Quantum Devices

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A Mega-Trend with High Demands on Lithography

  • Description

  • There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

    To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor® systems, renowned for their ultra-high resolution capabilities. These systems allow for precise fabrication, minimizing damage and providing a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 tool is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

    In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor® stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

    With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

  • Requirements

  • Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

    Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

    Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

    The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

    Rapid prototyping is a significant advantage in a dynamic research field.

  • Benefits

  • Ultra-high resolution

    Required for well-defined features and gaps with low edge roughness

    Damage-free nanolithography

    Non-destructive technique without using high-energy charged beams allows working with sensitive materials

    Accurate overlay

    Possible by simply drawing the electrodes onto the topography or optical image

    Accurate grayscale lithography

    Used for control of grayscale topographies down to the single nanometer

    3D micro printing of optical interconnects

    Used for high bandwidth data transmission and low power consumption

There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor® systems, renowned for their ultra-high resolution capabilities. These systems allow for precise fabrication, minimizing damage and providing a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 tool is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor® stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Rapid prototyping is a significant advantage in a dynamic research field.

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Damage-free nanolithography

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the topography or optical image

Accurate grayscale lithography

Used for control of grayscale topographies down to the single nanometer

3D micro printing of optical interconnects

Used for high bandwidth data transmission and low power consumption

Application images

Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
Waveguide 2 µm wide patterned with a DWL 66+ (WM HiRes @ 405 nm) in a positive resist AZ 1512 HS.
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
Results obtained on a DWL 66+ laser lithography system. The image shows 2 µm lines and circles in a 1.5 µm thick positive resist. The distance between the lines and circles is 500 nm.
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
Rings exposed with a MLA 150 (WM I @ 375 nm) in a negative resist ma-N1405, diameter: 12 µm, width: 800 nm, thickness: 800 nm
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
Exposure showing 2 µm lines on a DWL 66+ laser lithography system. The distance between the lines and circles is 500 nm.
An array of SQUIDs (superconducting quantum inteference device)
An array of SQUIDs (superconducting quantum interference device) used for the readout of metallic magnetic microcalorimeters (high-resolution particle detectors operated at low temperatures). (Courtesy of the Kirchhoff Institute for Physics (KIP), Heidelberg University)
Atomic memristors
Sharp vertical Ag electrodes made with the NanoFrazor® tip. (Courtesy of Prof. Leuthold group, ETH Zurich, Publication in 2019)
AFM image of an MBE-grown Ge nanoribbon
AFM image of an MBE-grown Ge nanoribbon (blue line in the inset) with top gates patterned by NanoFrazor®. The device is fabricated in order to study the topological states in the ribbon. (Courtesy of Prof. Georgios Katsaros, IST Austria and Heidelberg Instruments Nano)
Silicon quantum dot single electron transistors
Silicon quantum dot single electron transistors
Photonic molecules
Gaussians with varying distance ∆x fabricated using PPA lithography and transferred onto a SiO2 substrate, to be stacked in a distributed Bragg reflector, forming a photonic molecule structure. A precise Gaussian profile is patterned using the NanoFrazor® and the closed-loop lithography approach. (Courtesy of IBM Research Zurich, publication in 2018)
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suitable Systems

NanoFrazor Scholar – the academic nanofabrication tool for nanopatterning of quantum devices, grayscale photonics and more

NanoFrazor® Scholar

  • Thermal Scanning Probe Lithography System

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

NanoFrazor Explore – Thermal Scanning Probe lithography with direct laser sublimation and grayscale patterning capability

NanoFrazor® Explore

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

µMLA – the perfect entry-level research and development (R&D) tool for virtually any application requiring microstructures

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

MLA 150 – a maskless lithography tool for nanofabrication of quantum devices, MEMS, micro-optics and other applications

MLA 150

  • Maskless Aligner

The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.

DWL 66+ – a laser lithography tool for R&D in microelectronics, MEMS, microfluidics and more with Grayscale exposure mode

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

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