The versatile and modular nanolithography tool

  • Product Description

  • The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

    Key Features

    • High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
    • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
    • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
    • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
    • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
    • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

    Applications

    • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
    • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
    • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
    • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
    • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

    The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

    To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

    The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

    Key Features

    • High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
    • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
    • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
    • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
    • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
    • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

    Applications

    • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
    • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
    • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
    • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
    • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

    The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

    To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

  • Product Highlights

  • Thermal Scanning Probe Lithography

    New approach to nanopatterning enabling applications not otherwise feasible

    High-resolution

    Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

    Damage-free Lithography

    No damage from charged particles, no proximity effects, clean lift-off

    Compatibility

    With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

    Unique Thermal Cantilevers

    Integrated microheater and distance sensor for easy exchange and cost-effectiveness

    Precise Overlay and Stitching

    Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

    In-situ Imaging

    Real-time visualization of patterned structure properties

    Low Cost of Ownership

    No need for cleanroom, vacuum pump or expensive consumables

    Scripting

    For easy automation of custom operations
  • Available Modules

  • Laser Sublimation Module

    High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

    Decapede

    Parallel writing with 10 tips

    Standalone housing

    Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

    Full Glovebox Integration

    Integration in glovebox available for nanolithography in a controlled environment

    Grayscale Software Module

    2.5D patterning at <2 nm vertical resolution

    Automated Overlay Software Module

    Automated markerless overlay over existing topography with 25 nm accuracy

    Smart-splitting Software Module

    For optimized large layout handling and ordering of fields

    Dynamic local temperature modulation

    For thermochemical applications using local material modification through heat

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

Key Features

  • High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
  • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
  • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
  • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
  • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
  • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

Applications

  • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
  • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
  • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
  • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
  • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

Key Features

  • High Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
  • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
  • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
  • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
  • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
  • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

Applications

  • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
  • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
  • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
  • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
  • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

High-resolution

Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

Damage-free Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

Unique Thermal Cantilevers

Integrated microheater and distance sensor for easy exchange and cost-effectiveness

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

In-situ Imaging

Real-time visualization of patterned structure properties

Low Cost of Ownership

No need for cleanroom, vacuum pump or expensive consumables

Scripting

For easy automation of custom operations

Laser Sublimation Module

High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

Decapede

Parallel writing with 10 tips

Standalone housing

Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

Full Glovebox Integration

Integration in glovebox available for nanolithography in a controlled environment

Grayscale Software Module

2.5D patterning at <2 nm vertical resolution

Automated Overlay Software Module

Automated markerless overlay over existing topography with 25 nm accuracy

Smart-splitting Software Module

For optimized large layout handling and ordering of fields

Dynamic local temperature modulation

For thermochemical applications using local material modification through heat

Customer applications

Why customers choose our systems

"I enjoy the closed-loop lithography feature that NanoFrazor offers, which is very helpful in high precision lithography, overlay and stitching for the various applications in low dimensional material applications. Also I appreciate the prompt and professional responses (within 24 hours) from the NanoFrazor support team regarding all aspects of our needs in using the system."

Xiaorui Zheng, Assistant Professor, Principal Investigator
Westlake University
Hangzhou, China

"The Nanofrazor offers a unique combination of features in a single compact instrument for nanolithography. I highlight in particular markerless overlay and stitiching with low damage on 2D materials, 3D grayscale nanolithography, and direct thermal conversion and modification of materials."

Francesco Buatier de Mongeot, Professor of Experimental Condensed Matter Physics
Dipartimento di Fisica, Università di Genova
Genova, Italy

Technical Data

Thermal Probe WritingDirect Laser Sublimation
Single TipDecapede
Patterning performance
Minimum structure size [nm]1515600
Minimum Lines and Spaces [half pitch, nm]25251000
Grayscale / 3D-resolution (step size in PPA) [nm]22-
Maximum writing field size [X μm x Y μm]60 x 6060 x 6060 x 60
Field stitching accuracy (markerless, using in-situ imaging) [nm]2525600
Overlay accuracy (markerless, using in-situ imaging) [nm]2525600
Write speed (typical scan speed) [mm/s]115
Write speed (50 nm pixel) [μm²/min] 100010 000100 000
Topography imaging performance
Lateral imaging resolution (feature size) [nm]10
Vertical resolution (topography sensitivity) [nm]<0.5
Imaging speed (@ 50 nm resolution) [μm²/min]100010 000-
Base system features
Substrate sizes1 x 1 mm² to 100 x 100 mm² (150 x 150 mm² possible with limitations)
Thickness: up to 10 mm
Optical microscope0.6 μm digital resolution, 2 μm diffraction limit, 1.0 mm x 1.0 mm field of view, autofocus
Magnetic cantilever holderFast (<1 min) and accurate tip exchange
Vibration isolationActive vibration isolation stage
Optional system features / modularity
Direct laser sublimationLaser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever
DecapedeParallel writing with 10 tips
Standalone housingThree-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)
Full glovebox integrationIntegration in glovebox available for nanolithography in a controlled environment
NanoFrazor cantilever features (both Single Tip and Decapede)
Integrated componentsTip heater, topography sensor, electrostatic actuation
Tip geometryConical tip with <10 nm radius and 750 nm length
Tip heater temperature range25 °C – 1100 °C (<1 K setpoint resolution)
Base system dimensions & installation requirements
Height × width × depthTable-top unit: 44 cm x 40 cm x 45 cm
Controller: 84 cm x 60 cm x 56 cm
WeightTable-top unit: 50 kg
Controller: 80 kg
Power input1 x 110 or 220 V AC, 10 A
Software features
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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