Nanoimprint Templates

Single-Nanometer Precision

Nanoimprint lithography (NIL) replicates 2D or 2.5D nanostructures with high throughput for photonics, optics and nanofluidics applications. This method relies on high-precision master templates prepared by direct-write nano- or microlithography.

High resolution patterning over large areas

Accuracy of grayscale nanolithography

Additional processing steps (e.g. etching) for the final master

Accurate grayscale lithography

down to single-nanometer accuracy

Ultra-high resolution

for templates and copies

Compatibility of resists

with various industrial NIL processes

High write speed

to make grayscale masters even up to 1×1 m2

Application images


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