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1D & 2D Materials
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Core Technologies
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Maskless Laser Lithography
3D Lithography by Two-Photon Polymerization
Thermal Scanning Probe Lithography
Key Features
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Grayscale Lithography
High Aspect Ratio
High & Ultra-High Resolution
Small & Unconventional Substrates
In-situ Inspection & Metrology
Non-invasive Nanolithography
Accurate Pattern Placement
Products
Menu Toggle
Research & Development
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µMLA Maskless Aligner
MLA 150 Maskless Aligner
DWL 66
+
Laser Lithography System
MPO 100 3D Lithography Tool
NanoFrazor® Scholar
NanoFrazor® Explore
Industrial
Menu Toggle
MLA 300 Maskless Aligner
DWL 2000 GS / DWL 4000 GS Laser Lithography Systems
VPG
+
200/ VPG
+
400 Volume Pattern Generators
VPG
+
800/ VPG
+
1400 Volume Pattern Generators
ULTRA Semiconductor Mask Writer
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