Nanoimprint Templates

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Single-Nanometer Precision

Nanoimprint lithography (NIL) replicates 2D or 2.5D nanostructures with high throughput for photonics, optics and nanofluidics applications. This method relies on high-precision master templates prepared by direct-write nano- or microlithography.

High resolution patterning over large areas

Accuracy of grayscale nanolithography

Additional processing steps (e.g. etching) for the final master

Accurate grayscale lithography

down to single-nanometer accuracy

Ultra-high resolution

for templates and copies

Compatibility of resists

with various industrial NIL processes

High write speed

to make grayscale masters even up to 1×1 m2

Application images

Large area masters
NIL is often used for replication of grayscale 3D features. Industrial applications can require masters that are seamlessly covered with 3D features over areas as big as 1 x 1 m2.
High-fidelity 3d replicas from NanoFrazor Patterns
High-fidelity 3D replicas from NanoFrazor patterns. (Courtesy of micro resist technology GmbH)
Replication of high-resolution features
Replication of high-resolution features. (Courtesy of SCIL Nanoimprint Solutions)
Amplication of 3D patterns by etching
Amplication of 3D patterns by etching.
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Systems

Discover more about the NanoFrazor Explore All-Round Nanofabrication System.

EXPLORE

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

Read more about the DWL 66+ Laser Lithography System.

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

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