VPG+ 200 / VPG+ 400 / VPG+ 800

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Powerful production tools for standard photomasks and microstructures in i-line resists

  • Product Description

  • The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators are powerful and versatile lithography systems designed for multipurpose mask manufacturing for i-line resists. These systems excel at creating high-resolution patterns on substrates ranging from small to large formats, with capabilities to handle substrates up to 800 x 800 mm². Ideal for a wide range of applications across advanced industries, the VPG+ systems are engineered to meet the evolving needs of modern microfabrication.

    Designed for high-quality and fast exposures with extremely accurate alignment, all VPG+ models feature an interferometer with a resolution down to 10 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chambers comply with the most stringent requirements for advanced photomask fabrication, ensuring consistent quality across the board.

    Supercharge Your Mask Production

    • Advanced Packaging: Ensure exceptional accuracy and speed for mask production in fan-out, interposer technology, and other cutting-edge packaging processes. The VPG+ systems deliver the high-resolution output needed for high-performance masks.
    • Electronics Manufacturing: Seamlessly integrate the Volume Pattern Generators into your workflow for creating photomasks used in the fabrication of PCBs, ICs, and other electronic components.
    • Microfluidics and MEMS: Bring your microfluidic and MEMS concepts to life. The ability to create intricate patterns makes the VPG+ systems perfect for mask production in these rapidly developing fields.
    • Smartphone Displays: Produce the most advanced smartphone photomasks with exceptional precision and speed. The VPG+ systems deliver the resolution and accuracy required for high-quality LCD, LED, and OLED displays.

    Unmatched Performance and Efficiency

    • High-power DPSS Laser: Guarantees precise pattern formation, resulting in superior mask quality and enhanced device performance.
    • High-Speed Exposure Engine: Drastically reduces writing times, enabling faster mask production and improved throughput to meet tight deadlines.
    • Automatic Calibration Tool: Ensures superb registration and positioning of written structures, saving you time and minimizing errors during production.
    • Closed-Loop Environmental Chamber: Maintains optimal conditions for consistent mask quality in every production cycle, meeting the most demanding fabrication standards.
    • Wide Format Flexibility: The VPG+ 800 excels on medium to large format substrates, while the VPG+ 200 and VPG+ 400 are tailored for small to medium formats.
    • Seamless Integration: All VPG+ systems support industrial data formats, ensuring compatibility with your existing design and fabrication workflows.
    • Compact Footprint: Despite their powerful capabilities, the VPG+ systems are designed to fit into facilities with limited space, offering unmatched efficiency in a compact form factor.

    Invest in the Future of Microfabrication

    The VPG+ systems offer a future-proof solution for your microfabrication needs. Whether you’re focused on small, medium, or large format mask production, they provide the flexibility, precision, and speed required to advance your processes.

    By utilizing the VPG+ systems, you can achieve:

    • Enhanced mask quality and resolution for superior device performance.
    • Increased throughput for faster mask production and reduced time-to-market.
    • Reduced production costs through efficient operation and reliable performance.
    • Scalability to meet your evolving mask-making requirements as your business grows.

    Take your mask production to the next level. Contact us today to learn more about how our industry-leading technology can redefine your microfabrication process.

    The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators are powerful and versatile lithography systems designed for multipurpose mask manufacturing for i-line resists. These systems excel at creating high-resolution patterns on substrates ranging from small to large formats, with capabilities to handle substrates up to 800 x 800 mm². Ideal for a wide range of applications across advanced industries, the VPG+ systems are engineered to meet the evolving needs of modern microfabrication.

    Designed for high-quality and fast exposures with extremely accurate alignment, all VPG+ models feature an interferometer with a resolution down to 10 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chambers comply with the most stringent requirements for advanced photomask fabrication, ensuring consistent quality across the board.

