NANOFRAZOR

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The versatile and modular nanolithography tool

  • Product Description

  • The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

    At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

    Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

    The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

    To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

    The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

    At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

    In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

    Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

    Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

    The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

    To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

  • Product Highlights

  • Thermal Scanning Probe Lithography

    New approach to nanopatterning enabling applications not otherwise feasible

    High-resolution

    Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

    Damage-free Lithography

    No damage from charged particles, no proximity effects, clean lift-off

    Compatibility

    With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

    Unique Thermal Cantilevers

    Integrated microheater and distance sensor for easy exchange and cost-effectiveness

    Precise Overlay and Stitching

    Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

    In-situ Imaging

    Real-time visualization of patterned structure properties

    Low Cost of Ownership

    No need for cleanroom, vacuum pump or expensive consumables

    Scripting

    For easy automation of custom operations

  • Available Modules

  • Laser Sublimation Module

    High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

    Decapede

    Parallel writing with 10 tips

    Standalone housing

    Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

    Full Glovebox Integration

    Integration in glovebox available for nanolithography in a controlled environment

    Grayscale Software Module

    2.5D patterning at <2 nm vertical resolution

    Automated Overlay Software Module

    Automated markerless overlay over existing topography with 25 nm accuracy

    Smart-splitting Software Module

    For optimized large layout handling and ordering of fields

    Dynamic local temperature modulation

    For thermochemical applications using local material modification through heat

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes.

At its core, the NanoFrazor features an ultra-sharp, heatable probe tip that writes and inspects complex nanostructures simultaneously. The Direct Laser Sublimation (DLS) module allows nano- and micro-structures to be written into the same resist layer efficiently in a single fabrication step.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing, in such a way that the parameters can be immediately adjusted. This approach, called Closed-Loop Lithography (CLL), results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.

Developed from over 20 years of R&D at IBM Research Zürich and now at Heidelberg Instruments Nano, the NanoFrazor continuously advances in hardware and software. Our experts refine pattern transfer processes like etching and lift-off for various applications, compiling expertise into a comprehensive library of best practices and protocols to support our customers.

Built on a modular platform, the NanoFrazor can be tailored to fit specific applications and laboratory environments. Patterning modes, housing options, and software modules can be combined for optimal capabilities, footprint, and flexibility. Upgrades and additional modules can be added as research evolves, ensuring the NanoFrazor adapts to advancing needs.

The NanoFrazor revolutionizes nanofabrication, making sophisticated t-SPL accessible for groundbreaking research and technological advancements.

To provide a more detailed perspective to the new NanoFrazor model, introduced first in May 2024, we have published a dedicated website, where you can learn more and configure your own system: nanofrazor.com.

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

High-resolution

Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

Damage-free Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

Unique Thermal Cantilevers

Integrated microheater and distance sensor for easy exchange and cost-effectiveness

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

In-situ Imaging

Real-time visualization of patterned structure properties

Low Cost of Ownership

No need for cleanroom, vacuum pump or expensive consumables

Scripting

For easy automation of custom operations

Laser Sublimation Module

High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

Decapede

Parallel writing with 10 tips

Standalone housing

Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

Full Glovebox Integration

Integration in glovebox available for nanolithography in a controlled environment

