Quantum Devices

A Mega-Trend with High Demands on Lithography

  • Description

  • There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

    To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor systems, renowned for their ultra-high resolution capabilities. These systems allow for precise fabrication, minimizing damage and providing a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 tool is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

    In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

    With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

  • Requirements

  • Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

    Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

    Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

    The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

    Rapid prototyping is a significant advantage in a dynamic research field.

  • Solutions

  • Ultra-high resolution

    Required for well-defined features and gaps with low edge roughness

    Damage-free nanolithography (NanoFrazor)

    Non-destructive technique without using high-energy charged beams allows working with sensitive materials

    Accurate overlay

    Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

    Accurate grayscale lithography

    Used for control of grayscale topographies down to the single nanometer

    3D micro printing of optical interconnects

    Used for high bandwidth data transmission and low power consumption (MPO 100)

There is a remarkable and rapidly growing interest in research and development activities focused on quantum devices worldwide. The potential of these future quantum devices to revolutionize computing, sensing, and data communication is tremendous. The prototypes and concepts for quantum devices are incredibly diverse, relying on a wide range of particles and quasi-particles, each chosen for their unique properties and interactions.

To support the advancements in quantum research, Heidelberg Instruments offers a comprehensive portfolio of tools that can manufacture various structures crucial for different areas of quantum research. Our extensive toolset includes the NanoFrazor systems, renowned for their ultra-high resolution capabilities. These systems allow for precise fabrication, minimizing damage and providing a bridge to future production. Additionally, our DWL series enables the creation of 2.5D topographies, while the VPG+ produces high-precision masks suitable for mass manufacturing. The MPO 100 tool is designed for manufacturing 3D micro-structures, and our Maskless Aligners (MLA) are ideal for multi-layer device fabrication.

In particular, the direct write lithography capabilities combined with high resolution offered by Heidelberg Instruments’ tools facilitate the development and production of quantum devices. Notably, the NanoFrazor stands out with its markerless overlay feature, leveraging the integrated reader for accurate alignment of multiple active regions on top of each other.

With Heidelberg Instruments’ portfolio of tools, researchers and engineers in the quantum field have access to advanced fabrication capabilities that enable them to push the boundaries of quantum device development. These tools support the realization of diverse quantum device concepts, paving the way for future breakthroughs in quantum computing, sensing, and data communication.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Damage-free lithography, without deleterious effects on quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The grayscale environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Rapid prototyping is a significant advantage in a dynamic research field.

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Damage-free nanolithography (NanoFrazor)

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the topography or optical image (NanoFrazor & MLA series)

Accurate grayscale lithography

Used for control of grayscale topographies down to the single nanometer

3D micro printing of optical interconnects

Used for high bandwidth data transmission and low power consumption (MPO 100)

Application images

suitable Systems

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