    Supercharge Your Mask Production

    • Advanced Packaging: Ensure exceptional accuracy and speed for mask production in fan-out, interposer technology, and other cutting-edge packaging processes. The VPG+ systems deliver the high-resolution output needed for high-performance masks.
    • Electronics Manufacturing: Seamlessly integrate the Volume Pattern Generators into your workflow for creating photomasks used in the fabrication of PCBs, ICs, and other electronic components.
    • Microfluidics and MEMS: Bring your microfluidic and MEMS concepts to life. The ability to create intricate patterns makes the VPG+ systems perfect for mask production in these rapidly developing fields.
    • Smartphone Displays: Produce the most advanced smartphone photomasks with exceptional precision and speed. The VPG+ systems deliver the resolution and accuracy required for high-quality LCD, LED, and OLED displays.

    Unmatched Performance and Efficiency

    • High-power DPSS Laser: Guarantees precise pattern formation, resulting in superior mask quality and enhanced device performance.
    • High-Speed Exposure Engine: Drastically reduces writing times, enabling faster mask production and improved throughput to meet tight deadlines.
    • Automatic Calibration Tool: Ensures superb registration and positioning of written structures, saving you time and minimizing errors during production.
    • Closed-Loop Environmental Chamber: Maintains optimal conditions for consistent mask quality in every production cycle, meeting the most demanding fabrication standards.
    • Wide Format Flexibility: The VPG+ 800 excels on medium to large format substrates, while the VPG+ 200 and VPG+ 400 are tailored for small to medium formats.
    • Seamless Integration: All VPG+ systems support industrial data formats, ensuring compatibility with your existing design and fabrication workflows.
    • Compact Footprint: Despite their powerful capabilities, the VPG+ systems are designed to fit into facilities with limited space, offering unmatched efficiency in a compact form factor.

    Invest in the Future of Microfabrication

    The VPG+ systems offer a future-proof solution for your microfabrication needs. Whether you’re focused on small, medium, or large format mask production, they provide the flexibility, precision, and speed required to advance your processes.

    By utilizing the VPG+ systems, you can achieve:

    • Enhanced mask quality and resolution for superior device performance.
    • Increased throughput for faster mask production and reduced time-to-market.
    • Reduced production costs through efficient operation and reliable performance.
    • Scalability to meet your evolving mask-making requirements as your business grows.

    Take your mask production to the next level. Contact us today to learn more about how our industry-leading technology can redefine your microfabrication process.

  • Product Highlights

  • Exposure Quality

    Sub micron resolution, uniform CDs, flexible and interchangeable writemodes with high-resolution address grids

    High Exposure Speed

    Custom-made high-speed spatial light modulator; optimized optical engine performance and data path, making it the fastest tool available on the market in its category; 14″ (400 mm) in <21 minutes

    Writing Stability

    Integrated ambient metrology, flowbox and software corrections to compensate environmental changes

    Alignment and metrology

    Metrology functions included; top side alignment through write lens; automated global and field alignments with distortion correction; sophisticated 2D correction matrix over the write area

    Data preparation

    Easy-to-use flexible writing grids; online conversion, and advanced data optimization

    Autofocus

    Autofocus (pneumatic or optical) with dynamic compensation up to 150 µm

  • Available Modules

  • Variable Stage Dimensions

    Accommodate substrates up to 205 mm, 410 mm, or 800 mm

    Three exchangable Write Modes

    User exchangable Write Modes for resolutions from 750 nm to 2 µm (optional high-quality mode)

    Automatic mask handling options

    Full automatic handling of photomasks up to 9 x 9“ (other sizes on request)

    High accuracy package

    Including Zerodur® stage, differential interferometer and advanced stage controller

    Custom substrates

    Support of custom substrates on request

    Service Contracts

    Worldwide Service-Level Agreements for faster on-site support and access to spare parts

The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators are powerful and versatile lithography systems designed for multipurpose mask manufacturing for i-line resists. These systems excel at creating high-resolution patterns on substrates ranging from small to large formats, with capabilities to handle substrates up to 800 x 800 mm². Ideal for a wide range of applications across advanced industries, the VPG+ systems are engineered to meet the evolving needs of modern microfabrication.

Designed for high-quality and fast exposures with extremely accurate alignment, all VPG+ models feature an interferometer with a resolution down to 10 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chambers comply with the most stringent requirements for advanced photomask fabrication, ensuring consistent quality across the board.

