The versatile and modular nanolithography tool

  • Product Description

  • The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

    At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

    Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

    The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

    To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

    The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

    At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

    Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

    The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

    To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

  • Product Highlights

  • Thermal Scanning Probe Lithography

    New approach to nanopatterning enabling applications not otherwise feasible

    High-resolution

    Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

    Damage-free Lithography

    No damage from charged particles, no proximity effects, clean lift-off

    Compatibility

    With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

    Unique Thermal Cantilevers

    Integrated microheater and distance sensor for easy exchange and cost-effectiveness

    Precise Overlay and Stitching

    Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

    In-situ Imaging

    Real-time visualization of patterned structure properties

    Low Cost of Ownership

    No need for cleanroom, vacuum pump or expensive consumables

    Scripting

    For easy automation of custom operations
  • Available Modules

  • Laser Sublimation Module

    High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

    Decapede

    Parallel writing with 10 tips

    Standalone housing

    Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

    Full Glovebox Integration

    Integration in glovebox available for nanolithography in a controlled environment

    Grayscale Software Module

    2.5D patterning at <2 nm vertical resolution

    Automated Overlay Software Module

    Automated markerless overlay over existing topography with 25 nm accuracy

    Smart-splitting Software Module

    For optimized large layout handling and ordering of fields

    Dynamic local temperature modulation

    For thermochemical applications using local material modification through heat

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

High-resolution

Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

Damage-free Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

Unique Thermal Cantilevers

Integrated microheater and distance sensor for easy exchange and cost-effectiveness

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

In-situ Imaging

Real-time visualization of patterned structure properties

Low Cost of Ownership

No need for cleanroom, vacuum pump or expensive consumables

Scripting

For easy automation of custom operations

Laser Sublimation Module

High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

Decapede

Parallel writing with 10 tips

Standalone housing

Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

Full Glovebox Integration

Integration in glovebox available for nanolithography in a controlled environment

Grayscale Software Module

2.5D patterning at <2 nm vertical resolution

Automated Overlay Software Module

Automated markerless overlay over existing topography with 25 nm accuracy

Smart-splitting Software Module

For optimized large layout handling and ordering of fields

Dynamic local temperature modulation

For thermochemical applications using local material modification through heat

Customer applications

Technical Data

Thermal Probe WritingDirect Laser Sublimation
Single TipDecapede
Patterning performance
Minimum structure size [nm]1515600
Minimum Lines and Spaces [half pitch, nm]25251000
Grayscale / 3D-resolution (step size in PPA) [nm]22-
Maximum writing field size [X μm x Y μm]60 x 6060 x 6060 x 60
Field stitching accuracy (markerless, using in-situ imaging) [nm]2525600
Overlay accuracy (markerless, using in-situ imaging) [nm]2525600
Write speed (typical scan speed) [mm/s]115
Write speed (50 nm pixel) [μm²/min] 100010 000100 000
Topography imaging performance
Lateral imaging resolution (feature size) [nm]10
Vertical resolution (topography sensitivity) [nm]<0.5
Imaging speed (@ 50 nm resolution) [μm²/min]100010 000-
Base system features
Substrate sizes1 x 1 mm² to 100 x 100 mm² (150 x 150 mm² possible with limitations)
Thickness: up to 10 mm
Optical microscope0.6 μm digital resolution, 2 μm diffraction limit, 1.0 mm x 1.0 mm field of view, autofocus
Magnetic cantilever holderFast (<1 min) and accurate tip exchange
Vibration isolationActive vibration isolation stage
Optional system features / modularity
Direct laser sublimationLaser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever
DecapedeParallel writing with 10 tips
Standalone housingThree-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)
Full glovebox integrationIntegration in glovebox available for nanolithography in a controlled environment
NanoFrazor cantilever features (both Single Tip and Decapede)
Integrated componentsTip heater, topography sensor, electrostatic actuation
Tip geometryConical tip with <10 nm radius and 750 nm length
Tip heater temperature range25 °C – 1100 °C (<1 K setpoint resolution)
Base system dimensions & installation requirements
Height × width × depthTable-top unit: 44 cm x 40 cm x 45 cm
Controller: 84 cm x 60 cm x 56 cm
WeightTable-top unit: 50 kg
Controller: 80 kg
Power input1 x 110 or 220 V AC, 10 A
Software features
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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