MPO 100

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Advanced Two-Photon Polymerization Tool for 3D Lithography and Microprinting

  • Product Description

  • Discover the MPO 100, Heidelberg Instruments’ state-of-the-art multi-user tool designed for 3D Lithography and 3D Microprinting of complex microstructures. Utilizing advanced Two-Photon Polymerization (TPP), the MPO 100 excels in applications across micro-optics, photonics, micromechanics, and biomedical engineering. This versatile platform offers unmatched precision and throughput, enabling the production of intricate functional microstructures in a single, efficient process step.

    Key Features

    • High Precision and Throughput: Achieve superior precision with a minimum feature size down to 100 nm. Benefit from high-speed 3D printing with scan speeds exceeding 1000 mm/s as well as Voxel Tuning.
    • Versatile Material Compatibility: Leverage the powerful femtosecond laser system at 522 nm for efficient processing of various polymers. Utilize industry-proven ORMOCER® hybrid polymers for exceptional optical, mechanical, and chemical properties.
    • Stitching-Free Microoptics: Create precise micro-optical components without stitching via the unique Infinite Field-of-View (IFoV) fabrication mode.
    • Modular 3D Printing Platform: Switch seamlessly between 3D Lithography and 3D Microprinting with application-specific write modes and substrate holders. Fabricate macrostructures over 1 cm in height and microstructures with surface roughness as low as 10 nm.
    • Voxel Tuning Capability: Fine-tuning of voxel dimensions during scanning to reduce the number of layers required.

    Applications

    • Micro-Optics: Create high-precision micro-optical components without stitching, ensuring seamless integration.
    • Photonics: Directly write photonic devices onto substrates, optimizing device performance and integration.
    • Micromechanics: Produce complex micromechanical structures with high accuracy and reliability.
    • Biomedical Engineering: Fabricate intricate biomedical devices and scaffolds tailored to specific applications.
    • Quantum Devices: Develop advanced quantum devices with high precision and customization for cutting-edge research and applications.

    Explore the MPO 100 Today

    Whether you’re in academia or industry, our advanced tool offers the precision, versatility, and throughput you need for your most demanding projects. It allows you to develop new material systems with its capability to work with highly sensitive photoresists at 522 nm. Unlock the potential of 3D Lithography and Microprinting and enhance your research and development projects in microfluidics, quantum devices, and more.

    Contact us to learn more about the MPO 100 and how it can benefit your research and production needs.

    Discover the MPO 100, Heidelberg Instruments’ state-of-the-art multi-user tool designed for 3D Lithography and 3D Microprinting of complex microstructures. Utilizing advanced Two-Photon Polymerization (TPP), the MPO 100 excels in applications across micro-optics, photonics, micromechanics, and biomedical engineering. This versatile platform offers unmatched precision and throughput, enabling the production of intricate functional microstructures in a single, efficient process step.

    Key Features

    • High Precision and Throughput: Achieve superior precision with a minimum feature size down to 100 nm. Benefit from high-speed 3D printing with scan speeds exceeding 1000 mm/s as well as Voxel Tuning.
    • Versatile Material Compatibility: Leverage the powerful femtosecond laser system at 522 nm for efficient processing of various polymers. Utilize industry-proven ORMOCER® hybrid polymers for exceptional optical, mechanical, and chemical properties.
    • Stitching-Free Microoptics: Create precise micro-optical components without stitching via the unique Infinite Field-of-View (IFoV) fabrication mode.
    • Modular 3D Printing Platform: Switch seamlessly between 3D Lithography and 3D Microprinting with application-specific write modes and substrate holders. Fabricate macrostructures over 1 cm in height and microstructures with surface roughness as low as 10 nm.
    • Voxel Tuning Capability: Fine-tuning of voxel dimensions during scanning to reduce the number of layers required.

