High-end optics are key to achieve fast and precise exposure. We use a wide range of spatial light modulators (DMDs, GLVs, AOMs and AODs) and light sources (LEDs and lasers) for our direct-write lithography systems. We know exactly which modulator and source fits best for which application and what kind of corrections need to be implemented to achieve best exposure results all over the substrate. We developed real-time optical and pneumatic autofocus systems, as well as fast and precise optical alignment methods for front- and backside alignment.
All our optics design is done in-house in Heidelberg, where we look back to more than 35 years of experience and constant improvements.
Prototyping and manufacturing of the mechanical components for our optics are also done in-house using high-precision machining tools.