VPG+ 1400 FPD / VPG+ 1850 FPD Volume Pattern Generators

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Designed for photomask production on large substrates in display applications

  • Product Description

  • Breakthrough efficiency meets superior quality with the VPG+ 1400 FPD and VPG+ 1850 FPD, the ultimate Volume Pattern Generators for high-volume production used by photomask manufacturers around the world. They are our largest systems specifically designed for the display industry and tailored for the high-throughput patterning of large-area photomasks up to G8.6 size and a maximum exposure area of 1400 x 1800 mm². They are the optimal solution for manufacturers looking to excel in the flat panel display industry.

    The VPG+ 1400 FPD and VPG+ 1850 FPD are designed for high-quality and fast exposures with extremely accurate alignment. They feature a differential interferometer with a resolution down to 1.2 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chamber complies with the most stringent requirements for advanced photomask fabrication.

    Enhance Your FPD Manufacturing

    • Flawless Displays: The VPG+ 1400 FPD and VPG+ 1850 FPD are optimized for the creation of high-resolution photomasks – including halftone masks – used in the production of key flat panel display (FPD) components, such as color filters (CF), thin film transistor (TFT) arrays, indium tin oxide (ITO) electrodes, touch panels (TP), fine metal masks (FFM), active-matrix organic light-emitting diodes (AMOLED), or other liquid crystal display (LCD) and organic light-emitting diode (OLED) related layers.
    • Outstanding Throughput: The VPG+ 1400 / 1850 FPD’s exceptional throughput capabilities ensure rapid mask production, allowing you to meet the demands of high-volume display manufacturing and optimize your production line.
    • Highest Precision & Reliability: The VPG+ 1400 / 1850 FPD deliver the precision and resolution needed for creating intricate patterns on large format masks, guaranteeing flawless transfer of your designs. They run reliably 24/7 for predictable delivery times.
    • Advanced Metrology: Included metrology package and tool matching functions for precise 2nd layer alignment capabilities used in large area greytone mask production.

    Maximize Performance

    • The ultra-high-speed exposure engine and high-power DPSS laser dramatically reduce writing times, enabling you to produce masks faster and maximize your production output.
    • The VPG+ systems boast excellent sub-µm resolution and image quality, guaranteeing the accurate transfer of your design patterns onto the photomask for flawless displays.
    • The automatic calibration tool streamlines your workflow by ensuring superb registration and positioning of written structures, saving you time and minimizing errors.
    • The large-format precision stage with flexible vacuum layout accommodates substrates up to 1850 mm, making it ideal for handling the demands of mid and large display photomasks.
    • The closed-loop environmental chamber maintains optimal conditions throughout the process, ensuring consistent mask quality, run after run.
    • The VPG+ 1400 / 1850 FPD support all industrial data formats, allowing for smooth integration with your existing design and fabrication workflows.

    Invest in the Future of Display Technology

    The VPG+ 1400 FPD and VPG+ 1850 FPD are an investment in the future of your display production capabilities. By implementing them in your production, you can achieve:

    • Exceptional mask quality for flawless display performance.
    • High throughput for high-volume display production and increased profitability.
    • Reduced production costs at a highly economic tool price.
    • Efficient tool operation and reliable performance.
    • Future-proof technology that scales with the demands of next-generation displays.

    Complement your display manufacturing with a highly economic tool. Contact us to discover how the VPG+ systems can accelerate your photomask production.

    Breakthrough efficiency meets superior quality with the VPG+ 1400 FPD and VPG+ 1850 FPD, the ultimate Volume Pattern Generators for high-volume production used by photomask manufacturers around the world. They are our largest systems specifically designed for the display industry and tailored for the high-throughput patterning of large-area photomasks up to G8.6 size and a maximum exposure area of 1400 x 1800 mm². They are the optimal solution for manufacturers looking to excel in the flat panel display industry.

    The VPG+ 1400 FPD and VPG+ 1850 FPD are designed for high-quality and fast exposures with extremely accurate alignment. They feature a differential interferometer with a resolution down to 1.2 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chamber complies with the most stringent requirements for advanced photomask fabrication.

