Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly organize the 2022 edition of their traditional technical workshop.
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Discover how researchers fabricated an ultra-thin flat lens (MDL) with the DWL 66+, offering a lightweight, cost-effective solution for true-color astrophotography and space-based imaging.
Explore the challenges and solutions in achieving deep grayscale lithography (>100 µm) for advanced microfabrication. Learn about resist limitations, mask requirements, and the advantages of direct laser writing.
Discover how the VPG+ 1400 FPD revolutionizes flat panel display fabrication with high-speed, sub-micron resolution photomask writing. Designed for OLED, micro-LED, and quantum dot displays, it delivers unmatched precision, scalability, and throughput for next-generation FPD manufacturing.
Sustainable microfabrication is the future. Explore how Heidelberg Instruments’ advanced lithography solutions reduce waste, energy use, and chemical consumption.
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