Traditions of the past transformed into efficient production
Conventional optical lithography requires the use of a mask aligner to fabricate a photomask which is then used to transfer the pattern onto a wafer or substrate. This process can be very time consuming especially when considering the fact that it can take up to several days to fabricate one photomask not including extra costs through external mask service providers.
Our Maskless Aligner technology represents the first and at the same time the most important step on the way to generate your research and commercial applications faster, more conveniently and more precisely than with traditional photolithography. In our whitepaper we bring you closer to our Maskless Aligner technology and show you how you can improve your industrial microfabrication with our MLA300 Maskless Aligner.
Content overview
- Paradigm shift in designing and manufacturing
of microelectronics - Advantages of direct laser print over traditional
mask technology - Evolution of maskless aligners and HIMT equipment
- Selected use cases & applications
- Benefits of MLA300
- Outlook and perspectives
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