ULTRA Semiconductor Mask Writer

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High-Throughput, High-Precision Photomask Writing for Mature Semiconductor Nodes

  • Product Description

  • In the competitive landscape of mature semiconductor fabrication, you face a critical challenge: how to increase throughput and maintain exceptional quality without escalating costs. The ULTRA laser mask writer is engineered to solve this exact problem. It provides a powerful, cost-effective solution for producing photomasks for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS, delivering the speed, precision, and reliability you need to maximize your yield and profitability.

    Why Choose the ULTRA?

    The ULTRA integrates state-of-the-art technology to address the primary concerns of modern mask shops: speed, accuracy, and return on investment.

    Accelerate Your Production with High Throughput

    Minimize tool downtime and meet demanding production schedules with productivity that surpasses legacy tools. The ULTRA’s advanced exposure engine and optimized write modes dramatically reduce mask writing times, enabling you to produce a standard 6” photomask in less than 45 minutes.

    • Fast SLM-based Exposure Engine: Delivers write speeds up to 580 mm²/minute without compromising quality.
    • Full Automatic Mask Handling: Reduces operator overhead with a simple, easy-to-use mask loading interface and ensures consistent, repeatable loading and unloading for continuous operation.
    • Optimized Write Modes: Provides the flexibility to prioritize speed or resolution to match your specific job requirements.

    Achieve Maximum Yield with Uncompromising Precision

    Every nanometer counts. The ULTRA is built on a foundation of high-precision components to ensure superior overlay, registration, and Critical Dimension (CD) uniformity, mask after mask.

    • High-Precision Stage System: A full air-bearing stage and a zero thermal expansion ZERODUR® chuck provide ultimate stability and eliminate thermal drift.
    • Advanced Position Control: A high-resolution differential interferometer system ensures extremely accurate and repeatable feature placement.
    • Tool Matching Functions: On-board correction capabilities allow you to precisely match the output of multiple machines, ensuring consistency across your entire mask set.

    Superior Image Quality and Seamless Integration

    Produce flawless photomasks with feature fidelity that meets the strictest standards. The ULTRA’s custom optics deliver sharp, well-defined structures down to 500 nm. Its thoughtful design ensures it fits effortlessly into your existing facility.

    • Custom High-NA Optics: Our custom-designed write lens and low-distortion UV optics guarantee exceptional image quality and structure uniformity.
    • Compact Footprint: The system is engineered to occupy minimal cleanroom space, allowing for easy integration into an existing mask shop infrastructure without costly renovations.
    • Proven Reliability: The ULTRA is a qualified, industry-tested platform trusted by leading photomask shops worldwide.

    Elevate Your Photomask Production

    Ready to see how the ULTRA can reduce your cycle times and increase your yield? Contact our experts today to discuss your application.

     

    In the competitive landscape of mature semiconductor fabrication, you face a critical challenge: how to increase throughput and maintain exceptional quality without escalating costs. The ULTRA laser mask writer is engineered to solve this exact problem. It provides a powerful, cost-effective solution for producing photomasks for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS, delivering the speed, precision, and reliability you need to maximize your yield and profitability.

    Why Choose the ULTRA?

    The ULTRA integrates state-of-the-art technology to address the primary concerns of modern mask shops: speed, accuracy, and return on investment.

    Accelerate Your Production with High Throughput

    Minimize tool downtime and meet demanding production schedules with productivity that surpasses legacy tools. The ULTRA’s advanced exposure engine and optimized write modes dramatically reduce mask writing times, enabling you to produce a standard 6” photomask in less than 45 minutes.

    • Fast SLM-based Exposure Engine: Delivers write speeds up to 580 mm²/minute without compromising quality.
    • Full Automatic Mask Handling: Reduces operator overhead with a simple, easy-to-use mask loading interface and ensures consistent, repeatable loading and unloading for continuous operation.
    • Optimized Write Modes: Provides the flexibility to prioritize speed or resolution to match your specific job requirements.

    Achieve Maximum Yield with Uncompromising Precision

    Every nanometer counts. The ULTRA is built on a foundation of high-precision components to ensure superior overlay, registration, and Critical Dimension (CD) uniformity, mask after mask.

    • High-Precision Stage System: A full air-bearing stage and a zero thermal expansion ZERODUR® chuck provide ultimate stability and eliminate thermal drift.
    • Advanced Position Control: A high-resolution differential interferometer system ensures extremely accurate and repeatable feature placement.
    • Tool Matching Functions: On-board correction capabilities allow you to precisely match the output of multiple machines, ensuring consistency across your entire mask set.

    Superior Image Quality and Seamless Integration

    Produce flawless photomasks with feature fidelity that meets the strictest standards. The ULTRA’s custom optics deliver sharp, well-defined structures down to 500 nm. Its thoughtful design ensures it fits effortlessly into your existing facility.

