Nanoelectronics
Rapid Prototyping of Nanoelectronic Devices
Moore’s law has pushed the specs of today’s transistors to a level that is often beyond reach for conventional direct-write nanolithography. The high throughput manufacturing technologies like EUV or DUV multi-patterning are too expensive for an efficient exploration of new promising materials and designs promising for next generation chips especially for “Beyond Moore” devices. Alternative rapid prototyping methods are required for the development of such novel nanoelectronic devices.
High-resolution dense features with low roughness of the line edge
Precise overlay of several layers
Compatibility with pattern transfer processes
Fast turnaround time and flexibility
Ultra-high resolution
without the need for proximity corrections
In-situ imaging
immediate quality control of the nanopatterns
No charge accumulation
critical insulating layers are not affected by charged particles
Accurate overlay
without artificial markers and expensive positioning systems
Application images
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Systems
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- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.