Grayscale Software Module

2.5D patterning at <2 nm vertical resolution

Automated Overlay Software Module

Automated markerless overlay over existing topography with 25 nm accuracy

Smart-splitting Software Module

For optimized large layout handling and ordering of fields

Dynamic local temperature modulation

For thermochemical applications using local material modification through heat

Customer applications

Nanoelectronics: InSb Nanowires with Electrodes
Electrical contacts to an InSb nanowire were fabricated using markerless overlay with the NanoFrazor. The nanowire was first precisely located using the integrated topography sensor, before the electrode design was overlaid and patterned. In order to protect the nanowire from damage, areas directly on the nanowire were patterned exclusively with t-SPL.
(L. Shani*, J. Chaaban* et al 2024 Nanotechnology 35 255302)
Electrodes overlaid and patterned with NanoFrazor
Fabricating full devices to investigate and exploit transition metal dichalcogenides is typically very challenging, due to the environmental sensitivity of these materials. With the NanoFrazor, electrodes were overlaid and patterned without the need to expose the underlying flakes to a harsh environment.
Optical Fourier surface for manipulation of light, made with NanoFrazor
Manipulation of light often requires sub-wavelength patterning capabilities in all three dimensions. With the NanoFrazor tool and the Closed Loop Lithography (CLL) capability, new landscapes such as optical Fourier surfaces are made possible. Large area requirements for nanophotonic applications are now also possible with the Decapede module where ten t-SPL cantilevers operate in parallel for increased throughput with sub-30 nm resolution.
(Courtesy of Yannik Glauser, ETH Zürich)
Example structure for sensitive electronic devices comprising 2D materials and transition metal dichalcogenides (TMDs)
FET device created on 2D material flake using grayscale patterning with the NanoFrazor.
(Courtesy of Dr. Xia Liu and Berke Erbas, EPFL)
Nanopillar array with diameters ranging from 30-200 nm. Potential use in flat optics and metasurface applications
Through standard pattern transfer processes, impressive image reversal of nanoholes was achieved, resulting in arrays of Si nanopillars with diameters ranging from 30-200 nm. These sub-100 nm diameter pillars hold immense potential for flat optics and metasurfaces applications. The Thermal Scanning Probe Lithography technology behind the NanoFrazor enables simultaneous patterning and inspection of nanoscale structures, making nanopillar fabrication seamless and efficient.
Nanowire-based quantum device after metal deposition and lift-off
Nanowire-based quantum devices can be fabricated using the ultra-sharp tip (for the high-resolution electrodes) and laser hybrid lithography (for the contact pads) with the NanoFrazor. Here is an optical image of the devices after metal deposition and lift-off.
Interdigitated electronic device with 180 nm wide inter-digitated electrodes
Inter-digitated electrode devices play a crucial role in microelectronics and sensing applications thanks to their unique design and functionality. These inter-digitated electrodes were patterned using a mix-and-match lithography process that combined t-SPL and direct laser writing of the NanoFrazor. Active stitching was used for the t-SPL writing of 180 nm wide inter-digitated electrodes, covering a horizontal area of 160 micrometers.
Bone-tissue replication, patterend with Thermal Scanning Probe Lithography, potential use in bionanotechnology
By using a thermal stimulus, Thermal Scanning Probe Lithography (t-SPL) allows for the manipulation of chemically sensitive surfaces with sub-30 nm resolution capabilities to unlock unique chemical gradients. In addition, biomimicry by grayscale patterning on polymers and other biocompatible materials opens the path to exciting bionanotechnology.
(Image courtesy of Prof. Dr. Elisa Riedo, NYU)
Nanofluidic rocking ratchets fabricated with single-nanometer accuracy by NanoFrazor patterning. A nanofluidic device with precisely engineered 3D topography harnesses Brownian motion to separate particles with down to 1 nm size difference by guiding them in opposite directions. (Courtesy of IBM Research, Publications in Science and PRL 2018)
Nanofluidic rocking ratchets fabricated with single-nanometer accuracy by NanoFrazor patterning. A nanofluidic device with precisely engineered 3D topography harnesses Brownian motion to separate particles with down to 1 nm size difference by guiding them in opposite directions.
(Courtesy of IBM Research, Publications in Science and PRL 2018)
Gaussians with varying distance ∆x written in PPA and etched into SiO2, to be stacked in distributed Bragg reflector, forming a photonic molecule. Cross-sections show Gaussian profiles for different ∆x, which controls the coupling strength between the cavities. Precise Gaussian profile is patterned using the NanoFrazor and the closed-loop lithography approach. (Courtesy of IBM Research Zurich, publication in 2018)
Gaussians with varying distance ∆x written in PPA and etched into SiO2, to be stacked in distributed Bragg reflector, forming a photonic molecule. Cross-sections show Gaussian profiles for different ∆x, which controls the coupling strength between the cavities. Precise Gaussian profile is patterned using the NanoFrazor and the closed-loop lithography approach.
(Courtesy of IBM Research Zurich, publication in 2018)
Indium arsenide (InAs) nanowires are notoriously sensitive to trapped charges that deteriorate the device performance by shifting the switching voltage away from zero and are difficult to remove. Such trapped charges are typical for the fabrication with electron beam lithography. The InAs nanowire device fabricated by NanoFrazor lithography, however, switches off exactly at 0 V. (Courtesy of S. Karg & A. Knoll, IBM Research – Zurich)
Indium arsenide (InAs) nanowires are notoriously sensitive to trapped charges that deteriorate the device performance by shifting the switching voltage away from zero and are difficult to remove. Such trapped charges are typical for the fabrication with electron beam lithography. The InAs nanowire device fabricated by NanoFrazor lithography, however, switches off exactly at 0 V.
(Courtesy of S. Karg & A. Knoll, IBM Research – Zurich)
A Hall-bar device patterned into a single-layer MoS2 flake using the NanoFrazor. The electrical contacts written using the heated tip exhibit vanishingly small Schottky barriers due to no resist residues and no damage to the flake. As a result, the devices with contacts and top gates patterened with the NanoFrazor, show record-high on-off ratios. (Courtesy of Prof. Elisa Riedo, NYU)
A Hall-bar device patterned into a single-layer MoS2 flake using the NanoFrazor. The electrical contacts written using the heated tip exhibit vanishingly small Schottky barriers due to no resist residues and no damage to the flake. As a result, the devices with contacts and top gates patterened with the NanoFrazor, show record-high on-off ratios.
(Courtesy of Prof. Elisa Riedo, NYU)
3D computer-generated 8-level hologram patterned in PPA and etched into Si (inset). Reactive ion etching enabled depth amplification from 70 nm to 700 nm.
3D computer-generated 8-level hologram patterned in PPA and etched into Si (inset). Reactive ion etching enabled depth amplification from 70 nm to 700 nm.