    • Custom High-NA Optics: Our custom-designed write lens and low-distortion UV optics guarantee exceptional image quality and structure uniformity.
    • Compact Footprint: The system is engineered to occupy minimal cleanroom space, allowing for easy integration into an existing mask shop infrastructure without costly renovations.
    • Proven Reliability: The ULTRA is a qualified, industry-tested platform trusted by leading photomask shops worldwide.

    Elevate Your Photomask Production

    Ready to see how the ULTRA can reduce your cycle times and increase your yield? Contact our experts today to discuss your application.

     

  • Product Highlights

  • High Exposure Quality

    Custom High-NA write lens and low distortion UV-optics

    High Precision

    Full air-bearing stage; zero thermal expansion ZERODUR® chuck; high resolution differential interferometer; stage corrections and tool matching functions

    High Throughput

    Fast SLM based exposure engine; fast mode; 6“ write time below 45 minutes

  • Available Modules

In the competitive landscape of mature semiconductor fabrication, you face a critical challenge: how to increase throughput and maintain exceptional quality without escalating costs. The ULTRA laser mask writer is engineered to solve this exact problem. It provides a powerful, cost-effective solution for producing photomasks for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS, delivering the speed, precision, and reliability you need to maximize your yield and profitability.

Why Choose the ULTRA?

The ULTRA integrates state-of-the-art technology to address the primary concerns of modern mask shops: speed, accuracy, and return on investment.

Accelerate Your Production with High Throughput

Minimize tool downtime and meet demanding production schedules with productivity that surpasses legacy tools. The ULTRA’s advanced exposure engine and optimized write modes dramatically reduce mask writing times, enabling you to produce a standard 6” photomask in less than 45 minutes.

  • Fast SLM-based Exposure Engine: Delivers write speeds up to 580 mm²/minute without compromising quality.
  • Full Automatic Mask Handling: Reduces operator overhead with a simple, easy-to-use mask loading interface and ensures consistent, repeatable loading and unloading for continuous operation.
  • Optimized Write Modes: Provides the flexibility to prioritize speed or resolution to match your specific job requirements.

Achieve Maximum Yield with Uncompromising Precision

Every nanometer counts. The ULTRA is built on a foundation of high-precision components to ensure superior overlay, registration, and Critical Dimension (CD) uniformity, mask after mask.

  • High-Precision Stage System: A full air-bearing stage and a zero thermal expansion ZERODUR® chuck provide ultimate stability and eliminate thermal drift.
  • Advanced Position Control: A high-resolution differential interferometer system ensures extremely accurate and repeatable feature placement.
  • Tool Matching Functions: On-board correction capabilities allow you to precisely match the output of multiple machines, ensuring consistency across your entire mask set.

Superior Image Quality and Seamless Integration

Produce flawless photomasks with feature fidelity that meets the strictest standards. The ULTRA’s custom optics deliver sharp, well-defined structures down to 500 nm. Its thoughtful design ensures it fits effortlessly into your existing facility.

  • Custom High-NA Optics: Our custom-designed write lens and low-distortion UV optics guarantee exceptional image quality and structure uniformity.
  • Compact Footprint: The system is engineered to occupy minimal cleanroom space, allowing for easy integration into an existing mask shop infrastructure without costly renovations.
  • Proven Reliability: The ULTRA is a qualified, industry-tested platform trusted by leading photomask shops worldwide.

Elevate Your Photomask Production

Ready to see how the ULTRA can reduce your cycle times and increase your yield? Contact our experts today to discuss your application.

 

In the competitive landscape of mature semiconductor fabrication, you face a critical challenge: how to increase throughput and maintain exceptional quality without escalating costs. The ULTRA laser mask writer is engineered to solve this exact problem. It provides a powerful, cost-effective solution for producing photomasks for microcontrollers, power management ICs, LEDs, IoT devices, photonics, and MEMS, delivering the speed, precision, and reliability you need to maximize your yield and profitability.

Why Choose the ULTRA?

The ULTRA integrates state-of-the-art technology to address the primary concerns of modern mask shops: speed, accuracy, and return on investment.

Accelerate Your Production with High Throughput

Minimize tool downtime and meet demanding production schedules with productivity that surpasses legacy tools. The ULTRA’s advanced exposure engine and optimized write modes dramatically reduce mask writing times, enabling you to produce a standard 6” photomask in less than 45 minutes.

  • Fast SLM-based Exposure Engine: Delivers write speeds up to 580 mm²/minute without compromising quality.
  • Full Automatic Mask Handling: Reduces operator overhead with a simple, easy-to-use mask loading interface and ensures consistent, repeatable loading and unloading for continuous operation.
  • Optimized Write Modes: Provides the flexibility to prioritize speed or resolution to match your specific job requirements.

