1D & 2D Materials

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Low-Damage Lithography with Accurate Overlay on Sensitive 1D & 2D Materials

Devices made of 1D and 2D materials and their stacks often exhibit interesting physics. Impurities and defects, however, can limit performance of such devices.

Preserve the pristine material’s properties

Accurate and fast alignment to flakes or existing electrodes

High resolution patterning (e.g. for creation of ribbons)

Glove-box compatibility for 2D materials sensitive to air contact

Markerless overlay

In-situ AFM for accurate alignment

Non-invasive patterning

Pristine material properties not affected by charged particles or resist residues

Ultra-high resolution

Narrow gaps, ribbons, gate electrodes, constrictions, etc.

Glovebox

Nanopatterning of sensitive materials in a controlled atmosphere

Application images

Germanium nanoribbon devices
Top gates patterned over a Germanium nanoribbon without using charged particles (AFM image). (Courtesy of Prof. Georgios Katsaros from IST, Austria)
Locating and shaping 2D materials
Single-layer MoS2 flakes located through the resist layers and patterned with high resolution. Inset shows final devices after reactive ion etching. (Courtesy of Dr. Armin Knoll, IBM Research Zurich, and Prof. Andras Kis, EPFL)
Excellent electrical contacts to MoS2
Vanishingly small Schottky barriers of an MoS2 transistor fabricated using NanoFrazor enabled highest on/off ratios ever reported with metal contacts. (Courtesy of Prof. Elisa Riedo, NYU, see Nat.El.2019)
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Systems

Click to explore the NanoFrazor Scholar Nanofabrication System.

SCHOLAR

  • Thermal Scanning Probe Lithography System

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

Discover more about the NanoFrazor Explore All-Round Nanofabrication System.

EXPLORE

  • Thermal Scanning Probe Lithography System

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

Read more about the DWL 66+ Laser Lithography System.

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

Explore the µMLA Maskless Aligner by Heidelberg Instruments.

µMLA

  • Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.

Get in Touch

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