MLA 300

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Optimized for industrial manufacturing, ensuring high throughput and seamless production line integration

  • Product Description

  • The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

    The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

    The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless Lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

    The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

    The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

    The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless Lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

  • Product Highlights

  • Direct-write Lithography

    No mask-related costs, effort, or security risks

    Flexibility

    Direct writing in industrial production allows per-die pattern corrections, e.g. to react to distortions or process variations and serialization

    Time-saving

    Shorter time from prototyping to production. Digital design management replaces conventional mask library

    Exposure Quality

    Optical compensation of scaling, rotation; patented substrate tracking technology

    Dynamic Autofocus

    Superior critical dimensions (CD) uniformity on warped or corrugated substrates

    Exposure Speed

    300 x 300 mm2 in 5 minutes (write mode 3, two exposure modules)

    Full Facility Integration

    Customizable automatic loader, substrate chuck including warped substrates, custom workflow “wizards” and interface with manufacturing execution systems (MES)

    User-friendly

    SEMI-compliant user interface; customized workflow “wizards” for system operators

  • Available Modules

  • Automated Loading Module

    SEMI-standard BOLTS plane can be configured for open cassettes or Load Ports for FOUP. The number and configuration of ports can be selected and customized for round or rectangular substrates

    Manufacturing Execution System (MES)

    Integration Customizable workflow “wizards” to start exposure jobs, and integration to a central MES via SECS/GEM or OPC-UA protocols

    Backside Alignment

    Visual or through-wafer IR backside alignment available with 1 µm positioning accuracy

    Exposure Wavelengths

    High-power diode lasers with 7 W at 375 nm or 20 W at 405 nm with long lifetime are available

    Multipurpose Vacuum Chuck

    Customized vacuum chucks are available for applications with special substrates (e.g. warped panels)

    Service Contracts

    Service contract grades for faster on-site support and participation in the spare parts pool

The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless Lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless Lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

Direct-write Lithography

No mask-related costs, effort, or security risks

Flexibility

Direct writing in industrial production allows per-die pattern corrections, e.g. to react to distortions or process variations and serialization

Time-saving

Shorter time from prototyping to production. Digital design management replaces conventional mask library

Exposure Quality

Optical compensation of scaling, rotation; patented substrate tracking technology

Dynamic Autofocus

Superior critical dimensions (CD) uniformity on warped or corrugated substrates

Exposure Speed

300 x 300 mm2 in 5 minutes (write mode 3, two exposure modules)

Full Facility Integration

Customizable automatic loader, substrate chuck including warped substrates, custom workflow “wizards” and interface with manufacturing execution systems (MES)

User-friendly

SEMI-compliant user interface; customized workflow “wizards” for system operators

Automated Loading Module

SEMI-standard BOLTS plane can be configured for open cassettes or Load Ports for FOUP. The number and configuration of ports can be selected and customized for round or rectangular substrates

Manufacturing Execution System (MES)

Integration Customizable workflow “wizards” to start exposure jobs, and integration to a central MES via SECS/GEM or OPC-UA protocols

Backside Alignment

Visual or through-wafer IR backside alignment available with 1 µm positioning accuracy

Exposure Wavelengths

High-power diode lasers with 7 W at 375 nm or 20 W at 405 nm with long lifetime are available

Multipurpose Vacuum Chuck

Customized vacuum chucks are available for applications with special substrates (e.g. warped panels)

Service Contracts

Service contract grades for faster on-site support and participation in the spare parts pool