    Enhance Your FPD Manufacturing

    • Flawless Displays: The VPG+ 1400 FPD and VPG+ 1850 FPD are optimized for the creation of high-resolution photomasks – including halftone masks – used in the production of key flat panel display (FPD) components, such as color filters (CF), thin film transistor (TFT) arrays, indium tin oxide (ITO) electrodes, touch panels (TP), fine metal masks (FFM), active-matrix organic light-emitting diodes (AMOLED), or other liquid crystal display (LCD) and organic light-emitting diode (OLED) related layers.
    • Outstanding Throughput: The VPG+ 1400 / 1850 FPD’s exceptional throughput capabilities ensure rapid mask production, allowing you to meet the demands of high-volume display manufacturing and optimize your production line.
    • Highest Precision & Reliability: The VPG+ 1400 / 1850 FPD deliver the precision and resolution needed for creating intricate patterns on large format masks, guaranteeing flawless transfer of your designs. They run reliably 24/7 for predictable delivery times.
    • Advanced Metrology: Included metrology package and tool matching functions for precise 2nd layer alignment capabilities used in large area greytone mask production.

    Maximize Performance

    • The ultra-high-speed exposure engine and high-power DPSS laser dramatically reduce writing times, enabling you to produce masks faster and maximize your production output.
    • The VPG+ systems boast excellent sub-µm resolution and image quality, guaranteeing the accurate transfer of your design patterns onto the photomask for flawless displays.
    • The automatic calibration tool streamlines your workflow by ensuring superb registration and positioning of written structures, saving you time and minimizing errors.
    • The large-format precision stage with flexible vacuum layout accommodates substrates up to 1850 mm, making it ideal for handling the demands of mid and large display photomasks.
    • The closed-loop environmental chamber maintains optimal conditions throughout the process, ensuring consistent mask quality, run after run.
    • The VPG+ 1400 / 1850 FPD support all industrial data formats, allowing for smooth integration with your existing design and fabrication workflows.

    Invest in the Future of Display Technology

    The VPG+ 1400 FPD and VPG+ 1850 FPD are an investment in the future of your display production capabilities. By implementing them in your production, you can achieve:

    • Exceptional mask quality for flawless display performance.
    • High throughput for high-volume display production and increased profitability.
    • Reduced production costs at a highly economic tool price.
    • Efficient tool operation and reliable performance.
    • Future-proof technology that scales with the demands of next-generation displays.

    Complement your display manufacturing with a highly economic tool. Contact us to discover how the VPG+ systems can accelerate your photomask production.

  • Product Highlights

  • Exposure Quality

    Edge roughness 20 nm; local CD uniformity 50 nm; address grid 8 nm; Mura correction; edge detection.

    Writing Stability

    Highly stable climate chamber, real-time climate compensations and software corrections for any environmental variations.

    Automated Alignment

    Metrology package with automated global and field-by-field alignment with distortion correction. Sophisticated 2D correction matrix for stage position calibration and tool matching.

    Scalability

    Scale easily for all sizes, from small and mid-size up to G8.6 display photomasks.

    Mura Control

    Pitch and panel pitch optimization.

  • Available Modules

  • Photomask Handling

    Semi-automatic substrate loading.

    Customization

    Special substrates, loader, or mask handling on request.

Breakthrough efficiency meets superior quality with the VPG+ 1400 FPD and VPG+ 1850 FPD, the ultimate Volume Pattern Generators for high-volume production used by photomask manufacturers around the world. They are our largest systems specifically designed for the display industry and tailored for the high-throughput patterning of large-area photomasks up to G8.6 size and a maximum exposure area of 1400 x 1800 mm². They are the optimal solution for manufacturers looking to excel in the flat panel display industry.

The VPG+ 1400 FPD and VPG+ 1850 FPD are designed for high-quality and fast exposures with extremely accurate alignment. They feature a differential interferometer with a resolution down to 1.2 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chamber complies with the most stringent requirements for advanced photomask fabrication.

Enhance Your FPD Manufacturing

  • Flawless Displays: The VPG+ 1400 FPD and VPG+ 1850 FPD are optimized for the creation of high-resolution photomasks – including halftone masks – used in the production of key flat panel display (FPD) components, such as color filters (CF), thin film transistor (TFT) arrays, indium tin oxide (ITO) electrodes, touch panels (TP), fine metal masks (FFM), active-matrix organic light-emitting diodes (AMOLED), or other liquid crystal display (LCD) and organic light-emitting diode (OLED) related layers.
  • Outstanding Throughput: The VPG+ 1400 / 1850 FPD’s exceptional throughput capabilities ensure rapid mask production, allowing you to meet the demands of high-volume display manufacturing and optimize your production line.
  • Highest Precision & Reliability: The VPG+ 1400 / 1850 FPD deliver the precision and resolution needed for creating intricate patterns on large format masks, guaranteeing flawless transfer of your designs. They run reliably 24/7 for predictable delivery times.
  • Advanced Metrology: Included metrology package and tool matching functions for precise 2nd layer alignment capabilities used in large area greytone mask production.

