Product Portfolio
The Heidelberg Instruments systems and technology pool comprises high-precision Maskless Aligner (MLA) and Laser Lithography systems for Direct Writing of 2D, 2.5D and 3D microstructures to mask-making, and systems based on Thermal Scanning Probe Lithography (t-SPL) for the advanced nanopatterning. 3D laser lithography systems based on Two-Photon Polymerization (TPP) technology close the gap between conventional laser lithography – the basis of Heidelberg Instruments’ strong core business – and the Thermal Scanning Probe Lithography (t-SPL) for nanopatterning.
Research & Development
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µMLA Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules. -
MLA 150 Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography. -
DWL 66+ Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
MPO 100 3D Lithography Tool
Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering. -
NanoFrazor® Scholar
Table-top Thermal Scanning Probe Lithography system with in-situ AFM imaging. Compact and compatible with globebox. -
NanoFrazor® Explore
Thermal scanning probe lithography tool with direct laser sublimation and grayscale modules. Excellent alternative to e-beam lithography tools.
Industrial
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MLA 300
Optimised for industrial production with highest throughput and seamless integration into industrial production lines. -
DWL 2000 GS / DWL 4000 GS Laser Lithography Systems
The most advanced industrial grayscale lithography tool on the market. -
VPG+ 200 / VPG+ 400 Volume Pattern Generators
A production tool for standard photomasks and microstructures in i-line resists. -
VPG+ 800 / VPG+ 1400 Volume Pattern Generators
Photomask production on large substrates, perfect for display applications. -
VPG 300 DI
Maskless StepperMaskless direct imager for high-accuracy and high-resolution microstructures. -
ULTRA Semiconductor Writer
A tool specifically designed to produce mature semiconductor photomasks.