.5 µm thick resist.
Example of a tapered line showing the possibility to resolve 500 nm line width through 1.5 µm thick resist.
An array of SQUIDs (superconducting quantum inteference device)
An array of SQUIDs (superconducting quantum interference device) used for the readout of metallic magnetic microcalorimeters (high-resolution particle detectors operated at low temperatures). (Courtesy of the Kirchhoff Institute for Physics (KIP), Heidelberg University)
Atomic memristors
Sharp vertical Ag electrodes made with the NanoFrazor® tip. (Courtesy of Prof. Leuthold group, ETH Zurich, Publication in 2019)
Gate electrode arrays
Quantum bus in silicon with an array of gate electrodes atop metal leads fabricated previously by electron beam lithography. (Courtesy of Heidelberg Instruments Nano & Dr. Lars Schreiber, RWTH Aachen, Germany)
AFM image of an MBE-grown Ge nanoribbon
AFM image of an MBE-grown Ge nanoribbon (blue line in the inset) with top gates patterned by NanoFrazor®. The device is fabricated in order to study the topological states in the ribbon. (Courtesy of Prof. Georgios Katsaros, IST Austria and Heidelberg Instruments Nano)
Silicon quantum dot single electron transistors
Silicon quantum dot single electron transistors
Photonic molecules
Gaussians with varying distance ∆x written in PPA and etched into SiO2, to be stacked in distributed Bragg reflector, forming a photonic molecule. Precise Gaussian profile is patterned using the NanoFrazor® and the closed-loop lithography approach. (Courtesy of IBM Research Zurich, publication in 2018)
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suitable Systems

NanoFrazor Scholar – the academic nanofabrication tool for nanopatterning of quantum devices, grayscale photonics and more

NanoFrazor® Scholar

  • Thermal Scanning Probe Lithography System

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

NanoFrazor Explore – Thermal Scanning Probe lithography with direct laser sublimation and grayscale patterning capability

NanoFrazor® Explore

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

µMLA – the perfect entry-level research and development (R&D) tool for virtually any application requiring microstructures

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

MLA 150 – a maskless lithography tool for nanofabrication of quantum devices, MEMS, micro-optics and other applications

MLA 150

  • Maskless Aligner

The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.

DWL 66+ – a laser lithography tool for R&D in microelectronics, MEMS, microfluidics and more with Grayscale exposure mode

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

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