Traditions of the past transformed into efficient production Conventional optical lithography requires the use of a mask aligner to fabricate a photomask which is then
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Get a sneak peek into current material related research and further prospects. Our webinars on our NanoFrazor® Technology cover a
Heidelberg, Germany – Heidelberg Instruments, a global player in direct write technology and solution provider for the advanced packaging market,
Successful 7th Edition of the Thermal Probe Workshop hosted by Heidelberg Instruments Nano After a break of more than three
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View
In January and February of 2023 we will be participating in several premier conferences and exhibitions. Get the preview for
Heidelberg, Germany – We are happy to announce that one hundred and fifty MLA 150 Maskless Aligners have been successfully
From pioneering work to market leadership in maskless laser lithography – The Heidelberg Instruments MLA 150 Maskless Aligner is an
From us to you – Season’s Greetings! We wish you and your loved ones a joyful time, the space to
