Heidelberg, Germany, 26 August 2021: Heidelberg Instruments announced order for an ULTRA Semiconductor Laser Mask Writer from a large photomask production group in China.
ULTRA Semiconductor Laser Mask Writer is the industry’s most economical solution for the production of photomasks with a 180 nm design node. With its high throughput, small minimum feature size, excellent overlay, 2nd layer alignment, and CD uniformity, ULTRA is an ideal tool to address diverse applications in the semiconductor industry.
ULTRA features multiple high-speed Spatial Light Modulators (SLM) to achieve a finer address grid and higher throughput. Its high-speed data path is designed to handle the most complex geometries and dense patterns while maintaining high exposure speed. In addition, a custom-designed objective lens with NA of 0.9 and an address grid of 5nm, along with excellent focus control, contribute to outstanding CD Uniformity.
For more information about ULTRA Semiconductor Laser Mask Writer, please visit our website at https://heidelberg-instruments.com/product/ultra-semiconductor-mask-writer/
About Heidelberg Instruments
With over 35 years of experience and more than 1,000 installed systems, Heidelberg Instruments Mikrotechnik GmbH is one of the leading global players in the design, development and production of high-precision photolithography and nanofabrication tools. The company’s systems are installed in industrial and scientific facilities worldwide. They are used for direct imaging and photomask fabrication in various industries — including semiconductors, quantum computing, photonics, 2D materials, IOT, and many related application fields.
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