μMLA

The Table-Top Maskless Aligner

The table-top system µMLA features our state-of-the-art maskless technology and is the perfect entry-level tool for Research & Development, in virtually all areas that require microstructures. Typical examples are Microfluidics, Micro Optics, Sensors, MEMS, and Material Science. The µMLA is flexible and customizable like no other table-top direct writing tool before and supports the use of millimeter-sized samples.

Select the exposure mode you need or even equip your µMLA with both: The Raster Scan Exposure Module provides fast exposure with a speed independent of design complexity. The Vector Module exposes continuous curves, creating smooth contours vital for applications such as waveguides. In addition, the µMLA offers a choice of 3 optical setups with different ranges of throughput and variable resolution. Within your optical setup the software allows easy switching between three configurations, optimizing resolution and speed according to your requirements.

Key Features

  • Substrate size: up to 6
  • Minimum feature size: down to 0.6 µm
  • Maximum write speed: 300 mm2/min at 6 µm resolution
  • Real-time autofocus system
  • Overview camera for fast alignment and inspection
  • Frontside alignment
  • Easy-to-use operating software
  • Draw Mode for CAD-less exposure
  • Standard Grayscale Exposure Mode
  • 3 available optical setups
  • Software selectable variable resolution
  • Choice of exposure Module: Raster and/or Vector scan
  • Wavelengths (Raster Scan): 390 nm or 365 nm exposure wavelength
  • Wavelengths (Vector Scan): 405 nm and/or 375 nm

Application images

 

Microfluidics

A microfluidic system patterned using uMLA.
Courtesy of HIMT

Universal patterning of microstructures

Concentric rings with 1-μm line width were written into the photoresist using the Raster Scan exposure mode.
Courtesy of HIMT

Precise alignment

Single Ni nanowires (horizontal line in the image) with two precisely aligned thermometer structures used to investigate Co-Ni alloy magneto-thermopower and magneto-resistance.
Courtesy of Tim Boehnert, University of Hamburg

Precise alignment

In many applications, several layers need to be exposed on the same substrate. The μMLA’s cameras can automatically detect alignment markers and adjust the position, rotation, scaling and orthogonality of the exposure to the existing structures. The image shows Vernier scales and a “cross-in-cross” structure, employed to measure the remaining offset in x and y direction.
Courtesy of HIMT

High-aspect ratios

A gearwheel structure exposed into 90 μm of SU-8 shows an example of a high-aspect ratio structure. The μMLA can be used with thick resist layers to produce aspect ratios higher than 40:1.
Courtesy of P. Pittet and N. Terrier (INL) - Université Lyon 1

Grayscale lithography

Cage structures made of circa 50-µm-thick SU-8. The structures were created by two consecutive exposures without unloading the substrate. First, the pillars were exposed with a high dose. Afterwards, a lower exposure dose was used to only polymerize the uppermost regions of the resist. The structures are used to trap and grow live cells.
Courtesy of the University of Hamburg

Grayscale lithography

The μMLA also offers a standard Grayscale mode, which allows the creation of structures for a wide range of applications in micro-optics. This example shows micro-lenses written in 15 μm thick AZ4562, with a pitch of 30 μm and a radius of curvature of 16 μm.

Courtesy of HIMT

Complex patterns

Binary diffractive optical element comprised of 1µm² squares and exposed into 500 nm thick Shipley S1805.
Courtesy of HIMT

Downloads

Key technical specifications.

Fact sheet

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