A SiO2-passivated Si nanowire/graphene nanoresonator enhances 1550 nm absorption and confined avalanche multiplication, achieving 56.6 A/W responsivity and 2.6×10⁴ gain for CMOS-compatible NIR photodetection.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
The quantum revolution is shifting from theory to reality, as breakthroughs like Google’s “Quantum Echoes” show. Scaling from small demos to systems with thousands of qubits demands ultra-precise, uniform nanofabrication. This post examines the fabrication challenges and lithographic solutions enabling the leap from lab to large-scale production.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
The DWL 66+ is now more powerful than ever, featuring two game-changing enhancements that redefine what’s possible with optical lithography.
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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the completeness and correctness of the translations.
