The versatile and modular nanolithography tool
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Product Description
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The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.
Key Features
- High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
- Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
- In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
- Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
- Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
- Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.
Applications
- Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
- 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
- Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
- Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
- Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.
The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.
To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.
The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.
Key Features
- High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
- Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
- In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
- Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
- Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
- Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.
Applications
- Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
- 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
- Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
- Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
- Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.
The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.
To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.
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Product Highlights
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Thermal Scanning Probe Lithography
New approach to nanopatterning enabling applications not otherwise feasibleHigh-resolution
Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nmDamage-free Lithography
No damage from charged particles, no proximity effects, clean lift-offCompatibility
With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”Unique Thermal Cantilevers
Integrated microheater and distance sensor for easy exchange and cost-effectivenessPrecise Overlay and Stitching
Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shownIn-situ Imaging
Real-time visualization of patterned structure propertiesLow Cost of Ownership
No need for cleanroom, vacuum pump or expensive consumablesScripting
For easy automation of custom operations -
Available Modules
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Laser Sublimation Module
High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laserDecapede
Parallel writing with 10 tipsStandalone housing
Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)Full Glovebox Integration
Integration in glovebox available for nanolithography in a controlled environmentGrayscale Software Module
2.5D patterning at <2 nm vertical resolutionAutomated Overlay Software Module
Automated markerless overlay over existing topography with 25 nm accuracySmart-splitting Software Module
For optimized large layout handling and ordering of fieldsDynamic local temperature modulation
For thermochemical applications using local material modification through heat
The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.
Key Features
- High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
- Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
- In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
- Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
- Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
- Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.
Applications
- Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
- 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
- Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
- Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
- Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.
The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.
To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.
The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.
Key Features
- High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
- Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
- In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
- Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
- Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
- Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.
Applications
- Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
- 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
- Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
- Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
- Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.
The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.
To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.
Thermal Scanning Probe Lithography
High-resolution
Damage-free Lithography
Compatibility
Unique Thermal Cantilevers
Precise Overlay and Stitching
In-situ Imaging
Low Cost of Ownership
Scripting
Laser Sublimation Module
Decapede
Standalone housing
Full Glovebox Integration
Grayscale Software Module
Automated Overlay Software Module
Smart-splitting Software Module
Dynamic local temperature modulation
Customer applications

(L. Shani*, J. Chaaban* et al 2024 Nanotechnology 35 255302)


(Courtesy of Yannik Glauser, ETH Zürich)

(Courtesy of Dr. Xia Liu and Berke Erbas, EPFL)




(Image courtesy of Prof. Dr. Elisa Riedo, NYU)

(Courtesy of IBM Research, Publications in Science and PRL 2018)

(Courtesy of IBM Research Zurich, publication in 2018)

(Courtesy of S. Karg & A. Knoll, IBM Research – Zurich)

(Courtesy of Prof. Elisa Riedo, NYU)

Why customers choose our systems
"I enjoy the closed-loop lithography feature that NanoFrazor offers, which is very helpful in high precision lithography, overlay and stitching for the various applications in low dimensional material applications. Also I appreciate the prompt and professional responses (within 24 hours) from the NanoFrazor support team regarding all aspects of our needs in using the system."
Xiaorui Zheng, Assistant Professor, Principal Investigator
Westlake University
Hangzhou, China
"The Nanofrazor offers a unique combination of features in a single compact instrument for nanolithography. I highlight in particular markerless overlay and stitiching with low damage on 2D materials, 3D grayscale nanolithography, and direct thermal conversion and modification of materials."
Francesco Buatier de Mongeot, Professor of Experimental Condensed Matter Physics
Dipartimento di Fisica, Università di Genova
Genova, Italy
Technical Data
Thermal Probe Writing | Direct Laser Sublimation | ||
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Single Tip | Decapede | ||
Patterning performance | |||
Minimum structure size [nm] | 15 | 15 | 600 |
Minimum Lines and Spaces [half pitch, nm] | 25 | 25 | 1000 |
Grayscale / 3D-resolution (step size in PPA) [nm] | 2 | 2 | - |
Maximum writing field size [X μm x Y μm] | 60 x 60 | 60 x 60 | 60 x 60 |
Field stitching accuracy (markerless, using in-situ imaging) [nm] | 25 | 25 | 600 |
Overlay accuracy (markerless, using in-situ imaging) [nm] | 25 | 25 | 600 |
Write speed (typical scan speed) [mm/s] | 1 | 1 | 5 |
Write speed (50 nm pixel) [μm²/min] | 1000 | 10 000 | 100 000 |
Topography imaging performance | |||
Lateral imaging resolution (feature size) [nm] | 10 | ||
Vertical resolution (topography sensitivity) [nm] | <0.5 | ||
Imaging speed (@ 50 nm resolution) [μm²/min] | 1000 | 10 000 | - |
Base system features | |
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Substrate sizes | 1 x 1 mm² to 100 x 100 mm² (150 x 150 mm² possible with limitations)
Thickness: up to 10 mm |
Optical microscope | 0.6 μm digital resolution, 2 μm diffraction limit, 1.0 mm x 1.0 mm field of view, autofocus |
Magnetic cantilever holder | Fast (<1 min) and accurate tip exchange |
Vibration isolation | Active vibration isolation stage |
Optional system features / modularity | |
Direct laser sublimation | Laser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever |
Decapede | Parallel writing with 10 tips |
Standalone housing | Three-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg) |
Full glovebox integration | Integration in glovebox available for nanolithography in a controlled environment |
NanoFrazor cantilever features (both Single Tip and Decapede) | |
Integrated components | Tip heater, topography sensor, electrostatic actuation |
Tip geometry | Conical tip with <10 nm radius and 750 nm length |
Tip heater temperature range | 25 °C – 1100 °C (<1 K setpoint resolution) |
Base system dimensions & installation requirements | |
Height × width × depth | Table-top unit: 44 cm x 40 cm x 45 cm Controller: 84 cm x 60 cm x 56 cm |
Weight | Table-top unit: 50 kg Controller: 80 kg |
Power input | 1 x 110 or 220 V AC, 10 A |
Software features | |
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting |
Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.