Media & Infos

Application Notes

NanoFrazor Systems

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Closed-loop 3d Nanolithography

1.9 MiB

by Anya Grushina, Heidelberg Instruments Nano

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Bilayer Lift-off for NanoFrazor Lithography

1.4 MiB

by Tero Kulmala, Heidelberg Instruments Nano

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NanoFrazor for Direct Nanoscale Chemical Conversion

1.3 MiB

by Anya Grushina, Heidelberg Instruments Nano

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NanoFrazor for Patterning of Nanoscale Spin Textures

1.4 MiB

by Edoardo Albisetti, Politecnico di Milano

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Non-invasive NanoFrazor Lithography

1.1 MiB

by Anya Grushina, Heidelberg Instruments Nano

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Ultra-High Resolution Pattern Transfer for NanoFrazor Lithography

827.5 KiB

By Tero Kulmala, Heidelberg Instruments Nano

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Laser Lithography Systems

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Exposure of sprayed photoresist on KOH etched side walls of a silicon wafer with a Heidelberg Instruments DWL 66+

1.9 MiB

by Oliver Haverbeck and Jens Rodenbach, Fraunhofer IMM

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Grayscale Lithography with GenISys 3D-PEC

851.7 KiB

By Andreas Ludwig, Christian Pies, Heidelberg Instruments / Thomas Michels, Daniel Ritter, GenISys GmbH

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Small Sample Handling

637.7 KiB

By Jochen Hermann, Heidelberg Instruments

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High-resolution Direct-Write Laser Lithography With The DWL 66+

1.3 MiB

By Andreas Ludwig, Heidelberg Instruments

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APPLICATIONS OF DIRECT WRITE GRAYSCALE LITHOGRAPHY

1.5 MiB

by Fei CHEN, ShenZhen Nahum-Eli Optical Technology Inc.

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Maskless Photolithography With The MLA150

1.7 MiB

By Théophane Besson, Heidelberg Instruments

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Lift-off With Maskless Lithography

411.7 KiB

By Sören Lösch, IFW Dresden

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Stitching optimization with CI-over

593.7 KiB

By Dominique Colle, Heidelberg Instruments

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SU8 Adhesion Enhancement

674.5 KiB

By Heidelberg Instruments

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