Maximize Performance

  • The ultra-high-speed exposure engine and high-power DPSS laser dramatically reduce writing times, enabling you to produce masks faster and maximize your production output.
  • The VPG+ systems boast excellent sub-µm resolution and image quality, guaranteeing the accurate transfer of your design patterns onto the photomask for flawless displays.
  • The automatic calibration tool streamlines your workflow by ensuring superb registration and positioning of written structures, saving you time and minimizing errors.
  • The large-format precision stage with flexible vacuum layout accommodates substrates up to 1850 mm, making it ideal for handling the demands of mid and large display photomasks.
  • The closed-loop environmental chamber maintains optimal conditions throughout the process, ensuring consistent mask quality, run after run.
  • The VPG+ 1400 / 1850 FPD support all industrial data formats, allowing for smooth integration with your existing design and fabrication workflows.

Invest in the Future of Display Technology

The VPG+ 1400 FPD and VPG+ 1850 FPD are an investment in the future of your display production capabilities. By implementing them in your production, you can achieve:

  • Exceptional mask quality for flawless display performance.
  • High throughput for high-volume display production and increased profitability.
  • Reduced production costs at a highly economic tool price.
  • Efficient tool operation and reliable performance.
  • Future-proof technology that scales with the demands of next-generation displays.

Complement your display manufacturing with a highly economic tool. Contact us to discover how the VPG+ systems can accelerate your photomask production.

Breakthrough efficiency meets superior quality with the VPG+ 1400 FPD and VPG+ 1850 FPD, the ultimate Volume Pattern Generators for high-volume production used by photomask manufacturers around the world. They are our largest systems specifically designed for the display industry and tailored for the high-throughput patterning of large-area photomasks up to G8.6 size and a maximum exposure area of 1400 x 1800 mm². They are the optimal solution for manufacturers looking to excel in the flat panel display industry.

The VPG+ 1400 FPD and VPG+ 1850 FPD are designed for high-quality and fast exposures with extremely accurate alignment. They feature a differential interferometer with a resolution down to 1.2 nm. Mura optimization ensures excellent CD uniformity and resolution, while the closed-loop environmental chamber complies with the most stringent requirements for advanced photomask fabrication.

Enhance Your FPD Manufacturing

  • Flawless Displays: The VPG+ 1400 FPD and VPG+ 1850 FPD are optimized for the creation of high-resolution photomasks – including halftone masks – used in the production of key flat panel display (FPD) components, such as color filters (CF), thin film transistor (TFT) arrays, indium tin oxide (ITO) electrodes, touch panels (TP), fine metal masks (FFM), active-matrix organic light-emitting diodes (AMOLED), or other liquid crystal display (LCD) and organic light-emitting diode (OLED) related layers.
  • Outstanding Throughput: The VPG+ 1400 / 1850 FPD’s exceptional throughput capabilities ensure rapid mask production, allowing you to meet the demands of high-volume display manufacturing and optimize your production line.
  • Highest Precision & Reliability: The VPG+ 1400 / 1850 FPD deliver the precision and resolution needed for creating intricate patterns on large format masks, guaranteeing flawless transfer of your designs. They run reliably 24/7 for predictable delivery times.
  • Advanced Metrology: Included metrology package and tool matching functions for precise 2nd layer alignment capabilities used in large area greytone mask production.

Maximize Performance

  • The ultra-high-speed exposure engine and high-power DPSS laser dramatically reduce writing times, enabling you to produce masks faster and maximize your production output.
  • The VPG+ systems boast excellent sub-µm resolution and image quality, guaranteeing the accurate transfer of your design patterns onto the photomask for flawless displays.
  • The automatic calibration tool streamlines your workflow by ensuring superb registration and positioning of written structures, saving you time and minimizing errors.
  • The large-format precision stage with flexible vacuum layout accommodates substrates up to 1850 mm, making it ideal for handling the demands of mid and large display photomasks.
  • The closed-loop environmental chamber maintains optimal conditions throughout the process, ensuring consistent mask quality, run after run.
  • The VPG+ 1400 / 1850 FPD support all industrial data formats, allowing for smooth integration with your existing design and fabrication workflows.

Invest in the Future of Display Technology

The VPG+ 1400 FPD and VPG+ 1850 FPD are an investment in the future of your display production capabilities. By implementing them in your production, you can achieve:

  • Exceptional mask quality for flawless display performance.
  • High throughput for high-volume display production and increased profitability.
  • Reduced production costs at a highly economic tool price.
  • Efficient tool operation and reliable performance.
  • Future-proof technology that scales with the demands of next-generation displays.

