Lithography is always followed by further fabrication steps, for example a transfer of a pattern into the target material with an amplified aspect ratio. Materials and process parameters can vary greatly and depend on specific requirements of the samples and devices.
Researchers and engineers in our process and applications labs (PAL) in Heidelberg and Zurich have accumulated decades of experience, which translate into vast know-how gathered in recipe books. We consult our customers on the optimal choice of materials and process parameters and support them in achieving the desired micro- and nanostructures.
We also closely collaborate with resist manufacturers to develop custom resists for specific applications.