Quantum Devices

A Mega-Trend with High Demands on Lithography

Research and development activities for quantum devices are growing strongly and at a rapid pace worldwide. Future quantum devices promise to revolutionize computing, sensing, and data communication. Prototypes and ideas for quantum devices are very diverse and based on a wide variety of particles and quasi particles depending on their specific properties and interactions.

Ultra-high resolution patterning for well-defined structures (e.g., for tunneling gaps or plasmonic cavities)

Non-invasive lithography which does not disturb the quantum materials (e.g., topological insulators)

Fast and accurate placement of electrodes on low-dimensional materials with unknown positions (2D material flakes, dispersed nanowires, etc.)

The 3D environment and topography can be crucial for fine-tuning photon interactions in quantum devices

Ultra-high resolution

Required for well-defined features and gaps with low edge roughness

Non-invasive nanolithography

Non-destructive technique without using high-energy charged beams allows working with sensitive materials

Accurate overlay

Possible by simply drawing the electrodes onto the AFM or optical image

Accurate grayscale lithography

Used for control of 3D topographies down to the single nanometer

Application images

Systems

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