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Home AMN10

Date

Feb 07 - 10 2023

Expired!

Time

all day

AMN10

10^th International Conference on Advanced Materials and Nanotechnology. Heidelberg Instruments will be represented by NanoVacuum Pty Ltd.

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APPLICATIONS

1D & 2D Materials
Advanced Packaging
High-Security Printing
Materials Science
MEMS
Microfluidics
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Nanoelectronics
Nanofluidics & Nanobiology
Nanoimprint Templates
Photomasks
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1D & 2D Materials
Advanced Packaging
High-Security Printing
Materials Science
MEMS
Microfluidics
Micro-optics
Nanoelectronics
Nanofluidics & Nanobiology
Nanoimprint Templates
Photomasks
Quantum Devices

CORE TECHNOLOGIES

Maskless Laser Lithography
3D Lithography by TPP
Thermal Scanning Probe Lithography

Maskless Laser Lithography
3D Lithography by TPP
Thermal Scanning Probe Lithography

KEY FEATURES

Accurate Pattern Placement
Grayscale Lithography
High Aspect Ratio
High & Ultra-High Resolution
In-situ Inspection & Metrology
Non-invasive Nanolithography
Small & Unconventional Substrates

Accurate Pattern Placement
Grayscale Lithography
High Aspect Ratio
High & Ultra-High Resolution
In-situ Inspection & Metrology
Non-invasive Nanolithography
Small & Unconventional Substrates

PRODUCTS

μMLA
MLA 150
DWL 66⁺
MPO 100
NanoFrazor® Scholar
NanoFrazor® Explore
MLA 300
DWL 2000 GS / DWL 4000 GS
VPG⁺ 200 / VPG⁺ 400
VPG⁺ 800 / VPG⁺ 1400
VPG 300 DI
ULTRA

μMLA
MLA 150
DWL 66⁺
MPO 100
NanoFrazor® Scholar
NanoFrazor® Explore
MLA 300
DWL 2000 GS / DWL 4000 GS
VPG⁺ 200 / VPG⁺ 400
VPG⁺ 800 / VPG⁺ 1400
VPG 300 DI
ULTRA

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