DWL 66⁺ Système de lithographie laser

A laser-scanning grayscale lithography and smoothing process reduces nanoscale roughness in ultra-thick polymer resists, advancing high-quality 3D polymer optics.

A systematic calibration strategy improves grayscale lithography accuracy in thick resists, mitigating proximity effects and enabling reliable structures from below 500 nm to over 6 μm.

A diffractive, compressive microscope using a 48-sensor array achieves snapshot gigapixel imaging, ~3 μm resolution over >5.2 cm² at 120 fps, boosting spatiotemporal throughput to 25.2 billion pixels/second.

A reconfigurable optical filter combines phase-change materials with a multimode Bragg grating and microring, enabling FSR-free operation, low loss, high side-mode suppression, and over 30 nm continuous tuning.

A microfluidic platform confines plant protoplast aggregates, enabling long-term culture, imaging, media exchange, and controlled cell-cell interactions, enhancing viability, division, and studies of growth and stress responses.

Direct laser writing with the Heidelberg Instruments DWL 66⁺ and NanoFrazor enables nanoscale oxygen-stoichiometry tuning in YBCO, precisely controlling superconducting properties and enabling scalable functional nanostructures.

This paper presents a ring-electrode AC plasmonic nanopore sensor that distinguishes empty and genome-loaded AAV particles, including different DNA conformations, enabling sensitive single-particle quality control for gene therapy vectors.

ETH Zurich researchers show that engineered cavity vacuum fields can control a correlated electronic phase, advancing quantum materials engineering through cavity quantum electrodynamics.

Over the past decade, maskless aligners have transformed lithography by eliminating photomasks, enabling rapid design iteration, high-precision patterning, and faster microfabrication workflows in research and production.

Two-dimensional material-property gradients in magnetic thin films unlock novel behaviors, enabling devices such as spin-wave filters and passive domain-wall reset architectures, expanding functionality for future technologies.

Grayscale lithography with soft nanoimprinting enables low-cost, single-step fabrication of high-quality diffractive optics, expanding design freedom for lenses, holography, and advanced optical systems.

This application note describes a low-temperature lithographic process for fabricating high-resolution silicon metalenses, overcoming thermal stress issues and enabling scalable production for mid-IR optics.

Direct laser–written Sb2Se3 phase-change metasurfaces enable ultra-compact, low-loss, nonvolatile programmable photonic neural networks, achieving state-of-the-art accuracy in on-chip diffractive deep learning tasks.

Photodegradable PEG hydrogels enable spatiotemporal control of bacterial motion, speed, and delivery, guiding chemotaxis and controlled release for advanced living-material and therapeutic applications.

Poster by Gerda Ekindorf about grayscale exposure challenges using direct-write laser exposure on thick positive resists.

The DWL 66⁺ enables precise photoresist patterning on KOH-etched silicon sidewalls, achieving superior resolution compared to traditional mask aligners.

Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺ direct-write lithography system, solidifying its position as the ultimate research tool for microfabrication.

Magnetic-field-aligned nanowires enable transparent, conformable magnetoresistive sensors with 85% transparency, high out-of-plane sensitivity, bending and stretching durability, touchless operation, and stable performance in environments applications.

Poster by Gerda Ekindorf about grayscale exposure challenges using direct-write laser exposure on ultra-thick positive photoresists.

This presentation introduces methods for optimizing various direct-writing lithography systems from Heidelberg Instruments to push the resolution limit for smaller structures in collaboration with IMS Chips Germany.

Epitaxial strain in YIG and LuIG thin films preserves magnetization and low damping, enhancing spin-wave transmission, while strain relaxation induces defects degrading performance for magnonic devices.

Greyscale lithography enables 2.5D microstructures for micro-optics. The authors examine deep patterning in mr-P 22G_XP resist using mask aligners, resist aging effects, and suitable photomask requirements.

A 100 mm achromatic diffractive lens for 400-800 nm, created with the DWL 66+, achieves high-resolution full-color imaging and reduced telescope weight.

This application note describes the fabrication of refractive micro-lenses using Direct Laser Writing and Nanoimprint Lithography for generating orbital angular momentum in light waves.

MacEtch, a plasma-free anisotropic etching method, produces sharp vertical silicon structures without ion damage, beneficial for sensors, X-ray optics, photovoltaics, vias, and bio-interfaces.

SiEM sensor utilizing metal-assisted chemical etching to create high aspect ratio silicon pillars with charge multiplication capabilities. Electrical tests confirm compatibility with p–n junctions.

This application note describes the fabrication process of Fresnel Zone Plates on a thin silicon nitride membrane substrate for X-ray optics using a DWL 66⁺.

Nanomaterials derive unique properties from their nanostructure. A perspective explores advanced nanofabrication techniques to modify properties in condensed matter systems, discussing applications and future prospects.

Achieve straight, vertical sidewalls in thick negative-tone resist using focused laser beam-based direct write lithography, overcoming non-homogeneous illumination and non-sharp edges. (Possible application: MEMS)

GaAs metasurfaces enabled narrowband thermal terahertz emission via magnetic polaritons, achieving tunable 0.7–1.3 THz resonances with high-quality factors compatible with integrated GaAs optoelectronic devices.

Compare inverse-designed and conventional lenses in MWIR optics. The inverse-designed lens offers better depth-of-focus and off-axis performance but with larger spot size and reduced efficiency.

Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.

Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.

Fabrication of a p-GaN gate HEMT with an air-bridge source connection using direct grayscale lithography, achieving good performance with high breakdown voltage and low on-resistance.

We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.

X-ray dark-field radiography (XDFR) explores lung microstructures. Porcine lungs exhibit similar extinction coefficients to PMMA spheres, emphasizing the critical autocorrelation length for effective clinical imaging.

Flexible thin film transistors on 50 µm thick polyimide demonstrated stable behavior under simultaneous mechanical and electrical stress up to a 4 mm bending radius.

Si-based device using a fractal pattern for automatic focusing in high-resolution X-ray tomography. Achieves globally homogeneous visibility and local contrast with versatile X-ray energy applicability.

This paper investigates hybrid processes for patterning mixed structures using thermal nanoimprint lithography (T-NIL) and direct write lithography (DWL) on ma-P1275G positive grayscale resist.

We investigate neurite guidance using semiconductor industry-compatible techniques for fabricating modulated surfaces, enabling the cultivation and study of ordered neuronal networks in a 2.5D configuration.

A flat lens, designed through inverse design with a phase-only pupil function, achieves achromatic focusing over a broad spectrum in a single diffractive surface.

Inverse design enables the creation of thin, high-NA flat lenses. Multi-level diffractive lens (MDL) with a NA=0.9 at 850 nm wavelength, replicable via imprint lithography.

This paper presents a cost-effective method for fabricating polymer-based X-ray masks using UV laser-written SU-8 and electroplated gold absorbers, achieving micrometer-scale accuracy and enabling high-quality deep X-ray lithography.

Cheap and quick fabrication of mr-DWL waveguides channels on glass buried in optical polymer cladding with 350 µm radius ring resonators and 0.9 µm spacing.

For industrial illumination systems, micro-optical structures made via direct grayscale lithography achieve precise multi-wavelength intensity control, efficiency, and flexibility at a cost-effective production scale.