Quantum Devices
A Mega-Trend with High Demands on Lithography
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Description
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There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.
To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ series produces high-precision masks suitable for mass manufacturing. Our Maskless Aligners (MLA) are ideal for multi-layer device fabrication. The ULTRA Semiconductor Mask Writer offers high-resolution, high-precision direct-write lithography, which is essential for fabricating structures at the nanoscale—key for quantum technologies such as superconducting circuits, quantum dots, and photonic quantum chips.
In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.
With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.
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Requirements
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Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)
Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)
Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)
The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices
Rapid prototyping is a significant advantage in a dynamic research field
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Solutions
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Ultra-high resolution
Required for well-defined features and gaps with low edge roughnessDamage-free nanolithography (NanoFrazor)
Non-destructive technique without using high-energy charged beams allows working with sensitive materialsAccurate overlay
Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)Accurate grayscale lithography
Used for control of grayscale topographies down to the single nanometer
There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.
To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ series produces high-precision masks suitable for mass manufacturing. Our Maskless Aligners (MLA) are ideal for multi-layer device fabrication. The ULTRA Semiconductor Mask Writer offers high-resolution, high-precision direct-write lithography, which is essential for fabricating structures at the nanoscale—key for quantum technologies such as superconducting circuits, quantum dots, and photonic quantum chips.
In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.
With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.
Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)
Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)
Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)
The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices
Rapid prototyping is a significant advantage in a dynamic research field
Ultra-high resolution
Damage-free nanolithography (NanoFrazor)
Accurate overlay
Accurate grayscale lithography
Application images
suitable Systems
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
DWL 2000 GS / DWL 4000 GS
- Direct Write Laser Lithography System
The most advanced industrial grayscale lithography tool on the market.
MLA 150
- Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.
NanoFrazor
- Thermal Scanning Probe Lithography System
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
VPG+ 200, VPG+ 400, and VPG+ 800
- Volume Pattern Generator
Powerful production tools for standard photomasks and microstructures in i-line resists.
ULTRA
- Laser Mask Writer
A tool specifically designed to produce mature semiconductor photomasks.