디스플레이 애플리케이션의 대형 기판에서 포토마스크 제작을 위한 설계
고객 어플리케이션
고객이 당사 시스템을 선택하는 이유
기술 데이터
| 쓰기 모드 | QX | FX | FX |
|---|---|---|---|
| 쓰기 성능 | 고품질 | 높은 처리량 | 높은 처리량 |
| 최소 구조 크기 [μm] | 0.8 | 1 | 1 |
| 주소 그리드 [nm] | 8 | 8 | 8 |
| 가장자리 거칠기 [3σ, nm] | 20 | 40 | 40 |
| 글로벌 선폭 균일도 [3σ, nm] | 50 | 70 | |
| 로컬 선폭 균일도 [3σ, nm] | 50 | 250 | 70 |
| 플레이트 투 플레이트 오버레이(G8) [3σ, nm] | 40 | 250 | |
| 스티칭 [3σ, nm] | 40 | 100 | 50 |
| 세컨드 레이어 얼라이먼트 (1000 x 1000 mm²) [평균+3σ nm] | 1375 | 400 | |
| 쓰기 속도 [mm²/min] | 1450 | 2900 |
| 시스템 기능 | |
|---|---|
| 광원 | 355nm의 고출력 DPSS 레이저 |
| 최대 기판 크기 | 1400 x 1500mm² (VPG+ 1400 FPD) / 1400 x 1850mm² (VPG+ 1850 FPD) |
| 기판 두께 | 0~15mm |
| 최대 노출 영역 | 1400 x 1400mm² (VPG+ 1400 FPD) / 1400 x 1800mm² (VPG+ 1850 FPD) |
| 자동 초점 | 실시간 자동 초점 시스템(광학 및 공압식) |
| 자동 초점 보정 범위 | 250 µm |
| 자동화 | 반자동 로딩 시스템 |
| 플로우박스 | 폐쇄 루프 온도 제어 환경 챔버 |
| 정렬 | 계측 및 정렬을 위한 카메라 시스템 |
| 기타 기능 | 무대 위치 보정을 위한 매트릭스 보정 소프트웨어, 무라 및 패널 피치 최적화, 에지 검출기 시스템, 다양한 데이터 입력 포맷 (DXF, CIF, GDSII 및 거버 파일) |
| 시스템 크기 | |
| 본체(도어 닫힘, 로더 확장) | |
| 너비 [mm] | 5370 |
| 깊이 [mm] | 7000 |
| 높이 [mm] | 2800 |
| 무게 [kg] | 25000 |
| 설치 요구 사항 | |
| 전기 | 400VAC ± 5%, 50/60Hz, 32A |
| 압축 공기 | 8 - 10 바 |
관련 간행물
| Title | Date | Publisher | Summary | Link |
|---|---|---|---|---|
| Maskless Photolithography for Micro- and Nanofabrication | March 13, 2026 | Moore More | A comprehensive review of maskless photolithography, covering its principles, equipment, photoresponsive materials, applications, development history, and future directions in micro- and nanofabrication. | |
| Design and Calibration of a Single-Lens Telecentric Four-Camera Array Based on Planar Mirrors and Its Application in Strain Measurement | February 25, 2026 | MDPI | Single-lens telecentric four-camera array using planar mirrors enables high-precision, non-contact strain measurement, reducing parallax errors and matching strain gauge accuracy in pipeline monitoring applications. | |
| Heidelberg Instruments Reports Major Order for VPG+ 1850 FPD Volume Pattern Generator from Leading Asian Display Photomask Manufacturer | December 18, 2025 | Heidelberg Instruments | Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system. | |
| Plasmonic Biosensor Enabled by Resonant Quantum Tunnelling | June 26, 2025 | nature photonics | Quantum-tunnelling-powered plasmonic metasurfaces enable integrated, light-source-free biosensing with enhanced sensitivity to nanometre-scale polymer and biomolecule coatings. | |
| Overlay Results on Halftone FPD Photomasks with an Advanced High-Productivity Lithography System | November 20, 2024 | SPIE. Digital Library | High-productivity lithography with the VPG⁺ 1400 FPD enables precise overlay of halftone FPD photomask layers, achieving 300 nm 3σ overlay and sub-100 nm CDU on G6 substrates. | |
| Heidelberg Instruments Reports Major Orders for the VPG+ 1400 FPD Volume Pattern Generator from Leading Asian Photomask Manufacturers | November 7, 2024 | Heidelberg Instruments | Heidelberg Instruments has secured two major orders for its VPG+ 1400 FPD Volume Pattern Generator from leading photomask manufacturers in Asia. | |
| “Sauber und laufruhig im Reinraum” – ReinRaumTechnik 3/2023 | May 31, 2023 | WILEY Verlag | Power supply system for particle-free semiconductor manufacturing in Heidelberg Instruments’ facilities. Only available in German at this point. | |
| Maskless Direct Write Lithography for 3D Wafer-Level-System-Integration | May 1, 2023 | IMAPSource Proceedings | Direct write lithography with the VPG⁺ 400 enables high-density Cu RDL and hybrid-bond interconnect formation on 300 mm wafers, achieving sub-2 μm resolution and high overlay accuracy for 3D integration. | |
| Microengineered Devices Enable Long-Term Imaging of the Ventral Nerve Cord in Behaving Adult Drosophila | August 25, 2022 | nature communications | Microengineered implants enable minimally invasive, long-term imaging of the Drosophila ventral nerve cord, revealing neural adaptations to injury, drug ingestion, aging, and behavior. | |
| Accurate Determination of 3D PSF and Resist Effects in Grayscale Laser Lithography | September 19, 2018 | SPIE. Digital Library | A method for accurately calibrating 3D point spread functions and resist parameters in grayscale laser lithography with the VPG 400, enabling precise prediction of fabricated photoresist topographies. |