Achieve Maximum Yield with Uncompromising Precision

Every nanometer counts. The ULTRA is built on a foundation of high-precision components to ensure superior overlay, registration, and Critical Dimension (CD) uniformity, mask after mask.

  • High-Precision Stage System: A full air-bearing stage and a zero thermal expansion ZERODUR® chuck provide ultimate stability and eliminate thermal drift.
  • Advanced Position Control: A high-resolution differential interferometer system ensures extremely accurate and repeatable feature placement.
  • Tool Matching Functions: On-board correction capabilities allow you to precisely match the output of multiple machines, ensuring consistency across your entire mask set.

Superior Image Quality and Seamless Integration

Produce flawless photomasks with feature fidelity that meets the strictest standards. The ULTRA’s custom optics deliver sharp, well-defined structures down to 500 nm. Its thoughtful design ensures it fits effortlessly into your existing facility.

  • Custom High-NA Optics: Our custom-designed write lens and low-distortion UV optics guarantee exceptional image quality and structure uniformity.
  • Compact Footprint: The system is engineered to occupy minimal cleanroom space, allowing for easy integration into an existing mask shop infrastructure without costly renovations.
  • Proven Reliability: The ULTRA is a qualified, industry-tested platform trusted by leading photomask shops worldwide.

Elevate Your Photomask Production

Ready to see how the ULTRA can reduce your cycle times and increase your yield? Contact our experts today to discuss your application.

 

High Exposure Quality

Custom High-NA write lens and low distortion UV-optics

High Precision

Full air-bearing stage; zero thermal expansion ZERODUR® chuck; high resolution differential interferometer; stage corrections and tool matching functions

High Throughput

Fast SLM based exposure engine; fast mode; 6“ write time below 45 minutes

Customer applications

Exposures on ULTRA
The ULTRA’s data path has been designed to be able to handle even complex geometries and dense patterns while upholding high exposure speed – even round or circular features can be written easily. The image shows circles (Ø 5 µm) etched in chrome with a line width of 600 nm.
Exposures on ULTRA
This optical microscope image shows a structure etched in chrome with a line width of 700 nm.
Exposures on ULTRA
Regular structure showing unifomity etched in chrome (line width 1 μm). Optical microscope image with a top illumination.
The image shows 500 nm tilted lines and spaces. With accuracy and uniformity as a key element they are of major relevance for many applications like SAW filters, printed circuits, and photonic structures like optical grids.
The image shows 500 nm tilted lines and spaces. With accuracy and uniformity as a key element they are of major relevance for many applications like SAW filters, printed circuits, and photonic structures like optical grids.
Exposures on ULTRA
500 nm holes with high density in IP3250 resist on Si Wafer. Uniformity of the exposure.
Exposures on ULTRA
SEM image of a waveguide pattern exposed in a 550 nm thick positive resist showing nice smooth edges and sharp vertical walls. (Courtesy of IMS Chips)

Technical Data

QX modeFX mode
Writing performance
Address grid [nm]410
Line edge roughness [3σ, nm]2040
Position accuracy [3σ, nm]4080
Overlay [3σ, nm]3060
Stitching [3σ, nm]2060
2nd layer alignment [max error / nm]100100
CD uniformity [3σ, nm]3060
Minimum feature size [nm]500700
Write speed [mm² / min]325580
Write time for 6″ x 6″ [min]7545
Operation
User interface (software)SEMI-compliant GUI
Maximum write area228 x 228 mm² (others on request)
Substrate size4", 5", 6", 7", and 9" masks (larger and other substrates on request)
System features
Optics0.9 NA objective lens
Low-distortion UV optics
Automatic calibration routines
LaserHigh power diode pumped solid state laser with 355nm wavelength
Focus systemReal-time optical autofocus
AlignmentCamera system
Distortion compensation
Global and Field-by-field alignment
Edge detector
Data pathReal-time compression
Scalable hardware concept
Input formats: All standard formats, e.g. GDSII and Jobdeck
Spatial Light ModulatorFrequency 350 kHz
Data rate 2.4 GB/s
AutomationFull automatic mask handling with two carrier stations up to 9“; optional SECS/GEM protocols
System dimensionsSystem / Electronic rack
Width [mm]2995 / 800
Depth [mm]1652 / 650
Height [mm]2102 / 1800
Weight [kg]3400 / 180
Installation requirements
Electrical400 VAC ± 5%, 50/60 Hz, 16A, 3 phases
Compressed air7 - 10 bar (without oil or other residue)

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the completeness and correctness of the translations.

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