Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
The symposium features technical experts from Heidelberg Instruments, Nanoscribe, Raith, GenIsys and micro resist technology who will describe the spectrum of latest, state-of-the-art direct-write capabilities. Furthermore, you will get the chance to highlight and/or discuss the latest results in the nanolithography with other experts and application scientists.
Date: February 18th – 19th, 2020
Venue: University of Stuttgart, Pfaffenwaldring 57, 70550 Stuttgart, Germany
Fee: Participation is free for registered participants
Registration deadline: February 6th, 2020
Click on the button below to be redirected to the Raith website to learn more and to register: