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DWL 66 + direct write lithography system

A new DWL 66+ is Michigan bound!

The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through the Silicon Crossroads Microelectronics Hub,

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OLED Display Technology and Generations in Display Manufacturing

Halftone Photomasks for Next-Generation Displays

How are massive glass substrates patterned with the precision required for next-generation displays? Explore how halftone photomasks create multi-level resist profiles in a single exposure, simplify TFT fabrication, and why large-area mask manufacturing demands exceptional overlay, uniformity, and thermal stability.

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