Review Technical Workshop 2024 in Taiwan

Heidelberg Instruments' Dominique Collé and Stella Technology Team pose for group photo

Organized by our local distributor Stella Technology, the Technical Workshop 2024 for Heidelberg Instruments’ Direct Writing was held on June 17th at the AJ Hotel in Hsinchu, Taiwan, focusing on Maskless Grayscale Lithography, Two-Photon Polymerization, and Thermal Scanning Probe Lithography technologies, as well as user experiences and feedback from users in Taiwan. The workshop aimed to introduce Heidelberg Instruments’ Maskless Direct Laser Writing technology to Taiwanese users, promoting its development and collaboration in the local market.

Co-hosted by Stella Technology and Heidelberg Instruments Mikrotechnik GmbH, the event featured Dominique Collé and Fei Yang from Heidelberg Instruments, as well as experts and scholars from National Taiwan University and National Chung Hsing University. The event brought together experts in the fields of micro-nano lithography, micro-nanofabrication process technology, and nanotechnology from several domestic enterprises, universities, and research institutions.

The event commenced with a welcome and introduction by Wesley Chiang, Sales Director of Stella Technology, followed by a speech from Marlon Hsueh, General Manager of Heidelberg Instruments Service Taiwan Corp. Subsequently, Dominique Collé, Technical Application Manager at Heidelberg Instruments, gave a detailed explanation and introduction to Heidelberg Instruments’ Maskless Direct Laser Writing technology. He continued to introduce the MPO 100, multi-user tool for 3D Lithography and 3D Microprinting via Two-Photon Polymerization.

Fei Yang, Business Development Engineer of the Heidelberg Instruments Nano division, gave an overview of Thermal Scanning Probe technology for nano-patterning on NanoFrazor systems. She elaborated on NanoFrazor’s distinctive features and applications.

In addition, users of the MLA 150 and DWL 2000 systems were invited to share their experiences and insights with Heidelberg Instruments’ equipment, which received considerable feedback.

Appreciation was extended to participants, speakers, and organizers for their valuable contributions. The desire to establish an enduring cooperative relationship was expressed, aiming within the Taiwan market.

To get in direct touch with Stella Technology Taiwan:

The Heidelberg Instruments systems and technology pool comprises high-precision Maskless Aligner (MLA) and Laser Lithography systems for Direct Writing of 2D, 2.5D and 3D microstructures to mask-making, and systems based on Thermal Scanning Probe Lithography (t-SPL) for the advanced nanopatterning. 3D laser lithography systems based on Two-Photon Polymerization (TPP) technology close the gap between conventional laser lithography – the basis of Heidelberg Instruments’ strong core business – and the Thermal Scanning Probe Lithography (t-SPL) for nanopatterning.

Maskless Lithography as the state-of-the-art, high-precision, highly flexible technology is ideal for use in both R&D as well as environments where rapid-prototyping of feature sizes greater than 1 µm are required. The maskless lithography technique enables you to transfer the design directly to the wafer without the need for a photomask.

In maskless lithography the pattern is exposed directly onto the substrate surface with the help of a spatial light modulator, or SLM, which serves as a “dynamic photomask”.

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