Maskless lithography

Maskless lithography brings the missing flexibility to lithography. Without the time and cost constraints of a fixed mask, a design can be modified minutes before it is exposed.  High throughput maskless aligners are making maskless lithography attractive as the modern-day alternative to the traditional Mask Aligner. Maskless lithography systems expose a design pattern directly onto the resist-covered substrate surface. They typically comprise a UV light source (laser), a light modulator which converts digital data into a light pattern, and optical elements to project the pattern onto the substrate.  As with standard mask-based lithography, the light pattern is selected as binary on or off, exposing the complete resist thickness.


All users of Heidelberg Instruments and Multiphoton Optics products are invited to participate in our new “Application Image Competition on Advanced Nano & Micro Fabrication”. This is an opportunity for

Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly organize the 2022 edition of their traditional technical workshop.  For

Heidelberg/Würzburg, Germany – The Würzburg based company Multiphoton Optics GmbH will become a subsidiary of Heidelberg Instruments Mikrotechnik GmbH, after resources have already been pooled in various business areas since


NEMS Masks
2D Materials Microfluidics
Nanofluidics & Nanobiology Nanoelectronics
Material Science Photomasks
Nanoimprint Templates Advanced Packaging


Key Features

NEMS Masks
Microfluidics Nanoelectronics
Quantum Devices Photomasks

Key Features

Core Technologies

NEMS Masks
Microfluidics Nanoelectronics
Quantum Devices Photomasks

Core Technologies

Dates & Events

SPIE Photonics West 2021

Digital Forum

Our clients

Our clients

Driving technology for leading brands

Unsere Produkte entdecken

Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in Optics, Photonics, Mechanics and Biomedical Engineering.

Discover more about the NanoFrazor Explore All-Round Nanofabrication System.

Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.

Click to explore the NanoFrazor Scholar Nanofabrication System.

Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.

Learn more about the ULTRA Semiconductor Laser Mask Writer.

A tool specifically made to produce non-critical semiconductor photomasks for 130 nm designs and non-Manhattan designs.

Explore the VPG+ 800/1100-1400 Volume Pattern Generators.

Photomask production on large substrates, perfect for display applications.

Get more information about the VPG+ 200/400 Volume Pattern Generators.

A production tool for standard photomasks and microstructures in i-line resists.

The most advanced industrial grayscale lithography tool on the market.

Read more about the DWL 66+ Laser Lithography System.

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

Discover more about the MLA300 Industrial Maskless Aligner.

Optimised for industrial production with highest throughput and seamless integration into industrial production lines.

Learn more about the MLA150 Maskless Aligner.

The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.

Unsere Produkte entdecken

Company Story


Do you have the courage to drive forward and implement your ideas with a lot of scope for development and personal responsibility? We provide the trusting atmosphere of our family-business at Heidelberg Instruments for you to do just that – true to our motto of “Trusting in brave ideas.”


Heidelberg Instruments designs, develops, and manufactures maskless laser lithography systems for the fabrication of micro-structures, serving the global photolithography community in both the direct writing field and in photomask production.

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