Frequently Asked Questions

Heidelberg Instruments develops and manufactures high-precision direct-write lithography systems and nanofabrication tools. Our portfolio spans from compact, tabletop systems ideal for prototyping and R&D, to high-end photomask manufacturing equipment designed for high-volume industrial production.

Maskless lithography (or direct-write lithography) is a technique that writes patterns directly onto a photosensitive substrate using a laser, eliminating the need for a physical photomask.

The main advantages are:

• Flexibility: Instantly change designs with no mask-related costs or lead times.
• Speed: Ideal for rapid prototyping, R&D, and iterating designs quickly.
• Cost-Effectiveness: Removes the high cost and long delays of photomask procurement.
• Advanced Capabilities: Enables high-resolution features and complex 2.5D/3D structures via grayscale lithography.

We manufacture maskless aligners (MLA series), laser lithography systems (DWL series), volume pattern generators for photomasks (VPG⁺ and ULTRA series), and the NanoFrazor for thermal scanning probe nanolithography. Our portfolio covers everything from tabletop R&D tools to high-throughput industrial production systems.

Grayscale lithography is an advanced technique that precisely varies the laser dose during exposure. This allows for the creation of complex, multi-level 2.5D microstructures (like micro-lenses, ramps, and blazed gratings) in the photoresist in a single step. Our DWL series systems are specialized for this capability.

Thermal Scanning Probe Lithography (t-SPL) is a unique technology used in our NanoFrazor system. It uses an ultra-sharp heated tip to create patterns with sub-10 nm resolution, enabling true 3D nanofabrication and non-invasive patterning for cutting-edge quantum and nano-device research.

Our systems are used across a wide range of fields, including:

• Microelectronics & Nanoelectronics
• Semiconductors & Advanced Packaging
• Micro-Optics & Photonics (e.g., microlens arrays)
• MEMS & Sensors
• Quantum Computing & Devices
• Biotechnology & Microfluidics
• Materials Science & Nanotechnology
• Displays & Photomasks

This depends on the system. The NanoFrazor offers nanometer-scale resolution. Our DWL and MLA laser systems typically provide high-resolution features in the micron and sub-micron range, with the MLA 150 achieving 450 nm and the DWL 66⁺ up to 200 nm minimum feature size. Please refer to the specific product data sheet for detailed specifications.

Yes. A key advantage of our direct-write technology is its advanced real-time autofocus system. This allows our tools to pattern effectively on non-standard, warped, or uneven substrates, which is a major challenge for traditional mask-based lithography.

Yes. Our portfolio is designed for both. The VPG⁺ and ULTRA series are optimized for high-speed industrial photomask production. The MLA and DWL series as well as the NanoFrazor are ideal for direct writing on wafers, piece parts, and other substrates for device fabrication and R&D.

Our systems are highly configurable to meet specific application needs, from R&D to high-volume industrial production. Because pricing depends on the specific model, configuration, and options, we do not publish a standard price list. We recommend contacting our sales team to discuss your requirements and receive a customized quotation.

Yes, this is a key strength of our portfolio. Many clients start with a flexible R&D tool (like the µMLA or DWL 66⁺) for prototyping. As their needs grow, they can transition to a high-throughput industrial system (like the VPG⁺ series or MLA 300) for pilot or volume production, all while using similar processes and data formats.

We are committed to the long-term success of your system. Beyond the initial installation and training, we offer comprehensive service contracts, preventative maintenance, spare parts, system upgrades, and remote diagnostics. Our global team of field service engineers and application specialists is available to provide ongoing support.

Yes. While our standard systems cover a wide range of applications, we have extensive experience in engineering custom solutions. Our team can work with you to develop custom substrate handling, specialized optics, or integrated process modules to meet unique requirements.

We operate several Process and Application Labs (PALs) globally. We encourage you to contact our team to discuss your project, schedule a demonstration, or request a benchmark, often using your own materials and designs. We also provide comprehensive application support and process development.

Yes. Every system purchase includes professional on-site installation by our factory-trained and certified service engineers. We also provide comprehensive operator training and application support to ensure your team can ramp up quickly and operate the system effectively.