HEIDELBERG INSTRUMENTS
Maskless lithography
Maskless lithography brings the missing flexibility to lithography. Without the time and cost constraints of a fixed mask, a design can be modified minutes before it is exposed. High throughput maskless aligners are making maskless lithography attractive as the modern-day alternative to the traditional Mask Aligner. Maskless lithography systems expose a design pattern directly onto the resist-covered substrate surface. They typically comprise a UV light source (laser), a light modulator which converts digital data into a light pattern, and optical elements to project the pattern onto the substrate. As with standard mask-based lithography, the light pattern is selected as binary on or off, exposing the complete resist thickness.
HEIDELBERG INSTRUMENTS News
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View (IFoV) writing mode, using the synchronized 5-axes design in Multiphoton
In January and February of 2023 we will be participating in several premier conferences and exhibitions. Get the preview for SPIE Photonics West 2023, nano tech 2023 and SPIE Advanced
Heidelberg, Germany – We are happy to announce that one hundred and fifty MLA 150 Maskless Aligners have been successfully installed worldwide at our customers facilities. First launched to the
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Key Features
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Dates & Events
SPIE Photonics West 2021
Digital Forum
Our clients
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Driving technology for leading brands
Unsere Produkte entdecken
Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.
Table-top thermal scanning probe lithography system with in-situ AFM imaging, compact and compatible with glovebox.
A tool specifically made to produce non-critical semiconductor photomasks for 130 nm designs and non-Manhattan designs.
Photomask production on large substrates, perfect for display applications.
A production tool for standard photomasks and microstructures in i-line resists.
The most advanced industrial grayscale lithography tool on the market.
Our most versatile system for research and prototyping with variable resolution and wide selection of options.
Optimised for industrial production with highest throughput and seamless integration into industrial production lines.
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography.
Unsere Produkte entdecken
Company Story
Career
Do you have the courage to drive forward and implement your ideas with a lot of scope for development and personal responsibility? We provide the trusting atmosphere of our family-business at Heidelberg Instruments for you to do just that – true to our motto of “Trusting in brave ideas.”
Company
Heidelberg Instruments designs, develops, and manufactures maskless laser lithography systems for the fabrication of micro-structures, serving the global photolithography community in both the direct writing field and in photomask production.