Supercharge Your Mask Production

  • Advanced Packaging: Ensure exceptional accuracy and speed for mask production in fan-out, interposer technology, and other cutting-edge packaging processes. The VPG+ systems deliver the high-resolution output needed for high-performance masks.
  • Electronics Manufacturing: Seamlessly integrate the Volume Pattern Generators into your workflow for creating photomasks used in the fabrication of PCBs, ICs, and other electronic components.
  • Microfluidics and MEMS: Bring your microfluidic and MEMS concepts to life. The ability to create intricate patterns makes the VPG+ systems perfect for mask production in these rapidly developing fields.
  • Smartphone Displays: Produce the most advanced smartphone photomasks with exceptional precision and speed. The VPG+ systems deliver the resolution and accuracy required for high-quality LCD, LED, and OLED displays.

Unmatched Performance and Efficiency

  • High-power DPSS Laser: Guarantees precise pattern formation, resulting in superior mask quality and enhanced device performance.
  • High-Speed Exposure Engine: Drastically reduces writing times, enabling faster mask production and improved throughput to meet tight deadlines.
  • Automatic Calibration Tool: Ensures superb registration and positioning of written structures, saving you time and minimizing errors during production.
  • Closed-Loop Environmental Chamber: Maintains optimal conditions for consistent mask quality in every production cycle, meeting the most demanding fabrication standards.
  • Wide Format Flexibility: The VPG+ 800 excels on medium to large format substrates, while the VPG+ 200 and VPG+ 400 are tailored for small to medium formats.
  • Seamless Integration: All VPG+ systems support industrial data formats, ensuring compatibility with your existing design and fabrication workflows.
  • Compact Footprint: Despite their powerful capabilities, the VPG+ systems are designed to fit into facilities with limited space, offering unmatched efficiency in a compact form factor.

Invest in the Future of Microfabrication

The VPG+ systems offer a future-proof solution for your microfabrication needs. Whether you’re focused on small, medium, or large format mask production, they provide the flexibility, precision, and speed required to advance your processes.

By utilizing the VPG+ systems, you can achieve:

  • Enhanced mask quality and resolution for superior device performance.
  • Increased throughput for faster mask production and reduced time-to-market.
  • Reduced production costs through efficient operation and reliable performance.
  • Scalability to meet your evolving mask-making requirements as your business grows.

Take your mask production to the next level. Contact us today to learn more about how our industry-leading technology can redefine your microfabrication process.

The VPG+ 200, VPG+ 400, and VPG+ 800 Volume Pattern Generators are powerful and versatile lithography systems designed for multipurpose mask manufacturing for i-line resists. These systems excel at creating high-resolution patterns on substrates ranging from small to large formats, with capabilities to handle substrates up to 800 x 800 mm². Ideal for a wide range of applications across advanced industries, the VPG+ systems are engineered to meet the evolving needs of modern microfabrication.

Designed for high-quality and fast exposures with extremely accurate alignment, all VPG+ models feature an interferometer with a resolution down to 10 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chambers comply with the most stringent requirements for advanced photomask fabrication, ensuring consistent quality across the board.

Supercharge Your Mask Production

  • Advanced Packaging: Ensure exceptional accuracy and speed for mask production in fan-out, interposer technology, and other cutting-edge packaging processes. The VPG+ systems deliver the high-resolution output needed for high-performance masks.
  • Electronics Manufacturing: Seamlessly integrate the Volume Pattern Generators into your workflow for creating photomasks used in the fabrication of PCBs, ICs, and other electronic components.
  • Microfluidics and MEMS: Bring your microfluidic and MEMS concepts to life. The ability to create intricate patterns makes the VPG+ systems perfect for mask production in these rapidly developing fields.
  • Smartphone Displays: Produce the most advanced smartphone photomasks with exceptional precision and speed. The VPG+ systems deliver the resolution and accuracy required for high-quality LCD, LED, and OLED displays.

