Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical workshops on Maskless Lithography, attracting
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through the Silicon Crossroads Microelectronics Hub,
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA 300 are instrumental for several
We are thrilled to share some exciting updates about the NanoFrazor!Building on over 20 years of rigorous R&D, the NanoFrazor continues to revolutionize nanofabrication with
Recognition of the exceptional performance: The successful installation of our MLA 300 Maskless Aligner at a Japanese photolithography service provider is underscoring the systems unparalleled
Achieve high throughput and resolution. Despite its unique capacity for three-dimensional fabrication with minimal feature sizes below 100 nm, achieving high throughput with Two-Photon Polymerization
Discover our two Application Notes covering this topic: “Bilayer Lift-Off for NanoFrazor Lithography”“Ultra-High Resolution Pattern Transfer on NanoFrazor Lithography” In our recent application notes, we
September 1, 2023, Espoo, Finland – Lumineq Oy, a global leader in transparent display technology, has announced a strategic investment in state-of-the-art machinery, including the
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View (IFoV) writing mode, using the
From pioneering work to market leadership in maskless laser lithography – The Heidelberg Instruments MLA 150 Maskless Aligner is an unparalleled success story Since its
Heidelberg, Germany — Heidelberg Instruments, a world-leading provider of advanced laser lithography systems, is pleased to announce a continued stream
In the world of microfabrication, precision and flexibility are the cornerstones of innovation. Imagine the possibilities when you can access
In today’s world, protecting sensitive information and safeguarding valuable assets is paramount. From government documents and passports to banknotes and
For decades, photolithography with mask aligners has been the cornerstone of microfabrication. But what if there was a faster, more
Organized by our local distributor Stella Technology, the Technical Workshop 2024 for Heidelberg Instruments’ Direct Writing was held on June
Heidelberg Instruments’ Workshop on Maskless Lithography and Direct Write technology in Japan, hosted at The University of Tokyo’s Takeda Building.
Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA
