Blog

Nano-Micro-Lithography Symposium

Progress in nanofabrication never stops. Tools and processes keep evolving, enabling devices that were not feasible just a few years ago. The annual – and already traditional – Nano-Micro-Lithography Symposium is a place where you can get all important updates about the available solutions for making advanced devices.

On June 30, starting at 10 am CEST online,
experts in various areas of direct writing will share their latest developments and results. Representatives of Heidelberg Instruments, GenISys, micro resist technology, Raith and Nanoscribe will talk about their new tools, solutions and materials for nanofabrication. You will also be able to visit booths of all the organizers and to talk to all speakers and other participants directly.

Participation in the Symposium is free of charge. To view the agenda and register for the event, click here.
We are looking forward to seeing you at the Nano-Micro-Lithography Symposium!

Share:

Share on facebook
Facebook
Share on twitter
Twitter
Share on pinterest
Pinterest
Share on linkedin
LinkedIn

Related Posts

The MPO 100 fabricates micro-optics stitching-free without unwanted artifacts

Stitching-free micro-optics with MPO 100

IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View (IFoV) writing mode, using the

The MLA 150 Success Story

From pioneering work to market leadership in maskless laser lithography –  The Heidelberg Instruments MLA 150 Maskless Aligner is an unparalleled success story Since its

Get in Touch

We are always at your disposal.
Please send us your request.

Sign up

Subscribe to our newsletter
to receive the newest information.

Stay connected

Follow us on social media to benefit
from a range of useful resources.

Scroll to Top