Quantum Devices

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A Mega-Trend with High Demands on Lithography

  • Description

  • There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

    To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

    In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

    With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

  • Requirements

  • Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

    Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

    Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

    The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

    Rapid prototyping is a significant advantage in a dynamic research field.

  • Solutions

  • Ultra-high resolution

    Required for well-defined features and gaps with low edge roughness

    Damage-free nanolithography (NanoFrazor)

    Non-destructive technique without using high-energy charged beams allows working with sensitive materials

    Accurate overlay

    Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

    Accurate grayscale lithography

    Used for control of grayscale topographies down to the single nanometer

    3D micro printing of optical interconnects

    Used for high bandwidth data transmission and low power consumption (MPO 100)

There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor, renowned for its ultra-high resolution capabilities. It allows for precise fabrication while minimizing damage, and provides a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Rapid prototyping is a significant advantage in a dynamic research field.

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Damage-free nanolithography (NanoFrazor)

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

Accurate grayscale lithography

Used for control of grayscale topographies down to the single nanometer

3D micro printing of optical interconnects

Used for high bandwidth data transmission and low power consumption (MPO 100)

Application images

quantum device example: waveguide patterned in positive resist
Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
quantum device example: 2 µm lines and circles in thick positive resist
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
quantum device example: rings exposed with MLA 150
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
quantum device example: exposure showing 2 µm lines on a DWL 66+
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
An array of SQUIDs (superconducting quantum inteference device)
MLA 150: An array of SQUIDs (superconducting quantum interference device) used for the readout of metallic magnetic microcalorimeters (high-resolution particle detectors operated at low temperatures). (Courtesy of the Kirchhoff Institute for Physics (KIP), Heidelberg University)
quantum device example: atomic memristors
Sharp vertical Ag electrodes made with the NanoFrazor tip. (Courtesy of Prof. Leuthold group, ETH Zurich, Publication in 2019)
example of quantum devices: AFM image of an MBE-grown Ge nanoribbon
AFM image of an MBE-grown Ge nanoribbon (blue line in the inset) with top gates patterned by NanoFrazor. The device is fabricated in order to study the topological states in the ribbon. (Courtesy of Prof. Georgios Katsaros, IST Austria and Heidelberg Instruments Nano)
quantum devices example: Silicon quantum dot single electron transistors
NanoFrazor: Silicon quantum dot single electron transistors
quantum devices example: Photonic molecules
Gaussians with varying distance ∆x fabricated using PPA lithography and transferred onto a SiO2 substrate, to be stacked in a distributed Bragg reflector, forming a photonic molecule structure. A precise Gaussian profile is patterned using the NanoFrazor and the closed-loop lithography approach. (Courtesy of IBM Research Zurich, publication in 2018)

suitable Systems

µMLA – the perfect entry-level research and development (R&D) tool for virtually any application requiring microstructures

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

DWL 66

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

DWL 2000 GS and DWL 4000 GS industrial-level grayscale lithography for masks and wafers for IC, MEMS, micro-optic, and more

DWL 2000 GS / DWL 4000 GS

  • Direct Write Laser Lithography System

The most advanced industrial grayscale lithography tool on the market.

MLA 150 – a maskless lithography tool for nanofabrication of quantum devices, MEMS, micro-optics and other applications

MLA 150

  • Maskless Aligner

The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.

MLA 300 – industrial maskless aligner for production of sensors, MEMS, microfluidics, advanced packaging, displays, and more

MLA 300

  • Maskless Aligner

Optimized for flexible industrial production with highest precision and seamless integration into industrial production lines.

MPO 100 – a TPP tool for 3D Lithography and 3D Microprinting for optics, photonics, mechanics, and biomedical engineering

MPO 100

  • Two-Photon Polymerization Multi-User Tool

Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.

NanoFrazor tabletop

NanoFrazor

  • Thermal Scanning Probe Lithography System

Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D. 

ULTRA – a laser mask writer for semiconductor photomasks, which are the basis for electronic devices such as microcontrollers

ULTRA

  • Laser Mask Writer

A tool specifically designed to produce mature semiconductor photomasks.

VPG+ 200 and VPG+ 400 – Volume Pattern Generators designed for i-line resist applications like MEMS and advanced packaging

VPG+ 200 / VPG+ 400

  • Volume Pattern Generator

A production tool for standard photomasks and microstructures in i-line resists.

The VPG+ 800 and VPG+ 1400 – Large-area volume pattern generators for the display industry, for advanced packaging, and more

VPG+ 800 / VPG+ 1400

  • Volume Pattern Generator

Photomask production on large substrates, perfect for display applications.

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