Optimized for industrial manufacturing, ensuring high throughput and seamless production line integration

  • Product Description

  • The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

    The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

    The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

    The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

    The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

    The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

  • Product Highlights

  • Direct-write Lithography

    No mask-related costs, effort, or security risks

    Flexibility

    Direct writing in industrial production allows per-die pattern corrections, e.g. to react to distortions or process variations and serialization

    Time-saving

    Shorter time from prototyping to production. Digital design management replaces conventional mask library

    Exposure Quality

    Optical compensation of scaling, rotation; patented substrate tracking technology

    Dynamic Autofocus

    Superior critical dimensions (CD) uniformity on warped or corrugated substrates

    Exposure Speed

    300 x 300 mm2 in 19.5 minutes

    Full Facility Integration

    Customizable automatic loader, substrate chuck including warped substrates, custom workflow “wizards” and interface with manufacturing execution systems (MES)

    User-friendly

    SEMI-compliant user interface; customized workflow “wizards” for system operators
  • Available Modules

  • Automated Loading Module

    SEMI-standard BOLTS plane can be configured for open cassettes or Load Ports for FOUP. The number and configuration of ports can be selected and customized for round or rectangular substrates

    Manufacturing Execution System (MES)

    Integration Customizable workflow “wizards” to start exposure jobs, and integration to a central MES via SECS/GEM or OPC-UA protocols

    Backside Alignment

    Visual or through-wafer IR backside alignment available with 1 µm positioning accuracy

    Exposure Wavelengths

    High-power diode lasers with 7 W at 375 nm or 20 W at 405 nm with long lifetime are available

    Multipurpose Vacuum Chuck

    Customized vacuum chucks are available for applications with special substrates (e.g. warped panels)

    Service Contracts

    Service contract grades for faster on-site support and participation in the spare parts pool

The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

The Maskless Aligner MLA 300 provides high throughput, a simplified workflow, and integration with manufacturing execution systems (MES). This tool is used for the production of sensors and sensor ICs, MEMS, and microfluidic devices. Other applications include discrete electronic components, analog and digital ICs, ASICs, power electronics, OLED displays, and advanced packaging.

The MLA 300 achieves the highest optical quality and precision. The standard exposure module achieves a minimum feature size of 1.5 µm. Writing modes for higher throughput and higher resolution are on our roadmap. The MLA 300 features full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.

The MLA 300 reduces production costs and effort by overcoming the requirement for mask procurement, verification, and management. Operating costs benefit from a long-lifetime exposure laser (estimated 10 years at 24/7 production) and fewer consumables. Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning. Maskless lithography allows per-die pattern corrections and serialization for full tracing of product characteristics, such as sensor calibration.

Direct-write Lithography

No mask-related costs, effort, or security risks

Flexibility

Direct writing in industrial production allows per-die pattern corrections, e.g. to react to distortions or process variations and serialization

Time-saving

Shorter time from prototyping to production. Digital design management replaces conventional mask library

Exposure Quality

Optical compensation of scaling, rotation; patented substrate tracking technology

Dynamic Autofocus

Superior critical dimensions (CD) uniformity on warped or corrugated substrates

Exposure Speed

300 x 300 mm2 in 19.5 minutes

Full Facility Integration

Customizable automatic loader, substrate chuck including warped substrates, custom workflow “wizards” and interface with manufacturing execution systems (MES)

User-friendly

SEMI-compliant user interface; customized workflow “wizards” for system operators

Automated Loading Module

SEMI-standard BOLTS plane can be configured for open cassettes or Load Ports for FOUP. The number and configuration of ports can be selected and customized for round or rectangular substrates

Manufacturing Execution System (MES)

Integration Customizable workflow “wizards” to start exposure jobs, and integration to a central MES via SECS/GEM or OPC-UA protocols

Backside Alignment

Visual or through-wafer IR backside alignment available with 1 µm positioning accuracy

Exposure Wavelengths

High-power diode lasers with 7 W at 375 nm or 20 W at 405 nm with long lifetime are available

Multipurpose Vacuum Chuck

Customized vacuum chucks are available for applications with special substrates (e.g. warped panels)

Service Contracts

Service contract grades for faster on-site support and participation in the spare parts pool

Customer applications

Why customers choose our systems

The MLA 300 is a perfect tool for our R&D facility. Without having to make masks the cycle time for design iterations has step changed from days to minutes. The quick turnaround and versatility has made the MLA the preferred exposure tool for ourselves and internal customers rendering our other projection and contact aligners redundant.

John McLean, Principle Process Development Engineer
Centre for Process Innovation (CPI)
Sedgefield, England

Technical Data

Writing performance
Minimum lines and spaces [µm]2
Minimum feature size [µm]1.5
CD uniformity [3σ, nm]200
Edge roughness [3σ, nm]80
Stitching [3σ, nm]120
2nd layer alignment [3σ, nm]500
Backside alignment [3σ, nm]1000
Exposure time per module (100 x 100 mm² at 80 mJ/cm² and 405 nm laser wavelength)2.75 min
Maximum write speed with one module at 405 nm laser wavelength4615 mm²/min
System features
Light sourceHigh-power diode lasers at 375 nm or 405 nm
Maximum substrate size300 x 300 mm²
Maximum exposure area300 x 300 mm²
Substrate thickness0.1 - 10 mm
Modular environmental chamberTemperature stability ± 0.1°C
Real-time autofocusOptical and/or pneumatic autofocus
Autofocus dynamic rangeUp to 150 µm
AlignmentAdvanced alignment; backside alignment optional
AutomationAutomatic wafer handling and pre-alignment
System dimensions (excluding loader)
Height × width × depth1980 mm x 1200 mm x 2310 mm
Weight2600 kg
Installation requirements
Electrical400 VAC, 50/60 Hz, 16 A

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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