Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
The DWL 66+ is now more powerful than ever, featuring two game-changing enhancements that redefine what’s possible with optical lithography.
Discover how researchers fabricated an ultra-thin flat lens (MDL) with the DWL 66+, offering a lightweight, cost-effective solution for true-color astrophotography and space-based imaging.
Discover how the VPG+ 1400 FPD revolutionizes flat panel display fabrication with high-speed, sub-micron resolution photomask writing. Designed for OLED, micro-LED, and quantum dot displays, it delivers unmatched precision, scalability, and throughput for next-generation FPD manufacturing.
Heidelberg Instruments has secured two major orders for its VPG+ 1400 FPD Volume Pattern Generator from leading photomask manufacturers in Asia.
Zurich, Switzerland/Heidelberg, Germany — Heidelberg Instruments proudly announces the launch of its new NanoFrazor nanolithography system, advancing decades of expertise in micro- and nanofabrication. This
Heidelberg, Germany — Heidelberg Instruments, a world-leading provider of advanced laser lithography systems, is pleased to announce a continued stream of orders for the ULTRA
Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical workshops on Maskless Lithography, attracting
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through the Silicon Crossroads Microelectronics Hub,
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA 300 are instrumental for several
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
The quantum revolution is shifting from theory to reality, as breakthroughs like Google’s “Quantum Echoes” show. Scaling from small demos to systems with thousands of qubits demands ultra-precise, uniform nanofabrication. This post examines the fabrication challenges and lithographic solutions enabling the leap from lab to large-scale production.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
The DWL 66+ is now more powerful than ever, featuring two game-changing enhancements that redefine what’s possible with optical lithography.
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