Heidelberg Instruments is heading to Southampton, UK, for the 51st International Micro and Nano Engineering Conference (MNE 2025)! From September 15-18, we’re proud to participate as a Platinum Sponsor and exhibitor. Join us to explore our latest advances in maskless laser lithography and direct-write technology.

Our team will be on-site to share insights, discuss new innovations, and explore future projects with the vibrant lithography community.

A Special Milestone: 10 Years of the MLA 150

This year’s conference is particularly special as we celebrate the 10th anniversary of our MLA 150 Maskless Aligner. Since its launch in 2015, the MLA 150 has become an indispensable workhorse in cleanrooms worldwide, delivering high-performance, flexible, and cost-effective patterning. We’re excited to mark this milestone with the community that helped make it a success.

Visit our anniversary page and come by our booth #10 on Monday, 6 PM, to have a cocktail with us!

Honoring Excellence in Research

We are honored to continue our tradition of supporting the prestigious MNE Fellow Award. This year, we congratulate Professor Emeritus Lars Montelius (Lund University), Director of Innovative Advanced Materials (AM-I), on receiving this award in recognition of his outstanding research contributions. It’s a privilege to support and celebrate his impactful work.

Don’t Miss Our Featured Talks

Be sure to add these presentations from our experts and partners to your MNE schedule:

• BEAMeeting Presentation: On Monday, Sept. 15, at 14:00 (BST), Mark Rosamond from the University of Leeds will share his experiences with the MLA 150 Maskless Aligner at the BEAMeeting, organized by our partners from GenISys alongside the conference.
• Shotgun Presentation: On Tuesday, Sept. 16, at 13:10, Sven Preuss from Heidelberg Instruments will present the latest upgrades of the DWL 66⁺, the ultimate lithography research tool, in 5 minutes.
• Featured Talk: On Wednesday, Sept. 17, at 11:45, Julia Stark from Heidelberg Instruments Nano will highlight the advances in parallelization of thermal scanning probe lithography and large-area patterning in the Plenary Hall.

We can’t wait to connect with peers, partners, and pioneers at MNE 2025. Visit our booth #10 to discuss your next project. See you in Southampton!