The Lithographer is a magazine providing exciting insights into the world of micro- and nanofabrication. It is a platform for our global community to connect, exchange ideas, and showcase advances across diverse lithography and nanofabrication fields.
Heidelberg Instruments launched this project in 2020 to share what we hold dear and what we know best: the emerging capabilities of direct-write approaches to micro- and nanofabrication, from research cleanrooms to industrial production lines.
The Lithographer covers state-of-the-art direct-write techniques such as laser, e-beam, and thermal scanning probe lithography, as well as related technologies including software, resist chemistry, and pattern transfer processes. Each edition brings together technical insights, research highlights, expert interviews, application stories, and perspectives from our partners and the wider micro- and nanofabrication community.
Discover the latest edition – The Lithographer: From Lab to Fab – exploring how innovative technologies, research, and collaborations make the journey from the laboratory to scalable, real-world manufacturing.
What you will find in the From Lab to Fab Issue:
- Celebrating Long-Term Partnerships: The MLA 150 anniversary tour revisits the researchers and facilities that helped shape the Maskless Aligner
- Driving Next-Generation Advanced Packaging: Inside the Glass Panel Technology Group and the role of maskless lithography in panel-level packaging
- Enabling Flat Panel Display Manufacturing: How halftone photomasks support advanced display production
- Two-Photon Polymerization at Industrial Scale: An interview with Nanoscribe CEO Martin Hermatschweiler on the evolution of 2PP from research to manufacturing
- Where Chemistry Meets Nanofabrication: Andrea Vezzoli on molecular electronics and combining µMLA and NanoFrazor technologies
- 20 Years of Software Innovation: GenISys celebrates milestones in lithography, simulation, process correction, and metrology
- From Design to Mass Production: Moveon Technologies’ application note on design-for-manufacturability for wafer-level optics
- Developing the Next Generation of Advanced Packaging: Highlights from ECTC 2026 and five research contributions using maskless lithography
- Bridging Packaging R&D and Manufacturing: Arizona State University’s AEP Core on adaptive patterning, advanced packaging, and the MLA 300
Take a look at our previous issues!
What you will find in the Surface Issue:
- 40 Years of Direct Writing: Heidelberg Instruments celebrated a milestone anniversary
- Shaping the Future of Advanced Manufacturing: An exclusive interview with Martin Wynaendts van Resandt, CEO of LAB14
- Grayscale Exposure Challenges: Using direct-write laser exposure on ultra-thick positive photoresist
- Interview with Jan Erjawetz: Head of Optical Lithography at XRnanotech, a specialist in the manufacturing of x-ray optics
- From Classical Optics to Quantum Electronics: A researcher’s journey inspired by thermal scanning probe lithography
- BEAMER: Lithography software enabling photonics
What you will find in the Quantum Issue:
- New Ideas for Patterning of 2D Materials
- Interview with Clarence Chang: Across the universe. Building detectors to see the first light
- Interview with Ken Burch: Quantum computer out of a glovebox
- Interview with Michelle Simmons: Everything is under control
- Interview with Bob Wolkov: Atomic perfectionism
- Interview with Edoardo Albisetti: Unconventional computing, with a spin-(wave)
- Expert’s Know-How: NanoFrazor for patterning of nanoscale spin textures
- Expert’s Know-How: Non-invasive lithography. Enabling superior device performance
- Expert’s Know-How: BEAMER – Electron beam lithography software. Enabling quantum devices
What you will find in the Grayscale Issue:
- Research Highlights
- The Rise of Grayscale Lithography
- Interview with Steffen Diez: Maskless aligners for industry
- Interview with Armin Knoll: Rocking Brownian motors go viral
- Interview with Rajesh Menon: Imaging beyond the limits
- Experts’ Know-How: Grayscale lithography of complex microstructures
- Expert’s Know-How: Grayscale positive photoresist series ma-P 1200G
- Expert’s Know-How: Closed-loop 3D nanolithography