Why customers choose our systems

"I enjoy the closed-loop lithography feature that NanoFrazor offers, which is very helpful in high precision lithography, overlay and stitching for the various applications in low dimensional material applications. Also I appreciate the prompt and professional responses (within 24 hours) from the NanoFrazor support team regarding all aspects of our needs in using the system."

Xiaorui Zheng, Assistant Professor, Principal Investigator
Westlake University
Hangzhou, China

"The Nanofrazor offers a unique combination of features in a single compact instrument for nanolithography. I highlight in particular markerless overlay and stitiching with low damage on 2D materials, 3D grayscale nanolithography, and direct thermal conversion and modification of materials."

Francesco Buatier de Mongeot, Professor of Experimental Condensed Matter Physics
Dipartimento di Fisica, Università di Genova
Genova, Italy

Technical Data

Thermal Probe WritingDirect Laser Sublimation
Single TipDecapede
Patterning performance
Minimum structure size [nm]1515600
Minimum Lines and Spaces [half pitch, nm]25251000
Grayscale / 3D-resolution (step size in PPA) [nm]22-
Maximum writing field size [X μm x Y μm]60 x 6060 x 6060 x 60
Field stitching accuracy (markerless, using in-situ imaging) [nm]2525600
Overlay accuracy (markerless, using in-situ imaging) [nm]2525600
Write speed (typical scan speed) [mm/s]115
Write speed (50 nm pixel) [μm²/min] 100010 000100 000
Topography imaging performance
Lateral imaging resolution (feature size) [nm]10
Vertical resolution (topography sensitivity) [nm]<0.5
Imaging speed (@ 50 nm resolution) [μm²/min]100010 000-
Base system features
Substrate sizes1 x 1 mm² to 100 x 100 mm² (150 x 150 mm² possible with limitations)
Thickness: up to 10 mm
Optical microscope0.6 μm digital resolution, 2 μm diffraction limit, 1.0 mm x 1.0 mm field of view, autofocus
Magnetic cantilever holderFast (<1 min) and accurate tip exchange
Vibration isolationActive vibration isolation stage
Optional system features / modularity
Direct laser sublimationLaser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever
DecapedeParallel writing with 10 tips
Standalone housingThree-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)
Full glovebox integrationIntegration in glovebox available for nanolithography in a controlled environment
NanoFrazor cantilever features (both Single Tip and Decapede)
Integrated componentsTip heater, topography sensor, electrostatic actuation
Tip geometryConical tip with <10 nm radius and 750 nm length
Tip heater temperature range25 °C – 1100 °C (<1 K setpoint resolution)
Base system dimensions & installation requirements
Height × width × depthTable-top unit: 44 cm x 40 cm x 45 cm
Controller: 84 cm x 60 cm x 56 cm
WeightTable-top unit: 50 kg
Controller: 80 kg
Power input1 x 110 or 220 V AC, 10 A
Software features
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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