Media & Infos
Application Notes
NanoFrazor Systems
Bilayer Lift-off for NanoFrazor Lithography
1.4 MiB
by Tero Kulmala, Heidelberg Instruments Nano
DownloadNanoFrazor for Direct Nanoscale Chemical Conversion
1.3 MiB
by Anya Grushina, Heidelberg Instruments Nano
DownloadNanoFrazor for Patterning of Nanoscale Spin Textures
1.4 MiB
by Edoardo Albisetti, Politecnico di Milano
DownloadUltra-High Resolution Pattern Transfer for NanoFrazor Lithography
827.5 KiB
By Tero Kulmala, Heidelberg Instruments Nano
DownloadLaser Lithography Systems
Exposure of sprayed photoresist on KOH etched side walls of a silicon wafer with a Heidelberg Instruments DWL 66+
1.9 MiB
by Oliver Haverbeck and Jens Rodenbach, Fraunhofer IMM
DownloadGrayscale Lithography with GenISys 3D-PEC
851.7 KiB
By Andreas Ludwig, Christian Pies, Heidelberg Instruments / Thomas Michels, Daniel Ritter, GenISys GmbH
DownloadHigh-resolution Direct-Write Laser Lithography With The DWL 66+
1.3 MiB
By Andreas Ludwig, Heidelberg Instruments
DownloadAPPLICATIONS OF DIRECT WRITE GRAYSCALE LITHOGRAPHY
1.5 MiB
by Fei CHEN, ShenZhen Nahum-Eli Optical Technology Inc.
DownloadMaskless Photolithography With The MLA150
1.7 MiB
By Théophane Besson, Heidelberg Instruments
DownloadContact
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