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From Classical Optics to Quantum Electronics – A Researcher’s Journey with Dr. Nolan Lassaline

Nolan Lassine next to the NanoFrazor

In the fast-evolving world of nanoscience, pioneering breakthroughs often come from curiosity-driven exploration. Dr. Nolan Lassaline, a postdoctoral fellow at the Technical University of Denmark (DTU), embodies this spirit of innovation. His journey from studying photon behavior to pushing the boundaries of quantum electronics is a fascinating story of blending classical optics with advanced nanofabrication techniques.

In an exclusive interview featured in the upcoming third issue of The Lithographer, Dr. Lassaline shares how his passion for thermal scanning probe lithography (t-SPL) began during his internship at IBM Zurich, the birthplace of scanning probe microscopy. This sparked a new direction in his PhD work at ETH Zurich, where he used the NanoFrazor to explore the unknown in optics and to create groundbreaking diffraction structures that manipulate photons and electrons at the nanoscale. His experimental approach led to the concept of “Fourier Surfaces,” a revolutionary method for tailoring diffraction and optical band structures.

Now, as he studies quantum materials at DTU, Dr. Lassaline continues to unlock the potential of 2D materials, using t-SPL to program quantum functionalities in graphene. From his work on the smallest “vinyl” record ever cut to being nominated as an Emerging Leader by the Journal of Physics: Materials, his achievements have set him on a path of exploration, blending optics, electronics, and nanofabrication in entirely new ways.

Want to hear more about his journey and what’s next on the horizon? Read the full interview here.
Stay tuned for the latest issue of The Lithographer!

The Heidelberg Instruments systems and technology pool comprises high-precision Maskless Aligner (MLA) and Laser Lithography systems for Direct Writing of 2D, 2.5D and 3D microstructures to mask-making, and systems based on Thermal Scanning Probe Lithography (t-SPL) for the advanced nanopatterning. 3D laser lithography systems based on Two-Photon Polymerization (TPP) technology close the gap between conventional laser lithography – the basis of Heidelberg Instruments’ strong core business – and the Thermal Scanning Probe Lithography (t-SPL) for nanopatterning.

Maskless Lithography as the state-of-the-art, high-precision, highly flexible technology is ideal for use in both R&D as well as environments where rapid-prototyping of feature sizes greater than 1 µm are required. The maskless lithography technique enables you to transfer the design directly to the wafer without the need for a photomask.

In maskless lithography the pattern is exposed directly onto the substrate surface with the help of a spatial light modulator, or SLM, which serves as a “dynamic photomask”.

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