Product Portfolio
The Heidelberg Instruments systems and technology pool comprises high-precision Maskless Laser Lithography (MLA) systems for the direct writing of 2D and 2.5D microstructures, mask-making, and advanced laser lithography applications. Complementing this, our NanoFrazor based on Thermal Scanning Probe Lithography (t-SPL) enables cutting-edge nanopatterning with unparalleled precision. Together, these technologies form the foundation of Heidelberg Instruments’ core expertise in micro- and nanofabrication.
Research & Development
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µMLA Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules. -
MLA 150 Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography. -
DWL 66+ Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
NanoFrazor
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
Industrial
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MLA 300
Optimised for industrial production with highest throughput and seamless integration into industrial production lines. -
DWL 2000 GS / DWL 4000 GS Laser Lithography Systems
The most advanced industrial grayscale lithography tool on the market. -
VPG+ 200 / VPG+ 400 / VPG+ 800 Volume Pattern Generators
Powerful production tools for standard photomasks and microstructures in i-line resists. -
VPG+ 1400 FPD Volume Pattern Generator
Photomask production on large substrates, perfect for display applications. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
ULTRA Semiconductor Writer
A tool specifically designed to produce mature semiconductor photomasks.