Customer applications

Advanced Packaging: Heidelberg Instruments‘ MLA 300 enables higher interconnect densities by exposing tailored designs matching the exact position of each die
Heidelberg Instruments‘ MLA 300 enables higher interconnect densities by exposing tailored designs matching the exact position of each die.
Resolution pattern exposed in a 500 nm layer of AZ1500 showing a minimum feature size of 1.5 µm. (SEM image, viewed with a 45° angle)
Resolution pattern exposed in a 500 nm layer of AZ1500 showing a minimum feature size of 1.5 µm. (SEM image, viewed with a 45° angle)
Test structures exposed in a 10 µm layer of AZ 10XT. (SEM image, viewed with a 45° angle)
Test structures exposed in a 10 µm layer of AZ 10XT. (SEM image, viewed with a 45° angle)
Resolution pattern exposed in a 10 µm layer of AZ 10XT showing an aspect ratio of 1:5. (SEM image, viewed with a 45° angle)
Resolution pattern exposed in a 10 µm layer of AZ 10XT showing an aspect ratio of 1:5. (SEM image, viewed with a 45° angle)
Optical microscope view of a micro QR code exposed in AZ1500 (500 nm) resist.
Optical microscope view of a micro QR code exposed in AZ1500 (500 nm) resist.
MEMS processes integrate standard microchip technologies with electromechanical components of a diverse range of sizes and materials. Stresses and stress-induced deformations need to be managed carefully to yield correct device properties. The Maskless Aligner technology is ideally suited to make on the fly corrections to the design, if required.
MEMS processes integrate standard microchip technologies with electromechanical components of a diverse range of sizes and materials. Stresses and stress-induced deformations need to be managed carefully to yield correct device properties. The Maskless Aligner technology is ideally suited to make on the fly corrections to the design, if required.
Structuring flexible substrates is challenging as the shape and the distortions vary with applied forces. Maskless lithography offers the unique option of exposing the substrates with warpage-dependent pre-distortions, to maximize yield.
Structuring flexible substrates is challenging as the shape and the distortions vary with applied forces. Maskless lithography offers the unique option of exposing the substrates with warpage-dependent pre-distortions, to maximize yield.

Why customers choose our systems

“The MLA 300 is a perfect tool for our R&D facility. Without having to make masks the cycle time for design iterations has step changed from days to minutes. The quick turnaround and versatility has made the MLA the preferred exposure tool for ourselves and internal customers rendering our other projection and contact aligners redundant.”

John McLean, Principle Process Development Engineer
Centre for Process Innovation (CPI)
Sedgefield, England

Technical Data

Writing performanceWrite mode 2Write mode 3
Minimum lines and spaces [µm]23
Minimum feature size [µm]1.53
CD uniformity [3σ, nm]200300
Edge roughness [3σ, nm]80100
2nd layer alignment [3σ, nm]500700
Backside alignment [3σ, nm]10001000
Exposure time (80 mJ/cm² and 405 nm laser) for 100 x 100 mm²2.75 min (one exposure module installed)1.5 min (one exposure module installed)
Exposure time (80 mJ/cm² and 405 nm laser) for 200 x 200 mm²9 min (one exposure module installed)
4.7 min (two exposure modules installed)		4.6 min (one exposure module installed)
2.5 min (two exposure modules installed)
Exposure time (80 mJ/cm² and 405 nm laser) for 300 x 300 mm²19.5 min (one exposure module installed)
10 min (two exposure modules installed)		9.6 min (one exposure module installed)
5 min (two exposure modules installed)
Maximum write speed (405 nm laser) [mm²/min]4615 (one exposure module installed)
9000 (two exposure modules installed)		9375 (one exposure module installed)
18000 (two exposure modules installed)
System features
Light sourceHigh-power diode laser with long life-time at 375 nm and/or 405 nm
Maximum substrate size300 x 300 mm²
Maximum exposure area300 x 300 mm²
Substrate thickness0.1 - 10 mm
Internal temperature stability± 0.1°C
Real-time autofocusOptical and pneumatic autofocus
Autofocus dynamic rangeUp to 150 µm
AlignmentAdvanced alignment; backside alignment optional
AutomationAutomatic wafer handling and pre-alignment
System dimensions (excluding loader)
Height × width × depth1980 mm x 1200 mm x 2310 mm
Weight2600 kg
Installation requirements
Electrical400 VAC, 50/60 Hz, 16 A
Compressed air7 - 10 bar

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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