Thermal Scanning Probe Lithography

Direct Writing on the Nanoscale

In Thermal Scanning Probe Lithography (t-SPL), the resist is directly evaporated by an ultra-sharp heated scanning probe tip. The heated tip creates high-resolution nanostructures by local sublimation of resists. That way, complex nanostructures can be written and simultaneously inspected. This approach essentially forms the core of the NanoFrazor operating principle. Standard pattern transfer methods like lift-off or etching then can be applied to the patterned substrates.
This technology first appeared at IBM Research Zurich in the framework of the Millipede memory project, spinning into a new nanofabrication method. The technology is commercially available in the shape of our NanoFrazor systems Scholar and Explore.
The NanoFrazor technology represents an alternative to conventional nanolithography methods. It allows both high-resolution patterning and imaging with a resolution of 1 mm/s scan speed. It avoids many problems of other nanolithography techniques – no wet development, no proximity effect corrections, no vacuum is required. The compatibility with any standard pattern transfer process and substrate material opens up a wide range of applications.

Application images

Systems

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