Nano-Micro-Lithography Symposium – Recap

On behalf of our partners Raith, Nanoscribe, GenISys and micro resist technology and our entire organization team, we’d like to thank all participants for attending Nano-Micro-Lithography Symposium (NMLS) and making it a great event!

One week ago today we launched NMLS for the second time as an online event, this time on
The platform gave everyone the opportunity to meet each other in a fun, “game-like” atmosphere, by moving around in a digital lecture hall and exhibition space.

Thank you to all partners, speakers and participants!

Among the topics covered in our symposium were maskless lithography, metrology and measuring, and nano and micro lithography from a material point of view. Participant feedback was overwhelmingly positive for our speakers and their well-thought-out and interesting presentations. A big thank you to all of them for the time and effort they took to make this event exciting and engaging.

Last, but not least, we’d also like to congratulate our raffle winner for winning the BBQ equipment. Enjoy!

We hope you found the symposium both informative and beneficial and we’re already looking forward to seeing you again next year.


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