Unmatched Performance and Efficiency

  • High-power DPSS Laser: Guarantees precise pattern formation, resulting in superior mask quality and enhanced device performance.
  • High-Speed Exposure Engine: Drastically reduces writing times, enabling faster mask production and improved throughput to meet tight deadlines.
  • Automatic Calibration Tool: Ensures superb registration and positioning of written structures, saving you time and minimizing errors during production.
  • Closed-Loop Environmental Chamber: Maintains optimal conditions for consistent mask quality in every production cycle, meeting the most demanding fabrication standards.
  • Wide Format Flexibility: The VPG+ 800 excels on medium to large format substrates, while the VPG+ 200 and VPG+ 400 are tailored for small to medium formats.
  • Seamless Integration: All VPG+ systems support industrial data formats, ensuring compatibility with your existing design and fabrication workflows.
  • Compact Footprint: Despite their powerful capabilities, the VPG+ systems are designed to fit into facilities with limited space, offering unmatched efficiency in a compact form factor.

Invest in the Future of Microfabrication

The VPG+ systems offer a future-proof solution for your microfabrication needs. Whether you’re focused on small, medium, or large format mask production, they provide the flexibility, precision, and speed required to advance your processes.

By utilizing the VPG+ systems, you can achieve:

  • Enhanced mask quality and resolution for superior device performance.
  • Increased throughput for faster mask production and reduced time-to-market.
  • Reduced production costs through efficient operation and reliable performance.
  • Scalability to meet your evolving mask-making requirements as your business grows.

Take your mask production to the next level. Contact us today to learn more about how our industry-leading technology can redefine your microfabrication process.

Exposure Quality

Sub micron resolution, uniform CDs, flexible and interchangeable writemodes with high-resolution address grids

High Exposure Speed

Custom-made high-speed spatial light modulator; optimized optical engine performance and data path, making it the fastest tool available on the market in its category; 14″ (400 mm) in <21 minutes

Writing Stability

Integrated ambient metrology, flowbox and software corrections to compensate environmental changes

Alignment and metrology

Metrology functions included; top side alignment through write lens; automated global and field alignments with distortion correction; sophisticated 2D correction matrix over the write area

Data preparation

Easy-to-use flexible writing grids; online conversion, and advanced data optimization

Autofocus

Autofocus (pneumatic or optical) with dynamic compensation up to 150 µm

Variable Stage Dimensions

Accommodate substrates up to 205 mm, 410 mm, or 800 mm

Three exchangable Write Modes

User exchangable Write Modes for resolutions from 750 nm to 2 µm (optional high-quality mode)

Automatic mask handling options

Full automatic handling of photomasks up to 9 x 9“ (other sizes on request)

High accuracy package

Including Zerodur® stage, differential interferometer and advanced stage controller

Custom substrates

Support of custom substrates on request

Service Contracts

Worldwide Service-Level Agreements for faster on-site support and access to spare parts