Complement your display manufacturing with a highly economic tool. Contact us to discover how the VPG+ systems can accelerate your photomask production.

Exposure Quality

Edge roughness 20 nm; local CD uniformity 50 nm; address grid 8 nm; Mura correction; edge detection.

Writing Stability

Highly stable climate chamber, real-time climate compensations and software corrections for any environmental variations.

Automated Alignment

Metrology package with automated global and field-by-field alignment with distortion correction. Sophisticated 2D correction matrix for stage position calibration and tool matching.

Scalability

Scale easily for all sizes, from small and mid-size up to G8.6 display photomasks.

Mura Control

Pitch and panel pitch optimization.

Photomask Handling

Semi-automatic substrate loading.

Customization

Special substrates, loader, or mask handling on request.

Customer applications

VPG 1400 mask production
Since 2007, VPG systems and their successors, the VPG+ systems, have proved to be the ideal solution for the high-volume production of demanding photomasks — especially for electronic packaging, color filters, light-emitting diodes, and touch panels. As a master template for photolithographic manufacturing, such photomasks have to fulfill the highest requirements for line width uniformity, pattern position accuracy, edge roughness, and minimum feature size.
The VPG+ series can be used for all display-related applications. In this field, the quality requirements on photomasks are exceptional. One key specification is the so-called Mura condition, describing 'unevenness' as a result of any disturbance in a regular periodic pattern. If the Mura condition fails to meet the requirements, the final display might have dark spots or patches. The V series of Maskless Lithography Systems offers a special Mura optimization function for good Mura condition, excellent CD uniformity, and resolution.
The VPG+ series can be used for all display-related applications. In this field, the quality requirements on photomasks are exceptional. One key specification is the so-called Mura condition, describing 'unevenness' as a result of any disturbance in a regular periodic pattern. If the Mura condition fails to meet the requirements, the final display might have dark spots or patches. The V series of Maskless Lithography Systems offers a special Mura optimization function for good Mura condition, excellent CD uniformity, and resolution.
Display application pattern on chrome mask after etching and resist stripping
Display application test pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.
Display Application pattern on chrome mask after etching and resist stripping
Display application pattern on chrome mask after etching and resist stripping.

Why customers choose our systems

"The VPG allows us to realize copper lines and chip-to-chip interconnects with a size down to 1 µm, which is three times smaller in feature size than when using the conventional mask aligner process."

Markus Wöhrmann
Group leader Lithography and Thin Film Polymers for Wafer Level Packaging
Fraunhofer Institute for Microintegration and Reliability
Berlin, Germany

"At TNO @ Holst Centre, the Heidelberg Instruments VPG is instrumental in our Research and Development effort by providing the ability to cycle quickly through design iterations and developing and optimizing manufacturing process flows of these designs."

Auke Jisk Kronemeijer, Research Manager Thin Film Electronics
TNO @ Holst Centre
Eindhoven, Netherlands

Technical Data

Write modeQXFX
Writing performanceHigh QualityHigh Throughput
Minimum structure size [μm]0.81
Address grid [nm]88
Edge roughness [3σ, nm]2040
Global CD uniformity [3σ, nm]70
Local CD uniformity [3σ, nm]5070
Plate-to-plate overlay (G8) [3σ, nm]250
Stitching [3σ, nm]4050
2nd layer alignment (1000 x 1000 mm² ) [mean+3σ nm]400
Write speed [mm²/min]14502900
System features
Light sourceHigh-power DPSS laser with 355 nm
Maximum substrate sizes1400 x 1500 mm² (VPG+ 1400 FPD) / 1400 x 1850 mm² (VPG+ 1850 FPD)
Substrate thickness0 to 15 mm
Maximum exposure area1400 x 1400 mm² (VPG+ 1400 FPD) / 1400 x 1800 mm² (VPG+ 1850 FPD)
AutofocusRealtime autofocus system (optical and pneumatic)
Autofocus compensation range250 µm
AutomationSemi-automatic loading system
FlowboxClosed-loop temperature controlled environmental chamber
Alignment Camera system for metrology and alignment
Other featuresMatrix correction software for stage position calibration, Mura and panel pitch optimization, edge detector system, multiple data input formats (DXF, CIF, GDSII and Gerber files)
System dimensions
Main unit (doors closed, loader extended)
Width [mm]5370
Depth [mm]7000
Height [mm]2800
Weight [kg]25000
Installation requirements
Electrical400 VAC ± 5 %, 50/60 Hz, 32 A
Compressed air8 - 10 bar

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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