    Applications

    • Micro-Optics: Create high-precision micro-optical components without stitching, ensuring seamless integration.
    • Photonics: Directly write photonic devices onto substrates, optimizing device performance and integration.
    • Micromechanics: Produce complex micromechanical structures with high accuracy and reliability.
    • Biomedical Engineering: Fabricate intricate biomedical devices and scaffolds tailored to specific applications.
    • Quantum Devices: Develop advanced quantum devices with high precision and customization for cutting-edge research and applications.

    Explore the MPO 100 Today

    Whether you’re in academia or industry, our advanced tool offers the precision, versatility, and throughput you need for your most demanding projects. It allows you to develop new material systems with its capability to work with highly sensitive photoresists at 522 nm. Unlock the potential of 3D Lithography and Microprinting and enhance your research and development projects in microfluidics, quantum devices, and more.

    Contact us to learn more about the MPO 100 and how it can benefit your research and production needs.

  • Product Highlights

  • Printing Height

    Structures taller than 1 cm

    Surface Quality

    Smooth surfaces with roughness down to 10 nm

    High-Resolution Print

    Feature sizes smaller than 100 nm

    High-Speed 3D Microfabrication

    High scan speeds over 1000 mm/s

    Stable Printing Environment

    Temperature controlled flowbox down to ± 0.1 °C with ISO 4 environment

    Large Printing Area

    Print area of 100 x 100 mm2

    Stitching-Free Fabrication

    Synchronized scanning system enables stitching-free fabrication

    Versatility

    Various exposure and write modes tailored to the specific applications

    Industry-Proven Materials

    High-speed processing of ORMOCER®s (hybrid polymers) and other photoresists

    User-Friendly

    Optional software modules for customer-specific print jobs

    Voxel Tuning

    Fine-tuning of voxel dimensions during scanning to reduce the number of layers required

  • Available Modules

Discover the MPO 100, Heidelberg Instruments’ state-of-the-art multi-user tool designed for 3D Lithography and 3D Microprinting of complex microstructures. Utilizing advanced Two-Photon Polymerization (TPP), the MPO 100 excels in applications across micro-optics, photonics, micromechanics, and biomedical engineering. This versatile platform offers unmatched precision and throughput, enabling the production of intricate functional microstructures in a single, efficient process step.

Key Features

  • High Precision and Throughput: Achieve superior precision with a minimum feature size down to 100 nm. Benefit from high-speed 3D printing with scan speeds exceeding 1000 mm/s as well as Voxel Tuning.
  • Versatile Material Compatibility: Leverage the powerful femtosecond laser system at 522 nm for efficient processing of various polymers. Utilize industry-proven ORMOCER® hybrid polymers for exceptional optical, mechanical, and chemical properties.
  • Stitching-Free Microoptics: Create precise micro-optical components without stitching via the unique Infinite Field-of-View (IFoV) fabrication mode.
  • Modular 3D Printing Platform: Switch seamlessly between 3D Lithography and 3D Microprinting with application-specific write modes and substrate holders. Fabricate macrostructures over 1 cm in height and microstructures with surface roughness as low as 10 nm.
  • Voxel Tuning Capability: Fine-tuning of voxel dimensions during scanning to reduce the number of layers required.

Applications

  • Micro-Optics: Create high-precision micro-optical components without stitching, ensuring seamless integration.
  • Photonics: Directly write photonic devices onto substrates, optimizing device performance and integration.
  • Micromechanics: Produce complex micromechanical structures with high accuracy and reliability.
  • Biomedical Engineering: Fabricate intricate biomedical devices and scaffolds tailored to specific applications.
  • Quantum Devices: Develop advanced quantum devices with high precision and customization for cutting-edge research and applications.

Explore the MPO 100 Today

Whether you’re in academia or industry, our advanced tool offers the precision, versatility, and throughput you need for your most demanding projects. It allows you to develop new material systems with its capability to work with highly sensitive photoresists at 522 nm. Unlock the potential of 3D Lithography and Microprinting and enhance your research and development projects in microfluidics, quantum devices, and more.

Contact us to learn more about the MPO 100 and how it can benefit your research and production needs.

