Blog

First NanoFrazor system in Latin America

We’re happy to announce the first NanoFrazor Explore system in Latin America installed at UNICAMP, Campinas (Brazil) in the Center for Semiconductor Components (CCS).

Samuel Bisig from Heidelberg Instruments Nano performed the installation and training with the help of our local distributers QD Latin America. This is the first of many more NanoFrazor systems to come in the Latin America region.

During the few days of installation and user training, Prof. Stanislav Moshkalev and his research group at CCS were already able to lift-off 5nm/15nm Ti/Au structures with minimum feature sizes <100nm. They plan to use the NanoFrazor further across multiple research groups for applications in nanoelectronics, nanophotonics, microelectronics and beyond.

We wish our newest NanoFrazor users all the best in their research and know that our tool’s capabilities will even spark new ideas and applications!

Share:

Share on facebook
Facebook
Share on twitter
Twitter
Share on pinterest
Pinterest
Share on linkedin
LinkedIn

Related Posts

Heidelberg Instruments receives ISO 9001:2015 Certificate for extraordinary Quality Management

Heidelberg Instruments receives ISO 9001:2015 Certificate for extraordinary Quality Management Heidelberg, September 22, 2021. TÜV Süd, an auditor and provider of safety, security and sustainability solutions, has awarded ISO 9001:2015 certification to Heidelberg Instruments, an international vendor of Laser Lithography Systems. This emphasizes the vendor’s high quality standards. Heidelberg Instruments’ own management team also used

Heidelberg Instruments flies the flag at MNE 2021 Micro and Nano Engineering Conference

The Micro and Nano Engineering (MNE) conference is the flagship event of the international Micro and Nano Engineering society (iMNEs) where international experts meet. Heidelberg Instruments is gold sponsor of the MNE2021 edition in Turin, Italy from September 20th to 23rd, and contributes in many ways to the top-class conference program: With his talk ‘Ultra-thick

White paper: Maskless Aligner technology in product development and manufacturing

Traditions of the past transformed into efficient production Conventional optical lithography requires the use of a mask aligner to fabricate a photomask which is then used to transfer the pattern onto a wafer or substrate. This process can be very time consuming especially when considering the fact that it can take up to several days

Heidelberg Instruments receives order for a semiconductor laser mask writer

Heidelberg, Germany, 26 August 2021: Heidelberg Instruments announced order for an ULTRA Semiconductor Laser Mask Writer from a large photomask production group in China. ULTRA Semiconductor Laser Mask Writer is the industry’s most economical solution for the production of photomasks with a 180 nm design node.  With its high throughput, small minimum feature size, excellent

Get in Touch

We are always at your disposal.
Please send us your request.

Sign up

Subscribe to our newsletter
to receive the newest information.

Scroll to Top