Quantum Devices

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A Mega-Trend with High Demands on Lithography

  • Description

  • There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

    To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ series produces high-precision masks suitable for mass manufacturing. Our Maskless Aligners (MLA) are ideal for multi-layer device fabrication. The ULTRA Semiconductor Mask Writer offers high-resolution, high-precision direct-write lithography, which is essential for fabricating structures at the nanoscale—key for quantum technologies such as superconducting circuits, quantum dots, and photonic quantum chips.

    In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

    With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

  • Requirements

  • Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

    Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

    Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

    The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

    Rapid prototyping is a significant advantage in a dynamic research field

  • Solutions

  • Ultra-high resolution

    Required for well-defined features and gaps with low edge roughness

    Damage-free nanolithography (NanoFrazor)

    Non-destructive technique without using high-energy charged beams allows working with sensitive materials

    Accurate overlay

    Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

    Accurate grayscale lithography

    Used for control of grayscale topographies down to the single nanometer

There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ series produces high-precision masks suitable for mass manufacturing. Our Maskless Aligners (MLA) are ideal for multi-layer device fabrication. The ULTRA Semiconductor Mask Writer offers high-resolution, high-precision direct-write lithography, which is essential for fabricating structures at the nanoscale—key for quantum technologies such as superconducting circuits, quantum dots, and photonic quantum chips.

In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Rapid prototyping is a significant advantage in a dynamic research field

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Damage-free nanolithography (NanoFrazor)

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

Accurate grayscale lithography

Used for control of grayscale topographies down to the single nanometer

Application images

quantum device example: waveguide patterned in positive resist
Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
quantum device example: 2 µm lines and circles in thick positive resist
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
quantum device example: rings exposed with MLA 150
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
quantum device example: exposure showing 2 µm lines on a DWL 66+
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
An array of SQUIDs (superconducting quantum inteference device)
MLA 150: An array of SQUIDs (superconducting quantum interference device) used for the readout of metallic magnetic microcalorimeters (high-resolution particle detectors operated at low temperatures). (Courtesy of the Kirchhoff Institute for Physics (KIP), Heidelberg University)
quantum device example: atomic memristors
Sharp vertical Ag electrodes made with the NanoFrazor tip. (Courtesy of Prof. Leuthold group, ETH Zurich, Publication in 2019)
example of quantum devices: AFM image of an MBE-grown Ge nanoribbon
AFM image of an MBE-grown Ge nanoribbon (blue line in the inset) with top gates patterned by NanoFrazor. The device is fabricated in order to study the topological states in the ribbon. (Courtesy of Prof. Georgios Katsaros, IST Austria and Heidelberg Instruments Nano)
quantum devices example: Silicon quantum dot single electron transistors
NanoFrazor: Silicon quantum dot single electron transistors
quantum devices example: Photonic molecules
Gaussians with varying distance ∆x fabricated using PPA lithography and transferred onto a SiO2 substrate, to be stacked in a distributed Bragg reflector, forming a photonic molecule structure. A precise Gaussian profile is patterned using the NanoFrazor and the closed-loop lithography approach. (Courtesy of IBM Research Zurich, publication in 2018)

suitable Systems

µMLA Tabletop Maskless Aligner

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

DWL 66+

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

DWL 4000 GS Laser Lithography System

DWL 2000 GS / DWL 4000 GS

  • Direct Write Laser Lithography System

The most advanced industrial grayscale lithography tool on the market.

MLA 150 Maskless Aligner

MLA 150

  • Maskless Aligner

The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.

NanoFrazor tabletop

NanoFrazor

  • Thermal Scanning Probe Lithography System

Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D. 

VPG+ 800 Volume Pattern Generator

VPG+ 200, VPG+ 400, and VPG+ 800

  • Volume Pattern Generator

Powerful production tools for standard photomasks and microstructures in i-line resists.

ULTRA Semiconductor Mask Writer

ULTRA

  • Laser Mask Writer

A tool specifically designed to produce mature semiconductor photomasks.

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