Discover the MPO 100, Heidelberg Instruments’ state-of-the-art multi-user tool designed for 3D Lithography and 3D Microprinting of complex microstructures. Utilizing advanced Two-Photon Polymerization (TPP), the MPO 100 excels in applications across micro-optics, photonics, micromechanics, and biomedical engineering. This versatile platform offers unmatched precision and throughput, enabling the production of intricate functional microstructures in a single, efficient process step.

Key Features

  • High Precision and Throughput: Achieve superior precision with a minimum feature size down to 100 nm. Benefit from high-speed 3D printing with scan speeds exceeding 1000 mm/s as well as Voxel Tuning.
  • Versatile Material Compatibility: Leverage the powerful femtosecond laser system at 522 nm for efficient processing of various polymers. Utilize industry-proven ORMOCER® hybrid polymers for exceptional optical, mechanical, and chemical properties.
  • Stitching-Free Microoptics: Create precise micro-optical components without stitching via the unique Infinite Field-of-View (IFoV) fabrication mode.
  • Modular 3D Printing Platform: Switch seamlessly between 3D Lithography and 3D Microprinting with application-specific write modes and substrate holders. Fabricate macrostructures over 1 cm in height and microstructures with surface roughness as low as 10 nm.
  • Voxel Tuning Capability: Fine-tuning of voxel dimensions during scanning to reduce the number of layers required.

Applications

  • Micro-Optics: Create high-precision micro-optical components without stitching, ensuring seamless integration.
  • Photonics: Directly write photonic devices onto substrates, optimizing device performance and integration.
  • Micromechanics: Produce complex micromechanical structures with high accuracy and reliability.
  • Biomedical Engineering: Fabricate intricate biomedical devices and scaffolds tailored to specific applications.
  • Quantum Devices: Develop advanced quantum devices with high precision and customization for cutting-edge research and applications.

Explore the MPO 100 Today

Whether you’re in academia or industry, our advanced tool offers the precision, versatility, and throughput you need for your most demanding projects. It allows you to develop new material systems with its capability to work with highly sensitive photoresists at 522 nm. Unlock the potential of 3D Lithography and Microprinting and enhance your research and development projects in microfluidics, quantum devices, and more.

Contact us to learn more about the MPO 100 and how it can benefit your research and production needs.

Printing Height

Structures taller than 1 cm

Surface Quality

Smooth surfaces with roughness down to 10 nm

High-Resolution Print

Feature sizes smaller than 100 nm

High-Speed 3D Microfabrication

High scan speeds over 1000 mm/s

Stable Printing Environment

Temperature controlled flowbox down to ± 0.1 °C with ISO 4 environment

Large Printing Area

Print area of 100 x 100 mm2

Stitching-Free Fabrication

Synchronized scanning system enables stitching-free fabrication

Versatility

Various exposure and write modes tailored to the specific applications

Industry-Proven Materials

High-speed processing of ORMOCER®s (hybrid polymers) and other photoresists

User-Friendly

Optional software modules for customer-specific print jobs

Voxel Tuning

Fine-tuning of voxel dimensions during scanning to reduce the number of layers required

