High-Precision Tools for Research and Industrial Applications
Heidelberg Instruments develops advanced lithography systems for both research and industrial micro- and nanofabrication. Our product portfolio combines Maskless Laser Lithography (MLA) systems for rapid prototyping, 2D and 2.5D microstructures, and mask-making, with the NanoFrazor Nanolithography tool for ultra-high-resolution nanopatterning.
From versatile R&D tools to high-throughput industrial systems, our products provide precise patterning, grayscale lithography, high-resolution micro- and nanostructures, and flexible integration across a wide range of substrates. Together, these tools reflect Heidelberg Instruments’ core expertise in cutting-edge microfabrication, nanolithography, and advanced photonics applications.
Research & Development
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µMLA Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules. -
MLA 150 Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography. -
DWL 66+ Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
NanoFrazor Nanolithography Tool
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
Industrial
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MLA 300 Maskless Aligner
Optimised for industrial production with highest throughput and seamless integration into industrial production lines. -
DWL 2000 GS / DWL 4000 GS Laser Lithography Systems
The most advanced industrial grayscale lithography tool on the market. -
VPG+ 200 / VPG+ 400 / VPG+ 800 Volume Pattern Generators
Powerful production tools for standard photomasks and microstructures in i-line resists. -
VPG+ 1400 FPD / VPG+ 1850 FPD Volume Pattern Generators
Photomask production on large substrates, perfect for display applications. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
ULTRA Semiconductor Writer
A tool specifically designed to produce mature semiconductor photomasks.
