NanoFrazor – A New Generation of Thermal Scanning Probe Lithography

NanoFrazor System Lineup

We are thrilled to share some exciting updates about the NanoFrazor!
Building on over 20 years of rigorous R&D, the NanoFrazor continues to revolutionize nanofabrication with its Thermal Scanning Probe Lithography (t-SPL) technology. This pioneering system supports advanced research in quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays, excelling in applications like grayscale photonics and biomimetic substrates for cell growth.

Introducing the New Generation of NanoFrazor
The upcoming generation of the NanoFrazor features exciting configurations to enhance your research capabilities:

  • Parallel Writing: Accelerate your patterning processes with simultaneous multi-tip operations.
  • Large Layout Handling: Seamlessly manage extensive layouts with improved automation and advanced stitching.
  • Enhanced Automation: Achieve greater precision and efficiency with upgraded automation features.

Key Features of NanoFrazor:

  • Modular Platform: Tailor the NanoFrazor to fit your specific application and laboratory environment. Combine patterning modes, housing options, and software modules for optimal performance.
  • Direct Laser Sublimation Module: Write nano- and micro-structures swiftly in a single fabrication step with in-situ imaging for markerless overlay and real-time pattern comparison.
  • Closed-Loop Lithography: Achieve sub-2 nm vertical precision for intricate 2.5D (grayscale) shapes with fast and precise control of a heated nanoscale tip.
  • Ultra-Sharp, Heatable Probe Tip: Write and inspect complex nanostructures simultaneously, ensuring precise depth profiles and high-resolution patterns.

Our dedicated team of experts continuously refines pattern transfer processes, compiling this expertise into a comprehensive library of best practices and protocols to support your research endeavors. The NanoFrazor Recipe Book, containing recommended processes and material data, aids in seamlessly integrating t-SPL into your workflows.

The Heidelberg Instruments systems and technology pool comprises high-precision Maskless Aligner (MLA) and Laser Lithography systems for Direct Writing of 2D, 2.5D and 3D microstructures to mask-making, and systems based on Thermal Scanning Probe Lithography (t-SPL) for the advanced nanopatterning. 3D laser lithography systems based on Two-Photon Polymerization (TPP) technology close the gap between conventional laser lithography – the basis of Heidelberg Instruments’ strong core business – and the Thermal Scanning Probe Lithography (t-SPL) for nanopatterning.

Thermal Scanning Probe Lithography (t-SPL) is a patterning method in which a thermally sensitive resist is sublimated using an ultra-sharp heated tip. This method allows for complex, high-resolution nanostructures to be both written and visually inspected on the same tool.

The NanoFrazor technology represents an alternative to conventional nanofabrication methods. It allows both high-resolution patterning as well as imaging with a scan speed of 1 mm/s.

If you would like to know more, our team is on-hand to assist you with any questions you might have. Click the button below to contact us directly.

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