1D & 2D Materials
Low-Damage Lithography with Accurate Overlay on Sensitive 1D & 2D Materials
Devices made of 1D and 2D materials and their stacks often exhibit interesting physics. Impurities and defects, however, can limit performance of such devices.
Preserve the pristine material’s properties
Accurate and fast alignment to flakes or existing electrodes
High resolution patterning (e.g. for creation of ribbons)
Glove-box compatibility for 2D materials sensitive to air contact
Markerless overlay
In-situ AFM for accurate alignment
Non-invasive patterning
Pristine material properties not affected by charged particles or resist residues
Ultra-high resolution
Narrow gaps, ribbons, gate electrodes, constrictions, etc.
Glovebox
Nanopatterning of sensitive materials in a controlled atmosphere
Application images
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Systems
EXPLORE
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.
DWL 66+
- Direct Write Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
µMLA
- Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.