Customer applications

3D scaffold structures for biomedical applications
3D scaffold structures for biomedical applications such as implants in regenerative medicine. Poly-Implant-Druck project, FKZ: 13XP5089D
micro-optics micro-optical elements fabricated with Two-Photon-Polymerization
High-quality micro-optical elements with varying shapes (e.g., freeform) and sizes can be fabricated either on planar substrates or directly on active/passive devices.
Metalens with elements down to 100 nm lateral dimensions. PHENOmenon, EU-funded project, GA 780278
Metalens with elements down to 100 nm lateral dimensions. PHENOmenon, EU-funded project, GA 780278
3D structures in the form of the Heidelberg Instruments logo
3D structures for diverse applications such as optics, mechanics, and life science can be fabricated at high speed.
Vertical lens system: Entire optical systems can be fabricated in a single process step without the need for alignment.
Vertical lens system: Entire optical systems can be fabricated in a single process step without the need for alignment.
micro-optics element called metalens fabricated in one step
Metalens for visible light: One-step fabrication of a planar metalens with novel functionalities. PHENOmenon is an EU-funded project (Grant Agreement 780278).
Microlens on EEL facet: Cylindrical microlens fabricated directly on the facet of a DFB laser
Microlens on EEL facet: Cylindrical microlens fabricated directly on the facet of a DFB laser to compensate the elliptical beam profile.
(Courtesy of nanoplus Nanosystems and Technologies GmbH)
Bone-cartilage scaffold used in biomedical applications
Bone-cartilage scaffold: 3D scaffold structures with micro- and macroporosity for bone cartilage implants. Design by iba Heiligenstadt e.V. Grant FKZ: 13XP5089D
Microfluidic reactor: Microfluidic structures with high complexity
Microfluidic reactor: Microfluidic structures with high complexity and with tunable channel width.
Retro-reflector: Fabrication of high-quality masters
Retroreflector combined with a Reflectance Extension Module (REM) created with the MPO 100.

Why customers choose our systems

“Center for Advanced Electronic Materials and Devices (AEMD) in Shanghai Jiao Tung University (SJTU) is an university-level open research platform on micro-nano fabrication and testing. It supports not only the cutting-edge research work at SJTU or from other affiliates, but also the advanced project development on new technologies or products from industry. With the help of the MPO 100 from Heidelberg Instruments, AEMD will further expand the nanofabrication capabilities, especially in the components or devices with 3D structures on micro/nano optics, silicon photonics, biomedical engineering, MEMS, etc.”

Professor Xiulan Cheng
Director of Center for Advanced Electronic Materials and Devices
Shanghai Jiao Tung University
Shanghai, China

Technical Data

Performance
Print height (max.)≥ 1 cm
Roughness (min.)≤ 10 nm
Minimum feature size ≤ 100 nm (lateral)
Scan speed (max.)10 m/s divided by magnification (e.g. 1000 mm/s for 10x)
Materials (additive or subtractive)ORMOCER®s, SU-8, customer-specific resins, AZ-series,
ma-P 1200, metal layers (e.g. Ag, Au, Cr, ...)
Structuring modesScan-and-Step with advanced stitching algorithms
Stage only for stitching-free fabrication
Synchronized Infinite Field-of-View (IFoV) for stitching-free fabrication
Scan strategyConventional layer-by-layer fabrication
Voxel Tuning with intensity variation during hatching
System features
Laserλ = (522 ± 3) nm    τpulse ≤ 250 fs    frep = (63 ± 0.6) MHz
Pmean ≥ 600 mW    Epulse > 10 nJ
Laser power at focusing optics (max.)≥ 200 mW
Focusing opticsNumerical aperture: 0.2 (air) to 1.4 (immersion)
Magnification: 5x to 100x
Field-of-View (FoV): up to 2 mm
Print area100 x 100 mm2
AutofocusOptical detection of interfaces down to 20 nm
SubstrateSize: up to 8", Thickness: up to 4 cm
SoftwareLithoSoft3D (code generation software)   
LithoStream (system control software)
Translation axisElectromagnetic direct drive, air bearing
Accuracy: ± 0.2 µm per axis (over full travel range)
Repeatability: down to ± 0.05 µm per axis (over full travel range)
Synchronization with galvoscanner
Temperature controlled flow boxControl down to ± 0.1°, ISO Class 4 cleanroom environment
System dimensions (TPP unit)
Footprint1300 mm × 1100 mm × 2160 mm
Weight< 1000 kg
Installation requirements
Electrical115/230 V, 50/60 Hz, 16 A
Optimum lab conditionsTemperature: 21 °C ± 1 °C    
Humidity: 40 – 80 % non-condensing
Compressed air6 - 8 bar, stability ± 0.5 bar
Room lightingYellow light

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on write mode. Design and specifications are subject to change without prior notice.

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