Customer applications

A full 150-mm-wafer filled with a hexagonal pillar array. In such 2D replication master, no visible stitching errors are allowed. The resulting circular structures have a diameter of around 1.7 μm at the top and around 3 μm at the pitch. (Courtesy of IMS Chips)
A full 150-mm-wafer filled with a hexagonal pillar array. In such 2D replication master, no visible stitching errors are allowed. The resulting circular structures have a diameter of around 1.7 μm at the top and around 3 μm at the pitch. (Courtesy of IMS Chips)
8-level quartz Diffractive Optical Element (DOE) exposed using VPG+ system. The pixels are about 2 μm in size, the array of devices covers an area of about 20 mm. (Courtesy of IMS Chips)
8-level quartz Diffractive Optical Element (DOE) exposed using VPG+ system. The pixels are about 2 μm in size, the array of devices covers an area of about 20 mm. (Courtesy of IMS Chips)
The IMS Gate Forest® technology is a “sea-of-gates” mixed-signal gate array integrating analog and digital functionality on a single chip. The microelectronic elements on the master can be individually configured by adding the respective contacts. In a Mix & Match-approach, stepper lithography patterned the CMOS masters, and personalized contacts and metallization layers were added using VPG+ 400 laser lithography. (Courtesy of IMS Chips)
The IMS Gate Forest® technology is a “sea-of-gates” mixed-signal gate array integrating analog and digital functionality on a single chip. The microelectronic elements on the master can be individually configured by adding the respective contacts. In a Mix & Match-approach, stepper lithography patterned the CMOS masters, and personalized contacts and metallization layers were added using VPG+ 400 laser lithography. (Courtesy of IMS Chips)
The VPG+ 200 and VPG+ 400 present the solution to fabricate high-quality photomasks required for advanced packaging applications. For some applications, e.g., Through-Silicon Via (TSV) for 3D-integrated circuits, direct write lithography is currently the only available advanced packaging solution. The VPG+ 200 and the VPG+ 400 maskless lithography systems offer high speed, automatic distortion compensation and excellent resolution in order to master these applications.
The VPG+ 200 and VPG+ 400 present the solution to fabricate high-quality photomasks required for advanced packaging applications. For some applications, e.g., Through-Silicon Via (TSV) for 3D-integrated circuits, direct write lithography is currently the only available advanced packaging solution. The VPG+ 200 and the VPG+ 400 maskless lithography systems offer high speed, automatic distortion compensation and excellent resolution in order to master these applications.
Waveguides for Photonics applications created using Mix-and-Match-approach with both e-beam and laser lithography. (Courtesy of IMS Chips)
Waveguides for Photonics applications created using Mix-and-Match-approach with both e-beam and laser lithography. (Courtesy of IMS Chips)
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.

Why customers choose our systems

"The VPG allows us to realize copper lines and chip-to-chip interconnects with a size down to 1 µm which is a three times smaller feature size than by using the conventional mask aligner process."

Markus Wöhrmann
Groupleader Lithography and Thin Film Polymers for Wafer Level Packaging
Fraunhofer Institute for Microintegration and Reliability
Berlin, Germany

"At TNO @ Holst Centre, the Heidelberg Instruments VPG is instrumental in our Research and Development effort by providing the ability to cycle quickly through design iterations and developing and optimizing manufacturing process flows of these designs."

Auke Jisk Kronemeijer, Research Manager Thin Film Electronics
TNO @ Holst Centre
Eindhoven, Netherlands

Technical Data

Write modeI-QXIIIIII
Writing performance
Minimum structure size [μm]0.750.7512
Minimum lines and spaces [µm]1.51.524
Address grid [nm]12.512.52550
Edge roughness [3σ, nm]30405070
CD uniformity [3σ, nm]556575110
Stitching stability [3σ, nm]306070100
Write speed (up to) [mm²/min] 550110039257825
Exposure time for 100 x 100 mm2 area [min]28145.63.5
System features
Light sourceHigh-power DPSS laser with 355 nm
Maximum substrate sizes9″ x 9″ / 17″ x 17″ / 800 x 800 mm²
Substrate thickness0 to 12 mm (other thicknesses on request)
Maximum exposure area205 x 205 mm2 / 410 x 410 mm2 / 800 x 800 mm²
AutofocusRealtime autofocus system (optical and pneumatic)
Autofocus compensation rangeUp to 150 µm
Flowbox(Closed-loop) temperature controlled environmental chamber
Alignment Camera system and software package for metrology and alignment
Other features and options2D Stage map and data, Mura correction, edge detector, multiple data input formats (DXF, CIF, GDSII, Gerber, and others), optional automatic mask handling, optional Zerodur® stage and special chucks
System dimensions VPG+ 200/400
System / Electronic rack
Width [mm]2605 / 800
Depth [mm]1652 / 650
Height [mm]2102 / 1800
Weight [kg]3550 / 180
Installation requirements VPG+ 200/400
Electrical400 VAC ± 5 %, 50/60 Hz, 16 A, 3 phases
Compressed air6 - 10 bar
System dimensions VPG+ 800
Width [mm]3100
Depth [mm]4250
Height [mm]2700
Weight [kg]10000
Installation requirements VPG+ 800
Electrical400 VAC ± 5 %, 50/60 Hz, 32 A, 3 phases
Compressed air8 - 10 bar

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

For now, please find the product brochure for the VPG+ 800 on the VPG+ 1400 FPD website.

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