Traditions of the past transformed into efficient production Conventional optical lithography requires the use of a mask aligner to fabricate a photomask which is then
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View
In January and February of 2023 we will be participating in several premier conferences and exhibitions. Get the preview for
Heidelberg, Germany – We are happy to announce that one hundred and fifty MLA 150 Maskless Aligners have been successfully
From pioneering work to market leadership in maskless laser lithography – The Heidelberg Instruments MLA 150 Maskless Aligner is an
From us to you – Season’s Greetings! We wish you and your loved ones a joyful time, the space to
The MPO 100, the 3D Lithography and 3D Microprinting tool based on Two-Photon Polymerization (TPP) technology is an ideal multi-user
Chips Powering the Data Age When the SEMICON Europa 2022 gets underway next month at the Messe München in Munich,
All users of Heidelberg Instruments and Multiphoton Optics products are invited to participate in our new “Application Image Competition on
Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly
Heidelberg/Würzburg, Germany – The Würzburg based company Multiphoton Optics GmbH will become a subsidiary of Heidelberg Instruments Mikrotechnik GmbH, after
